Patents by Inventor Jung-Dae Han

Jung-Dae Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8603919
    Abstract: A semiconductor device fabricating method includes forming an etch target layer and a first hard mask layer over a substrate, forming a second hard mask pattern having lines over the first hard mask layer, forming a third hard mask layer over the second hard mask pattern, forming a sacrificial pattern over the third hard mask layer, forming a cell spacer on sidewalls of the sacrificial pattern, removing the sacrificial pattern, etching the third hard mask layer using the cell spacer as an etch barrier, etching the first hard mask layer using the third hard mask pattern and the second hard mask pattern as etch barriers, forming an elliptical opening having an axis pointing in a second direction by etching the etch target layer, and forming a silicon layer that fills the elliptical opening.
    Type: Grant
    Filed: May 18, 2012
    Date of Patent: December 10, 2013
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jung-Dae Han
  • Publication number: 20130157441
    Abstract: A semiconductor device fabricating method includes forming an etch target layer and a first hard mask layer over a substrate, forming a second hard mask pattern having lines over the first hard mask layer, forming a third hard mask layer over the second hard mask pattern, forming a sacrificial pattern over the third hard mask layer, forming a cell spacer on sidewalls of the sacrificial pattern, removing the sacrificial pattern, etching the third hard mask layer using the cell spacer as an etch barrier, etching the first hard mask layer using the third hard mask pattern and the second hard mask pattern as etch barriers, forming an elliptical opening having an axis pointing in a second direction by etching the etch target layer, and forming a silicon layer that fills the elliptical opening.
    Type: Application
    Filed: May 18, 2012
    Publication date: June 20, 2013
    Inventor: Jung-Dae HAN
  • Patent number: 6138607
    Abstract: A device for automatically preparing and feeding liquid feed stuff for piglets. The device conserves labor and time while feeding the weanling piglets and improves both the feeding effect for SEW piglets and the feeding and mothering effect for weakened or motherless piglets. The device has a warm water supply unit, a dry feed stuff supply unit, and a mixing unit. The mixing unit repeatedly receives predetermined amounts of warm water and dry feed stuff from associated units under the control of a main controller at predetermined intervals prior to appropriately mixing the dry feed stuff with the warm water every time, thus forming liquid feed stuff prior to selectively supplying the liquid feed stuff to a plurality of feeding troughs for piglets.
    Type: Grant
    Filed: October 22, 1998
    Date of Patent: October 31, 2000
    Assignee: Republic of Korea represented by Rural Developement Administration
    Inventors: Yong-Hee Ru, Duck-Soo Lee, Jung-Dae Han