Abstract: Provided is plasma block for a remote plasma source, and more particularly, is a plasma block that induces plasma to be generated and to flow between a remote plasma source and a vacuum chamber during a cleaning process performed on the vacuum chamber by the remote plasma source. The plasma block includes an external connection path and an internal connection path, which are formed as two sub-blocks connected to each other are combined, wherein the internal connection path includes a linear extending portion that extends in a straight line along a length direction of the internal connection path, and a curve extending portion that extends in a curve to form a curved surface based on a location where the internal connection path and the external connection path contact each other, wherein the curve extending portion has a spherical surface of a complex spherical surface.

Abstract: Provided is plasma block for a remote plasma source, and more particularly, is a plasma block that induces plasma to be generated and to flow between a remote plasma source and a vacuum chamber during a cleaning process performed on the vacuum chamber by the remote plasma source. The plasma block includes an external connection path and an internal connection path, which are formed as two sub-blocks connected to each other are combined, wherein the internal connection path includes a linear extending portion that extends in a straight line along a length direction of the internal connection path, and a curve extending portion that extends in a curve to form a curved surface based on a location where the internal connection path and the external connection path contact each other, wherein the curve extending portion has a spherical surface of a complex spherical surface.

Abstract: The present invention relates to an electric power monitoring device, and particularly to an electric power monitoring device for monitoring a quality of alternating current power. According to an embodiment of the present invention, an electric power monitoring device is provided with a first connection portion, a second connection portion and a cable that connects the first connection portion to the second connection portion and comprises a measuring unit for measuring alternating current power quality; a processing unit which is connected to the measuring unit to convert the measured power quality to data; and a display which is connected to the processing unit to display the data on a screen. The electric power monitoring device is used for an apparatus having an alternating current power input unit.

Abstract: Provided is a byproduct collecting apparatus for efficiently collecting reaction-byproducts contained in an exhaust gas exhausted from a process chamber during a semiconductor manufacturing process. The apparatus includes a housing and a trap module. The housing has a gas inlet port and a gas outlet port. The trap module is installed inside the housing and has first plates curved or inclined to guide an exhaust gas flow in a curved fashion.

Abstract: Provided is a byproduct collecting apparatus for efficiently collecting reaction-byproducts contained in an exhaust gas exhausted from a process chamber during a semiconductor manufacturing process. The apparatus includes a housing and a trap module. The housing has a gas inlet port and a gas outlet port. The trap module is installed inside the housing and has first plates curved or inclined to guide an exhaust gas flow in a curved fashion.