Patents by Inventor Jung Chao

Jung Chao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11996483
    Abstract: The present disclosure provides a semiconductor device that includes a semiconductor fin disposed over a substrate, an isolation structure at least partially surrounding the fin, an epitaxial source/drain (S/D) feature disposed over the semiconductor fin, where an extended portion of the epitaxial S/D feature extends over the isolation structure, and a silicide layer disposed on the epitaxial S/D feature, where the silicide layer covers top, bottom, sidewall, front, and back surfaces of the extended portion of the S/D feature.
    Type: Grant
    Filed: December 14, 2022
    Date of Patent: May 28, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Pei-Hsun Wang, Chih-Chao Chou, Shih-Cheng Chen, Jung-Hung Chang, Jui-Chien Huang, Chun-Hsiung Lin, Chih-Hao Wang
  • Publication number: 20240166802
    Abstract: A manufacturing method of a polymer includes the following steps. Terephthalic acid, butanediol, adipic acid, and carboxybenzene are used as raw materials to perform an esterification reaction to obtain a reactant. A catalyst is added to the reactant, and a polymerization reaction is performed.
    Type: Application
    Filed: December 22, 2022
    Publication date: May 23, 2024
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Jung-Jen Chuang, Tzu-Huan Wong
  • Publication number: 20240158570
    Abstract: A manufacturing method of a polyester for a plastic wrap at least includes the following steps. An aromatic carboxylic acid, an aliphatic carboxylic acid, and an aliphatic alcohol are provided, wherein the aromatic carboxylic acid includes at least two of a phthalic acid, an isophthalic acid, and a terephthalic acid. The aromatic carboxylic acid, the aliphatic carboxylic acid and the aliphatic alcohol are subjected to at least an esterification reaction, a pre-polymerization reaction, and a polymerization reaction in sequence, so as to obtain a polybutylene adipate terephthalate.
    Type: Application
    Filed: December 15, 2022
    Publication date: May 16, 2024
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Jung-Jen Chuang, Tzu-Huan Wong
  • Publication number: 20240140900
    Abstract: A method for manufacturing methyltetrahydrophthalic anhydride is provided, which includes steps as follows. Maleic anhydride is added into a reactor. Piperylene is added into the reactor, so that the piperylene and the maleic anhydride undergo a first addition reaction. When a conversion rate of the maleic anhydride is more than 25%, the first addition reaction is completed. Isoprene is added into the reactor, so that the isoprene and the maleic anhydride undergo a second addition reaction to obtain a methyltetrahydrophthalic anhydride product. The methyltetrahydrophthalic anhydride product contains 3-methyltetrahydrophthalic anhydride and 4-methyltetrahydrophthalic anhydride.
    Type: Application
    Filed: December 21, 2022
    Publication date: May 2, 2024
    Inventors: TE-CHAO LIAO, JUNG-JEN CHUANG, CHUNG-YU CHEN, JUNG-TSU WU
  • Publication number: 20240140925
    Abstract: A method for manufacturing a low-viscosity hardener is provided. The method includes the followings steps: providing a hardener crude product; and subjecting the hardener crude product and an alkaline catalyst to an isomerization reaction, so as to obtain the low-viscosity hardener. The hardener crude product contains 3-methyltetrahydrophthalic anhydride and 4-methyltetrahydrophthalic anhydride, and a weight ratio of the 3-methyltetrahydrophthalic anhydride to the 4-methyltetrahydrophthalic anhydride ranges from 7:3 to 3:7. A viscosity of the low-viscosity hardener ranges from 30 cps to 50 cps.
    Type: Application
    Filed: January 11, 2023
    Publication date: May 2, 2024
    Inventors: TE-CHAO LIAO, JUNG-JEN CHUANG, CHUNG-YU CHEN, JUNG-TSU WU
  • Patent number: 11942396
    Abstract: A heterogeneous integration semiconductor package structure including a heat dissipation assembly, multiple chips, a package assembly, multiple connectors and a circuit substrate is provided. The heat dissipation assembly has a connection surface and includes a two-phase flow heat dissipation device and a first redistribution structure layer embedded in the connection surface. The chips are disposed on the connection surface of the heat dissipation assembly and electrically connected to the first redistribution structure layer. The package assembly surrounds the chips and includes a second redistribution structure layer disposed on a lower surface and multiple conductive vias electrically connected to the first redistribution structure layer and the second redistribution structure layer. The connectors are disposed on the package assembly and electrically connected to the second redistribution structure layer.
