Patents by Inventor June Koo

June Koo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF FORMING NANOPARTICLE ARRAY USING CAPILLARITY AND NANOPARTICLE ARRAY PREPARED THEREBY
    Publication number: 20080038532
    Abstract: Disclosed are a method of forming a nanoparticle array, including preparing a trench having a channel structure between upper and lower substrates, preparing a dispersion of nanoparticles, and bringing the trench into contact with the dispersion such that the dispersion enters the channel of the trench due to capillary force, and a nanoparticle array prepared thereby. According to this invention, the nanoparticles may be uniformly arranged at a high density on a substrate having a large area at low cost.
    Type: Application
    Filed: February 28, 2007
    Publication date: February 14, 2008
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dong YI, June KOO, Seong CHOI, Jae CHOI, Young CHA, Hyo LEE, Hyuk CHOI, Kwang KIM
  • Photoresist coating apparatus, medium, and method efficiently spraying photoresist
    Publication number: 20070082499
    Abstract: A photoresist coating apparatus, medium, and method for efficiently spraying a liquid photoresist to maintain an atmosphere of ionized solvent vapor between a substrate and a spray nozzle of an upper portion by using a vapor inducing pipe supplying ionized solvent vapor, with the atmosphere being maintained by differently biasing a lower portion supporting the substrate and a plate of the upper portion. Photoresist can be evenly coated over the entire surface of the substrate while reducing the loss of sprayed photoresist droplets.
    Type: Application
    Filed: July 20, 2006
    Publication date: April 12, 2007
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Chang Jung, Tae Kim, Jin Lee, June Koo
  • Photoresist coating system and method
    Publication number: 20070077352
    Abstract: A photoresist coating system and method solving an edge bead problem that occurs in photoresist coating by adding at least one of high boiling point solvent, which may generate a film on the surface of a solvent having a higher boiling point than a solvent contained in a liquid photoresist or the surface of the liquid photoresist, or by supplying a surfactant to an edge of the wafer, with the surfactant being combinable with the solvent or capable of forming a film on the solvent.
    Type: Application
    Filed: August 29, 2006
    Publication date: April 5, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: June Koo, Tae Kim, Jin Lee, Chang Jung