Abstract: The present invention relates to an adhesive substrate for forming a conductive pattern, which includes an adhesive substrate, and a precursor pattern of a conductive pattern, or a conductive pattern, provided on one side of the adhesive substrate, a method for preparing a conductive pattern using the adhesive substrate, a conductive pattern prepared using the adhesive substrate, and an electronic device including the conductive pattern.

Abstract: The present invention relates to a conductive ink composition including metal particles, a first solvent having a vapor pressure of 3 torr or less at 25° C., a second solvent having a vapor pressure of more than 3 torr at 25° C., and metal carboxylate, a printing method using the same, and a conductive pattern manufactured by using the same.

Abstract: Provided are an ink composition for a printing method, in which the ink composition is applied to a printing blanket, a portion of a coating film is removed using a cliche, and then the coating film remaining on the printing blanket is transferred to an object to be printed, in which the ink composition before printing satisfies the following [Equation 1] [INKST?BNK?c] and the ink coating film on the printing blanket satisfies the following [Equation 2] [BNK?c?INKSE?SUBSE] immediately before the removal of the portion of the ink coating film from the printing blanket using the cliche, and a printing method using the same.

Abstract: [Summary] The present invention relates to an apparatus for manufacturing polymer particles and a method for manufacturing the same. The present invention provides an apparatus and a method, by which polymer particles having excellent monodispersity and homogeneous physical properties, such as homogeneous cross-linking degree and polymerization degree, may be efficiently prepared. In the present invention, particles having excellent monodispersity with the desired particle diameter, and also having a high cross-linking degree or a core-shell or core-double shell structure may also be effectively prepared. In addition, the processes for manufacturing said polymer particles are exceptionally reproducible in the present invention.

Abstract: [Summary] The present invention relates to an apparatus for manufacturing polymer particles and a method for manufacturing the same. The present invention provides an apparatus and a method, by which polymer particles having excellent monodispersity and homogeneous physical properties, such as homogeneous cross-linking degree and polymerization degree, may be efficiently prepared. In the present invention, particles having excellent monodispersity with the desired particle diameter, and also having a high cross-linking degree or a core-shell or core-double shell structure may also be effectively prepared. In addition, the processes for manufacturing said polymer particles are exceptionally reproducible in the present invention.

Abstract: The present invention discloses the substrate and the micro reactor for mixing two kinds of fluids. The micro reactor of the present invention comprises a housing having first and second inlet ports and an outlet port formed thereon; and a plurality of substrates stacked in the housing, wherein the substrate has a space formed at a central portion thereof in one direction; a plurality of first channels extended from one side thereof to the space and corresponding to the first inlet port; and a plurality of second channels extended from the other side thereof to the space and corresponding to the second inlet port; wherein a portion between two neighboring first channels corresponds to the second channel and a portion between two neighboring second channels corresponds to the first channel to form sequentially reaction interfaces of the first and second fluids in the space.

Abstract: Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.

Abstract: The present invention discloses the substrate and the micro reactor for mixing two kinds of fluids. The micro reactor of the present invention comprises a housing having first and second inlet ports and an outlet port formed thereon; and a plurality of substrates stacked in the housing, wherein the substrate has a space formed at a central portion thereof in one direction; a plurality of first channels extended from one side thereof to the space and corresponding to the first inlet port; and a plurality of second channels extended from the other side thereof to the space and corresponding to the second inlet port; wherein a portion between two neighboring first channels corresponds to the second channel and a portion between two neighboring second channels corresponds to the first channel to form sequentially reaction interfaces of the first and second fluids in the space.

Abstract: A stack type reactor that can adjust a length of channel (reaction time) to react raw substances with each other for a sufficient time and mix completely raw substances to maximize the reaction efficiency. The stack type reactor comprises an upper block with at least two inlets that introduce different kinds of raw substances and a lower channel fluidly connected to the inlets and formed at a lower surface thereof; a unit block including an upper channel corresponding to the lower channel of the upper block and formed on an upper surface thereof, the unit block including a lower channel formed at a lower surface thereof and fluidly connected with the upper channel via a connecting flow passage. The upper block and unit block form a flow path for the raw substances by connecting to the lower channel of the upper block to the upper channel of the unit block.

Abstract: Disclosed is a method for preparing metal nanoparticles, the method comprising the steps of: providing a solution of metal salt and a solution of a strong reducing agent with a standard reduction potential of ?0.23V or lower; and mixing the solutions by using a micro mixer without supplying additional heat energy from the exterior, while carrying out reduction of the metal. Metal nanoparticles obtained by the above method, and a micro mixer for preparing the metal nanoparticles are also disclosed. The method for preparing metal nanoparticles via the reduction of metal ions in a solution uses a strong reducing agent and a micro mixer. Therefore, it is possible to obtain metal nanoparticles having a particle size of 20 nm or more and a uniform shape and dimension without supplying additional heat energy from the exterior. Additionally, the method is amenable to a continuous process, and thus ensures cost-efficiency and stable product quality required for mass production.

Abstract: Provided are an ink composition for an etching resist, a method of forming an etching resist pattern using the ink composition, and a method of forming a microchannel using the ink composition. The ink composition is suitable for forming a micro pattern due to its poor spreading on the substrate and is suitable for etching-resist for copper of a printed circuit board and deep etching a stainless steel substrate due to its excellent chemical properties that allow it to resist an etching solution.