Patents by Inventor Jung-hee Kim

Jung-hee Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010023286
    Abstract: The present invention provides an optical polyimide compound defined by the following formula in an optical high polymer material: 1
    Type: Application
    Filed: March 7, 2001
    Publication date: September 20, 2001
    Inventors: Kyung-Hee You, Kwan-Soo Han, Tae-Hyung Rhee, Eun-Ji Kim, Jung-Hee Kim, Woo-Hyeuk Jang
  • Patent number: 6233388
    Abstract: The present invention discloses a polymer optical waveguide and a method of fabricating the same. The polymer optical waveguide comprises a core formed of polymer containing fluoride (F) of a 12-37 wt % on the basis of total weight of the polymer, and having repeating units with at least two —C(═O)—N—C(═O) functional groups or at least four —N—C(═O)— functional groups; and a cladding in contact with the core and formed of polymer having a refractive index lower than the polymer for forming the core. If a core layer is etched according to the ICP etching method, the etch rate becomes at least three times faster than that of the conventional RIE etching method. Also, etching characteristics including uniformity of an etched plane and vertical profile are improved, thereby reducing damage to an optical waveguide. Thus, the light scattering loss of the optical waveguide can be minimized.
    Type: Grant
    Filed: November 5, 1998
    Date of Patent: May 15, 2001
    Assignee: SamSung Electronics Co., Ltd.
    Inventors: Eun-Ji Kim, Jung-Hee Kim, Woo-Hyuk Jang, Kwan-Soo Han, Tae-Hyung Rhee
  • Patent number: 6177290
    Abstract: A method of fabricating a planar optical waveguide in one chamber, comprising the steps of depositing a cladding layer and a core layer on a substrate, depositing an etch mask layer on the core layer, and forming a photoresist pattern on the etch mask layer. An etch mask pattern is formed by etching the etch mask layer according to the photoresist pattern using a first gas which reacts with the material of the etch mask layer, and removing the first gas. An optical waveguide is formed by etching the core layer according to the etch mask pattern using a second gas which reacts with the material of the core layer in the same chamber as the chamber where the above steps were performed, and removing the photoresist pattern and the second gas.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: January 23, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woo-hyuk Jang, Sang-yun Yi, Byong-gwon You, Jung-hee Kim, Tae-hyung Rhee
  • Patent number: 6062051
    Abstract: The present invention relates to a dial lock slide for slide fasteners used for bags or trunks, made capable of altering the dial code at will that opening the lock may become impossible for others, through its characteristic construction, wherein a slide (1) on one side has a lock bar (13) which has key (14) in projection, while another slide (2) on the other side has a cylinder (23) which has slit (23a); cylinder (23) is inserted, keeping said lock devices (30) rotatable; and a lock ring (41) with a polygonal outer surface (42) corresponding to a polygonal inner surface (33) of an inward-turning flange (32) and also inner key grooves (43) is inserted, rotatably, in a dial ring (31), which has said inward-turning flange (32) and a polygonal inner surface (33) on one side.
    Type: Grant
    Filed: May 17, 1996
    Date of Patent: May 16, 2000
    Inventors: Du Hyun Nam, Jung Hee Kim