Patents by Inventor Jung Hyang Kim

Jung Hyang Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5281350
    Abstract: The present invention provides an improved glass etching composition which does not contain any causative materials such as hydrofluoric acid, causing environmental pollution. The etching composition comprises a first solution of a flow modifier and ammonium bifluoride in purified glycerine; and a second solution of ammonium bifluoride and ferric chloride in purified glycerine.
    Type: Grant
    Filed: October 30, 1992
    Date of Patent: January 25, 1994
    Assignee: Tae Hwan Kim
    Inventors: Soon Ho Gimm, Jung Hyang Kim