    Type: Grant
    Filed: December 29, 2021
    Date of Patent: March 26, 2024
    Assignee: Industrial Technology Research Institute
    Inventors: Heng-Chieh Chien, Shu-Jung Yang, Yu-Min Lin, Chih-Yao Wang, Yu-Lin Chao
  • Patent number: 11914821
    Abstract: A touch sensitive processing method, comprising: performing capacitance sensing by a touch panel to gather an approximating or touching position of an external conductive object with regard to the touch panel; determining whether the approximating or touching position is within a non-report area, wherein a shape of the non-report area is a circle or an ellipse; when the approximating or touching position is determined outside the non-report area, reporting the approximating or touching position to a host; and when the approximating or touching position is determined inside the non-report area, ignoring the approximating or touching position.
    Type: Grant
    Filed: February 14, 2023
    Date of Patent: February 27, 2024
    Assignee: EGALAX_EMPIA TECHNOLOGY INC.
    Inventors: Chin-Hsiang Chao, Chun-Jung Huang
  • Publication number: 20230383221
    Abstract: A method for making an alcohol-containing food product comprises combining: (a) a first aqueous solution that includes a multivalent salt, one or more liquid alcohol additives and a thickening agent; with (b) a second aqueous solution that includes an alginate bath. The combination uses extrusion machinery to mass produce spherical beads, less than about 20 mm in typical diameter, with a liquid alcohol center encapsulated in a gelled outer shell. The resulting end product should be collected and stored in a third aqueous solution that maintains similar properties to the first aqueous solution and one or more liquid alcohol additives.
    Type: Application
    Filed: March 20, 2023
    Publication date: November 30, 2023
    Inventors: SHIAN-JUNG CHAO, YUN-SHI CHEN
  • Publication number: 20230335642
    Abstract: Apparatus and methods are disclosed, including memory devices and systems. Example memory devices, systems and methods include transistors formed in a (100) surface of a semiconductor substrate wherein a channel is oriented in a <100> direction. The transistors further include one or more strain induced dislocations adjacent to a channel.
    Type: Application
    Filed: April 14, 2022
    Publication date: October 19, 2023
    Inventors: Toshihiko Miyashita, Jung Chao Chiou
  • Patent number: 9744146
    Abstract: A method for alleviating at least one of the disturbance of bile acid metabolism, the disturbance of amino acid metabolism, and the disturbance of gut microbiota metabolism in a subject, comprising administering to the subject a composition or a health food comprising an active component selected from the group consisting of gallic acid, a pharmaceutically acceptable salt of gallic acid, a pharmaceutically acceptable ester of gallic acid, and combinations thereof.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: August 29, 2017
    Assignee: CHINA MEDICAL UNIVERSITY
    Inventors: Wen-Huang Peng, Li-Heng Pao, Jung Chao, Hao-Yuan Cheng, Meng-Shiou Lee
  • Publication number: 20160186081
    Abstract: An environmental protection liquid fuel generator, in which the fuel oil generator is a structure made from a receiving device, an esterification device, a first standing separation device, a compression distillation device, an acid-base neutralization device, a second standing separation device, and a decompression distillation device. A mixed proportion of a vegetable oil and an alkide (catalyzing enzyme) is placed into the fuel generator, and the esterification device is used to increase electron affinity and accelerate the reaction rate, thereby enabling the distillation of low polluting and low sulfur containing environmental protection fuel oil.
    Type: Application
    Filed: December 30, 2014
    Publication date: June 30, 2016
    Inventors: Chih-Jung CHAO, Lian-Nak TI
  • Publication number: 20150174087
    Abstract: A method for alleviating at least one of the disturbance of bile acid metabolism, the disturbance of amino acid metabolism, and the disturbance of gut microbiota metabolism in a subject, comprising administering to the subject a composition or a health food comprising an active component selected from the group consisting of gallic acid, a pharmaceutically acceptable salt of gallic acid, a pharmaceutically acceptable ester of gallic acid, and combinations thereof.
    Type: Application
    Filed: October 31, 2014
    Publication date: June 25, 2015
    Inventors: Wen-Huang Peng, Li-Heng Pao, Jung Chao, Hao-Yuan Cheng, Meng-Shiou Lee
  • Patent number: 7598595
    Abstract: A nanoporous antireflection coating preparation method. A sol-gel precursor solution containing an organic template is coated onto a substrate. The sol-gel precursor solution containing the organic template is dried into a film. The organic template within the film is then removed to form a nanoporous antireflection coating. In preferred embodiments, the organic template is removed by UV—O3 treatment at ambient temperature.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: October 6, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Kuei-jung Chao, Kuo-ying Huang, Shu Fang Chen
  • Publication number: 20080083157
    Abstract: An environmental protection synthetic low sulphur fuel oil that uses a proportional mixture of vegetable oil and a catalyzing enzyme (decane, 11 alkane, 12 alkane) as a substitute for high polluting high grade diesel oils to achieve required flash point and reduce sulphur content, and which can be used as a green environmental protection additive agent to high grade diesel oil, thereby achieving the objective of providing a method that effects environment protection.
