Patents by Inventor JUNG-CHANG HSIEH

JUNG-CHANG HSIEH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing isolation structure
    Patent number: 8828843
    Abstract: A method of manufacturing an isolation structure includes forming a laminate structure on a substrate. A plurality trenches is formed in the laminate structure. Subsequently a pre-processing is effected to form a hydrophilic thin film having oxygen ions on the inner wall of the trenches. Spin-on-dielectric (SOD) materials are filled into the trenches. The hydrophilic think film having oxygen ions changes the surface tension of the inner wall of the trenches and increases SOD material fluidity.
    Type: Grant
    Filed: May 2, 2013
    Date of Patent: September 9, 2014
    Assignee: Inotera Memories, Inc.
    Inventors: Yaw-Wen Hu, Jung-Chang Hsieh, Kuen-Shin Huang, Jian-Wei Chen, Ming-Tai Chien
  • METHOD OF MANUFACTURING ISOLATION STRUCTURE
    Publication number: 20140220762
    Abstract: A method of manufacturing an isolation structure includes forming a laminate structure on a substrate. A plurality trenches is formed in the laminate structure. Subsequently a pre-processing is effected to form a hydrophilic thin film having oxygen ions on the inner wall of the trenches. Spin-on-dielectric (SOD) materials are filled into the trenches. The hydrophilic think film having oxygen ions changes the surface tension of the inner wall of the trenches and increases SOD material fluidity.
    Type: Application
    Filed: May 2, 2013
    Publication date: August 7, 2014
    Applicant: INOTERA MEMORIES, INC.
    Inventors: YAW-WEN HU, JUNG-CHANG HSIEH, KUEN-SHIN HUANG, JIAN-WEI CHEN, MING-TAI CHIEN