Patents by Inventor Junetsu Kanazawa

Junetsu Kanazawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask blank and photomask
    Patent number: 4720442
    Abstract: A photomask blank comprising a transparent substrate and at least two layers including a masking layer and an antireflection layer, formed thereon, wherein said masking layer is a chromium masking layer containing more than 25% by atomic ratio of nitrogen, and said antireflection layer is a chromium oxide antireflection layer containing more than 25% by atomic ratio of nitrogen.
    Type: Grant
    Filed: May 27, 1986
    Date of Patent: January 19, 1988
    Assignee: Asahi Glass Company Ltd.
    Inventors: Norihiko Shinkai, Takeshi Haranoh, Junetsu Kanazawa, Takashi Hatano