    Type: Application
    Filed: October 6, 2006
    Publication date: April 10, 2008
    Inventor: Chih-Jung Chao
  • Publication number: 20080014355
    Abstract: A method for preparing a palladium-containing layer comprises the steps of cleaning a top surface of the porous substrate, modifying the top surface of the porous substrate to form a planar surface, performing a seeding process on the planar surface to adhere palladium nanoparticles on the planar surface and performing an electroless plating process to form the palladium-containing layer on the planar surface. The step of modifying the top surface of the porous substrate includes filling holes of the porous substrate with aluminum oxide particles, coating a sol-gel containing aluminum oxide or silicon oxide on the top surface of the porous substrate, The step of performing a seeding process on the planar surface includes exposing the planar surface of the porous substrate in a nanocolloidal solution having dispersed palladium nanoparticles derived from a palladium-containing species and a surfactant.
    Type: Application
    Filed: July 12, 2006
    Publication date: January 17, 2008
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: Kuei Jung Chao, Chi Yuan Chang, Wei Chih Lin
  • Publication number: 20070141854
    Abstract: A nanoporous antireflection coating preparation method. A sol-gel precursor solution containing an organic template is coated onto a substrate. The sol-gel precursor solution containing the organic template is dried into a film. The organic template within the film is then removed to form a nanoporous antireflection coating. In preferred embodiments, the organic template is removed by UV—O3 treatment at ambient temperature.
    Type: Application
    Filed: June 16, 2006
    Publication date: June 21, 2007
    Inventors: Kuei-jung Chao, Kuo-ying Huang, Shu Fang Chen
  • Patent number: 6733828
    Abstract: A method of confined synthesis of nanostructured material inside a mesoporous material. The method includes the step of providing mesoporous material having uniform and ordered mesopores. Next, a monolayer of charged functional group is attached on the pore surface of mesoporous host material by reacting with functional molecule. A oppositely-charged molecule is incorporated into the confined space of mesoporous material by either ion exchange or incipient wetness impregnation. Finally, the incorporated molecule is reduced or oxidized or further reacted with secondarily-incorporated molecule to form nanostructured material in mesoporous material.
    Type: Grant
    Filed: January 29, 2002
    Date of Patent: May 11, 2004
    Inventors: Kuei-Jung Chao, Chia-Min Yang
  • Publication number: 20030152759
    Abstract: A method of confined synthesis of nanostructured material inside a mesoporous material. The method includes the step of providing mesoporous material having uniform and ordered mesopores. Next, a monolayer of charged functional group is attached on the pore surface of mesoporous host material by reacting with functional molecule. A oppositely-charged molecule is incorporated into the confined space of mesoporous material by either ion exchange or incipient wetness impregnation. Finally, the incorporated molecule is reduced or oxidized or further reacted with secondarily-incorporated molecule to form nanostructured material in mesoporous material.
    Type: Application
    Filed: January 29, 2002
    Publication date: August 14, 2003
    Inventors: Kuei-Jung Chao, Chia-Min Yang
  • Patent number: 6376382
    Abstract: A method for forming an opening is provided. The method contains forming a dielectric layer on the substrate. The dielectric layer is patterned to form a first-stage opening. A carbonic-polymer (C-polymer) concentration controlling treatment is performed to obtain a proper C-polymer concentration, which can be raised, reduced, or even down to a zero concentration. After the proper C-polymer concentration is obtained, a next-stage opening is formed by another step of etching. The C-polymer concentration controlling treatment and the etching process with a new condition for each step can be repeated until a desired opening is formed.
    Type: Grant
    Filed: December 30, 1998
    Date of Patent: April 23, 2002
    Assignee: United Microelectronics Corp.
    Inventors: Jung-Chao Chiou, Hsiao-Pang Chou
  • Patent number: 6277727
    Abstract: This invention relates to a method of forming a landing pad on a semiconductor wafer comprising a silicon substrate, a dielectric layer, a passivation layer and a photo-resist layer. The photo-resist layer comprises a hole penetrating to the surface of the passivation layer which defines the position of the landing pad. An anisotropic etching through the hole is performed to vertically remove the passivation layer and a predetermined thickness of the dielectric layer under the hole to form a recess, and then the photo-resist layer is removed. A filling layer is deposited on the passivation layer and the recess. An etch-back process is performed to remove the filling layer on the bottom portion of the recess and form a circular spacer on the surrounding portion of the recess. Another anisotropic etching is performed to vertically remove the dielectric layer under the recess and down to the surface of the silicon substrate which forms a plug hole, over which the circular spacer is used as a hard mask.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: August 21, 2001
    Assignee: United Microelectronics Corp.
    Inventors: Chien-Li Kuo, Jung-Chao Chiou