Patents by Inventor JunYoul CHOI

JunYoul CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming photomask
    Patent number: 9766540
    Abstract: A photomask and a method of forming the same, the photomask including a transparent substrate; a light shielding pattern on the transparent substrate, the light shielding pattern including molybdenum and silicon; and an etch stop layer covering at least a sidewall of the light shielding pattern, wherein the etch stop layer has an etch rate lower than an etch rate of the light shielding pattern with respect to an ammonia-based cleaning solution.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: September 19, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong Keun Oh, Hyungho Ko, Inkyun Shin, Jaehyuck Choi, JunYoul Choi
  • METHOD OF FORMING PHOTOMASK
    Publication number: 20160124301
    Abstract: A photomask and a method of forming the same, the photomask including a transparent substrate; a light shielding pattern on the transparent substrate, the light shielding pattern including molybdenum and silicon; and an etch stop layer covering at least a sidewall of the light shielding pattern, wherein the etch stop layer has an etch rate lower than an etch rate of the light shielding pattern with respect to an ammonia-based cleaning solution.
    Type: Application
    Filed: December 22, 2015
    Publication date: May 5, 2016
    Inventors: Jong Keun Oh, Hyungho Ko, Inkyun Shin, Jaehyuck Choi, JunYoul Choi
  • Photomask and method of forming the same
    Patent number: 9223199
    Abstract: A photomask and a method of forming the same, the photomask including a transparent substrate; a light shielding pattern on the transparent substrate, the light shielding pattern including molybdenum and silicon; and an etch stop layer covering at least a sidewall of the light shielding pattern, wherein the etch stop layer has an etch rate lower than an etch rate of the light shielding pattern with respect to an ammonia-based cleaning solution.
    Type: Grant
    Filed: October 22, 2013
    Date of Patent: December 29, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong Keun Oh, Hyungho Ko, Inkyun Shin, Jaehyuck Choi, JunYoul Choi
  • PHOTOMASK AND METHOD OF FORMING THE SAME
    Publication number: 20140113221
    Abstract: A photomask and a method of forming the same, the photomask including a transparent substrate; a light shielding pattern on the transparent substrate, the light shielding pattern including molybdenum and silicon; and an etch stop layer covering at least a sidewall of the light shielding pattern, wherein the etch stop layer has an etch rate lower than an etch rate of the light shielding pattern with respect to an ammonia-based cleaning solution.
    Type: Application
    Filed: October 22, 2013
    Publication date: April 24, 2014
    Inventors: Jong Keun OH, Hyungho KO, Inkyun SHIN, Jaehyuck CHOI, JunYoul CHOI