Abstract: A semiconductor device may include a plurality of dummy wirings formed on a substrate at different vertical levels and electrically floated and a plurality of dummy contact plugs each electrically connected between two adjacent dummy wirings of the plurality of dummy wiring of the plurality of dummy wirings. No dummy wiring of the plurality of dummy wirings is electrically connected to a terminal of any one of a plurality of transistors included in the substrate.

Abstract: A semiconductor device may include a plurality of dummy wirings formed on a substrate at different vertical levels and electrically floated and a plurality of dummy contact plugs each electrically connected between two adjacent dummy wirings of the plurality of dummy wiring of the plurality of dummy wirings. No dummy wiring of the plurality of dummy wirings is electrically connected to a terminal of any one of a plurality of transistors included in the substrate.

Abstract: A semiconductor device including a substrate including an NMOS region and a PMOS region; first and second gate dielectrics on the NMOS and PMOS regions of the substrate and including a high-k dielectric material; a first gate structure on the first gate dielectric and including a sequentially stacked first n-type metal layer pattern and first electrode layer pattern; a second gate structure on the second gate dielectric and including a sequentially stacked p-type metal layer pattern, second n-type metal layer pattern, and second electrode layer pattern; first and second spacers on sidewalls of the first and second gate structures; a first offset pattern between the first gate structure and the first spacer; and a second offset pattern between the second gate structure and the second spacer, the second offset pattern being on the sidewalls of the second gate structure excluding sidewalls of the p-type metal layer pattern.

Abstract: Memory devices include a substrate including first to third regions, a memory element on the first region, a first transistor on the second region closer to the first region than to the third region and including a spacer filled with an insulating material, and a second transistor on the third region and including a spacer filled with air.

Abstract: A semiconductor device including a substrate including an NMOS region and a PMOS region; first and second gate dielectrics on the NMOS and PMOS regions of the substrate and including a high-k dielectric material; a first gate structure on the first gate dielectric and including a sequentially stacked first n-type metal layer pattern and first electrode layer pattern; a second gate structure on the second gate dielectric and including a sequentially stacked p-type metal layer pattern, second n-type metal layer pattern, and second electrode layer pattern; first and second spacers on sidewalls of the first and second gate structures; a first offset pattern between the first gate structure and the first spacer; and a second offset pattern between the second gate structure and the second spacer, the second offset pattern being on the sidewalls of the second gate structure excluding sidewalls of the p-type metal layer pattern.