Patents by Inventor Jung-Hsin Wei

Jung-Hsin Wei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
    Publication number: 20110318686
    Abstract: The present invention provides a positive photosensitive resin composition, including an alkali soluble phenolic resin; an alkali soluble acrylic resin; and a photosensitive compound having quinone diazide. The positive photosensitive resin composition is applicable to a semi-additive process for forming tiny and fine wirings.
    Type: Application
    Filed: April 18, 2011
    Publication date: December 29, 2011
    Applicant: EVERLIGHT USA, INC.
    Inventors: Yen-Cheng Li, Nai-Tien Chou, Jung-Hsin Wei