Abstract: The present disclosure relates to a silicone-based coating composition, and a silicone-based release film including the same, wherein the silicone-based coating composition comprises a silicone-based compound represented by the following Chemical Formula 1 having a weight average molecular weight of greater than or equal to 25,000 g/mol and less than or equal to 70,000 g/mol: wherein R1 to R3 and n are described herein.

Abstract: A secondary battery case includes a recess part recessed downward, and a sealing part provided around the recess part when the secondary battery case is unfolded. At least portions of the sealing part are attached to each other to seal inner surfaces of the recess part from an outside. A secondary battery includes an electrode assembly and the secondary battery case. The recess part of the secondary battery case has a width that corresponds to a thickness of the electrode assembly.

Abstract: The present invention relates to a micro LED package, a display having the same, and a method for manufacturing the display and, more specifically, to a micro LED package, a display having the same, and a method for manufacturing the display, in which a plurality of micro LEDs having different colors are packaged in a single pixel unit or a plurality of pixel units to facilitate connection to a driving connection electrode unit of the display. In the micro LED package and the display having the same according to the present invention, even if the size of the micro LED chips becomes small, the driving connection electrode unit of the display may be easily connected to the display driving connection electrode unit without rearranging or redesigning the driving connection electrode unit of the display, thereby making it possible to utilize the driving connection electrode unit of the existing display.

Abstract: The present invention relates to a monomer composition for synthesizing recycled plastic which comprises an aromatic diol compound, wherein a ratio of aromatic diol compound derivative impurity according to Equation 1 is 0.5% or less, wherein the aromatic diol compound has a purity of 99.25% or more, and the monomer composition for synthesizing recycled plastic is recovered from a polycarbonate-based resin, a preparation method thereof, and a recycled plastic, and molded product using the same.

Abstract: A method of manufacturing a semiconductor device in which a conductive layer is formed over a semiconductor substrate, and a hard mask layer is formed. Some portions of the hard mask layer are selectively removed to form first patterns of the hard mask layer and a second pattern of the hard mask layer. A first shielding pattern that shields a first region of the semiconductor substrate is formed, and the portions of the conductive layer, exposed by the first shielding pattern and the second pattern of the hard mask layer are selectively removed to form a first conductive line pattern. A second shielding pattern that shields a second region of the semiconductor substrate is formed, and other portions of the conductive layer, exposed by the second shielding pattern and the first patterns of the hard mask layer are selectively removed to form second conductive line patterns.

Abstract: The present invention relates to a monomer composition for synthesizing recycled plastic which comprises an aromatic diol compound, wherein a ratio of aromatic diol compound derivative impurity according to Equation 1 is 2% or less, wherein a yield of the aromatic diol compound according to Equation 2 is 80% or more, and the monomer composition is recovered from a polycarbonate-based resin, a preparation method thereof, and a recycled plastic, and molded product using the same.

Abstract: The present invention relates to a monomer composition for synthesizing recycled plastic which comprises an aromatic diol compound, wherein a ratio of aromatic diol compound derivative impurity according to Equation 1 is 10% or less, the monomer composition has a color coordinate b* of 0.01 to 2, and the monomer composition is recovered from a polycarbonate-based resin, a preparation method thereof, and a recycled plastic, and molded product using the same.

Abstract: Provided is a method for preparing an asymmetric linear carbonate, the method comprising: subjecting two kinds of different symmetric linear carbonates to a transesterification reaction in the presence of a metal alkoxide catalyst to prepare an asymmetric linear carbonate, wherein the metal of the metal alkoxide is at least one selected from the group consisting of aluminum (Al), magnesium (Mg), germanium (Ge), gallium (Ga), cobalt (Co), calcium (Ca), hafnium (Hf), iron (Fe), nickel (Ni), niobium (Nb), molybdenum (Mo), lanthanum (La), rhenium (Re), scandium (Sc), silicon (Si), tantalum (Ta), tungsten (W), yttrium (Y), zirconium (Zr) and vanadium (V). Also provided is an asymmetric linear carbonate including the metal alkoxide catalyst.

Abstract: The present disclosure relates to a method for preparing an asymmetric linear carbonate, which comprises subjecting two different symmetrical linear carbonates to a transesterification reaction in the presence of a base catalyst having a heterocyclic structure to prepare an asymmetric linear carbonate.

Abstract: The present specification relates to a method for preparing an asymmetric linear carbonate.

Abstract: A semiconductor device includes first and second fin type patterns, first and second gate patterns intersecting the first and second fin type patterns, third and fourth gate patterns intersecting the first fin type pattern between the first and the second gate patterns, a fifth gate pattern intersecting the second fin type pattern, a sixth gate pattern intersecting the second fin type pattern, first to third semiconductor patterns disposed among the first, the third, the fourth and the second gate patterns, and fourth to sixth semiconductor patterns disposed among the first, the fifth, the sixth and the second gate patterns. The first semiconductor pattern to the fourth semiconductor pattern and the sixth semiconductor pattern are electrically connected to a wiring structure, and the fifth semiconductor pattern is not connected to the wiring structure.

