Patents by Inventor Jung-Chih Kuo

Jung-Chih Kuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7933015
    Abstract: A mark for alignment and overlay, a mask having the same, and a method of using the same are provided. The mark includes a first mark pattern and a second mark pattern. The first mark pattern includes a first pattern and a second pattern, and the second mark pattern includes a third pattern and a fourth pattern. The first pattern includes a plurality of rectangular regions arranged in a first direction, and for each rectangular region, a sideline in a second direction is longer than a sideline in the first direction, wherein the first direction is perpendicular to the second direction. The second pattern is disposed on both sides of the first pattern in the second direction and includes a plurality of rectangular regions arranged in the second direction, and for each rectangular region, the sideline in the first direction is longer than a sideline in the second direction.
    Type: Grant
    Filed: February 22, 2008
    Date of Patent: April 26, 2011
    Assignee: Nanya Technology Corp.
    Inventors: Chui-Fu Chiu, Jung-Chih Kuo
  • Publication number: 20090040536
    Abstract: A mark for alignment and overlay, a mask having the same, and a method of using the same are provided. The mark includes a first mark pattern and a second mark pattern. The first mark pattern includes a first pattern and a second pattern, and the second mark pattern includes a third pattern and a fourth pattern. The first pattern includes a plurality of rectangular regions arranged in a first direction, and for each rectangular region, a sideline in a second direction is longer than a sideline in the first direction, wherein the first direction is perpendicular to the second direction. The second pattern is disposed on both sides of the first pattern in the second direction and includes a plurality of rectangular regions arranged in the second direction, and for each rectangular region, the sideline in the first direction is longer than a sideline in the second direction.
    Type: Application
    Filed: February 22, 2008
    Publication date: February 12, 2009
    Applicant: NANYA TECHNOLOGY CORP.
    Inventors: Chui-Fu CHIU, Jung-Chih KUO
  • Patent number: 7056631
    Abstract: An exposure system with group compensation. The exposure system includes a lot classification database, a compensation unit and a first exposure device. The lot classification database records a group classification of at least one lot wafer. The compensation unit obtains the group classification of the lot wafer from the lot classification database, retrieves a group compensation value according to the group classification, and compensates overlay parameters according to the group compensation value. The first exposure device performs a back-end process including overlay and exposure processes on the lot wafer using the compensated overlay parameters.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: June 6, 2006
    Assignee: Nanya Technology Corporation
    Inventors: Jung-Chih Kuo, Jen-Ho Chen
  • Patent number: 7046332
    Abstract: An exposure system with group compensation. The exposure system includes a lot classification database, a compensation unit and a first exposure device. The lot classification database records a group classification of at least one lot wafer. The compensation unit obtains the group classification of the lot wafer from the lot classification database, retrieves a group compensation value according to the group classification, and compensates overlay parameters according to the group compensation value. The first exposure device performs a back-end process including overlay and exposure processes on the lot wafer using the compensated overlay parameters.
    Type: Grant
    Filed: July 28, 2003
    Date of Patent: May 16, 2006
    Assignee: Nanya Technology Corporation
    Inventors: Jung-Chih Kuo, Jen-Ho Chen
  • Publication number: 20050112480
    Abstract: An exposure system with group compensation. The exposure system includes a lot classification database, a compensation unit and a first exposure device. The lot classification database records a group classification of at least one lot wafer. The compensation unit obtains the group classification of the lot wafer from the lot classification database, retrieves a group compensation value according to the group classification, and compensates overlay parameters according to the group compensation value. The first exposure device performs a back-end process including overlay and exposure processes on the lot wafer using the compensated overlay parameters.
    Type: Application
    Filed: December 28, 2004
    Publication date: May 26, 2005
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventors: Jung-Chih Kuo, Jen-Ho Chen
  • Patent number: 6873399
    Abstract: An exposure system. The exposure system includes a compensation unit and an exposure device. The compensation unit receives at least one adjustment value of a corresponding equipment parameter, and compensates a corresponding overlay parameter according to the adjustment value and an adjustment formula corresponding to the equipment parameter. The exposure device performs overlay and exposure processes on a wafer using the compensated overlay parameter.
    Type: Grant
    Filed: July 28, 2003
    Date of Patent: March 29, 2005
    Assignee: Nanya Technology Corporation
    Inventor: Jung-Chih Kuo
  • Publication number: 20040219442
    Abstract: An exposure system with group compensation. The exposure system includes a lot classification database, a compensation unit and a first exposure device. The lot classification database records a group classification of at least one lot wafer. The compensation unit obtains the group classification of the lot wafer from the lot classification database, retrieves a group compensation value according to the group classification, and compensates overlay parameters according to the group compensation value. The first exposure device performs a back-end process including overlay and exposure processes on the lot wafer using the compensated overlay parameters.
    Type: Application
    Filed: July 28, 2003
    Publication date: November 4, 2004
    Applicant: Nanya Technology Corporation
    Inventors: Jung-Chih Kuo, Jen-Ho Chen
  • Publication number: 20040218159
    Abstract: An exposure system. The exposure system includes a compensation unit and an exposure device. The compensation unit receives at least one adjustment value of a corresponding equipment parameter, and compensates a corresponding overlay parameter according to the adjustment value and an adjustment formula corresponding to the equipment parameter. The exposure device performs overlay and exposure processes on a wafer using the compensated overlay parameter.
    Type: Application
    Filed: July 28, 2003
    Publication date: November 4, 2004
    Applicant: Nanya Technology Corporation
    Inventor: Jung-Chih Kuo