Abstract: Disclosed is a direct slot cooling system for motors, including a stator configured to expand an inner slot space of a stator core where a coil is wound to form a cooling slot through which a cooling fluid passes; a rotor coupled to a center of the stator to rotate; and a housing coupled to left and right sides of the stator to form a cooling jacket in watertight communication with a cooling slot so that a cooling fluid circulates in the cooling jacket.

Abstract: The present disclosure provides a photocurable composition, which has excellent coatability and is capable of providing a coating layer having excellent surface quality and thickness uniformity, a coating layer including a cured product of the photocurable composition, and a substrate for a semiconductor process including the coating layer.

Abstract: A system is disclosed for a platform that enables the biological owner of health data to manage and control access to their health data. In an embodiment, biological owners can take possession of their own health data. They control the level of access to their own health data by third parties through the use of data blurring to fit within specific data ranges. They also control access to their data through data encryption. In another embodiment, the biological owner of the health data can provide access to their health data to third parties through an auction system. Such access would be provided based on price, time duration of access, or quality of data, as determined by the biological owner of the health data. Additionally, such access could be provided by the system managing the health data access for the biological owner of the health data.

Abstract: The present disclosure relates to a silicone-based coating composition, and a silicone-based release film including the same, wherein the silicone-based coating composition comprises a silicone-based compound represented by the following Chemical Formula 1 having a weight average molecular weight of greater than or equal to 25,000 g/mol and less than or equal to 70,000 g/mol: wherein R1 to R3 and n are described herein.

Abstract: The present disclosure provides an apparatus capable of continuously producing carbon nanotubes having high crystallinity, a low residual catalyst content and a high aspect ratio. The apparatus for producing carbon nanotubes includes: a reaction unit configured to synthesize carbon nanotubes (CNTs), a supply unit configured to supply a carbon source to the reaction unit through a supply pipe; and a collection unit configured to collect carbon nanotubes discharged from the reaction unit, wherein the reaction unit may include a chemical vapor deposition reactor.

Abstract: A semiconductor device includes first and second fin type patterns, first and second gate patterns intersecting the first and second fin type patterns, third and fourth gate patterns intersecting the first fin type pattern between the first and the second gate patterns, a fifth gate pattern intersecting the second fin type pattern, a sixth gate pattern intersecting the second fin type pattern, first to third semiconductor patterns disposed among the first, the third, the fourth and the second gate patterns, and fourth to sixth semiconductor patterns disposed among the first, the fifth, the sixth and the second gate patterns. The first semiconductor pattern to the fourth semiconductor pattern and the sixth semiconductor pattern are electrically connected to a wiring structure, and the fifth semiconductor pattern is not connected to the wiring structure.

Abstract: A semiconductor device includes first and second fin type patterns, first and second gate patterns intersecting the first and second fin type patterns, third and fourth gate patterns intersecting the first fin type pattern between the first and the second gate patterns, a fifth gate pattern intersecting the second fin type pattern, a sixth gate pattern intersecting the second fin type pattern, first to third semiconductor patterns disposed among the first, the third, the fourth and the second gate patterns, and fourth to sixth semiconductor patterns disposed among the first, the fifth, the sixth and the second gate patterns. The first semiconductor pattern to the fourth semiconductor pattern and the sixth semiconductor pattern are electrically connected to a wiring structure, and the fifth semiconductor pattern is not connected to the wiring structure.

Abstract: The present disclosure provides an apparatus capable of continuously producing carbon nanotubes having high crystallinity, a low residual catalyst content and a high aspect ratio. The apparatus for producing carbon nanotubes includes: a reaction unit configured to synthesize carbon nanotubes (CNTs), a supply unit configured to supply a carbon source to the reaction unit through a supply pipe; and a collection unit configured to collect carbon nanotubes discharged from the reaction unit, wherein the reaction unit may include a chemical vapor deposition reactor.

Abstract: A semiconductor device includes first and second fin type patterns, first and second gate patterns intersecting the first and second fin type patterns, third and fourth gate patterns intersecting the first fin type pattern between the first and the second gate patterns, a fifth gate pattern intersecting the second fin type pattern, a sixth gate pattern intersecting the second fin type pattern, first to third semiconductor patterns disposed among the first, the third, the fourth and the second gate patterns, and fourth to sixth semiconductor patterns disposed among the first, the fifth, the sixth and the second gate patterns. The first semiconductor pattern to the fourth semiconductor pattern and the sixth semiconductor pattern are electrically connected to a wiring structure, and the fifth semiconductor pattern is not connected to the wiring structure.