Patents by Inventor Jung Hyung Kim

Jung Hyung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9380438
    Abstract: A method and device are provided for forwarding an incoming call according to a remaining battery capacity. The method includes determining that the remaining battery capacity is below a threshold; providing an indication that the remaining battery capacity is below the threshold and that a call forwarding function may be set; receiving an input from a user to select a contact number; and sending, to an adjacent base station, a request for call forwarding an incoming call to the selected contact number.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 28, 2016
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Pyeong-Gyu Jin, Jae-Chan Koh, Jung-Hyung Kim, Jong-Hyun Park, Jae-Bong Chun, Yoon-Jeong Choi
  • Publication number: 20160150483
    Abstract: An electronic device includes a communication interface configured to establish a communication channel; and a controller configured to adjust an amplification current of a signal outputted through the communication channel corresponding to a measured Adjacent channel leakage ratio (ACLR) based on the communication channel, wherein the controller is configured to adjust a size of the amplification current corresponding to a difference between the measured ACLR and a specified condition.
    Type: Application
    Filed: November 25, 2015
    Publication date: May 26, 2016
    Inventors: Jung Hyung Kim, Jung Joon Kim, Ju Ho Van, Yu Seon Lee
  • Patent number: 9113474
    Abstract: A method and an apparatus for resource allocation are provided. The method includes measuring the temperature of the mobile terminal, sending, when the measured temperature exceeds an upper threshold temperature set in advance, a request for reduced resource allocation to a corresponding base station, receiving a message for reduced resource allocation corresponding to the sent request from the base station, and performing communication according to reduced resource allocation. Hence, the temperature of the mobile terminal can be kept within an appropriate range.
    Type: Grant
    Filed: May 4, 2012
    Date of Patent: August 18, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jung Hyung Kim
  • Publication number: 20140302833
    Abstract: A method and device are provided for forwarding an incoming call according to a remaining battery capacity. The method includes determining that the remaining battery capacity is below a threshold; providing an indication that the remaining battery capacity is below the threshold and that a call forwarding function may be set; receiving an input from a user to select a contact number; and sending, to an adjacent base station, a request for call forwarding an incoming call to the selected contact number.
    Type: Application
    Filed: April 7, 2014
    Publication date: October 9, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Pyeong-Gyu JIN, Jae-Chan KOH, Jung-Hyung KIM, Jong-Hyun PARK, Jae-Bong CHUN, Yoon-Jeong CHOI
  • Publication number: 20140194099
    Abstract: A method and apparatus for providing information about a plurality of wireless charging pads to an electronic device such that the electronic device performs wireless charging efficiently is provided. The method includes receiving information about the plurality of wireless charging pads and displaying the information about the plurality of wireless charging pads on a screen of the electronic device.
    Type: Application
    Filed: January 8, 2014
    Publication date: July 10, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ji-Hyun PARK, Jung-Hyung KIM, Bo-Ram NAMGOONG, Samg-Mi PARK, Sung-Kwang YANG, Bo-Kun CHOI
  • Publication number: 20140148014
    Abstract: A substrate processing apparatus and method includes a chamber, a remote plasma source outside the chamber to provide activated ammonia and activated hydrogen fluoride into the chamber, and a direct plasma source to provide ion energy to a substrate inside the chamber. The plasma source includes ground electrodes extending in a first direction on a first plane perpendicularly spaced apart from a plane on which the substrate is disposed and defined by the first direction and a second direction perpendicular to the first direction and power electrodes disposed between the ground electrodes, extending in the first direction parallel to each other and receiving power from an RF power source to generate plasma between adjacent ground electrodes. The activated ammonia and the activated hydrogen fluoride are supplied on the substrate through a space between the power electrode and the ground electrode.
    Type: Application
    Filed: November 18, 2013
    Publication date: May 29, 2014
    Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: ShinJae You, Jung-Hyung Kim, Yong-Hyung Shin, Dae-Jin Seong, Daewoong Kim
  • Publication number: 20130017851
    Abstract: A method and an apparatus for resource allocation are provided. The method includes measuring the temperature of the mobile terminal, sending, when the measured temperature exceeds an upper threshold temperature set in advance, a request for reduced resource allocation to a corresponding base station, receiving a message for reduced resource allocation corresponding to the sent request from the base station, and performing communication according to reduced resource allocation. Hence, the temperature of the mobile terminal can be kept within an appropriate range.
    Type: Application
    Filed: May 4, 2012
    Publication date: January 17, 2013
    Applicant: SAMSUNG ELECTRONICS CO. LTD.
    Inventor: Jung Hyung KIM
  • Publication number: 20100282711
    Abstract: Provided are a process monitoring apparatus and method. The process monitoring apparatus includes a process chamber in which a process is performed, a probe assembly disposed on the process chamber, and comprising a probe electrode, a plasma generator generating plasma around the probe assembly, and a drive processor applying an alternating current (AC) voltage having at least 2 fundamental frequencies to the probe assembly, and extracting process monitoring parameters.
    Type: Application
    Filed: December 12, 2008
    Publication date: November 11, 2010
    Inventors: Chin-Wook Chung, Minhyong Lee, Sung-Ho Jang, Ik-Jin Choi, Jung-Hyung Kim, Yong-Hyeon Shin
  • Publication number: 20080000585
    Abstract: The present invention relates to an apparatus and method for monitoring an electron density and electron temperature of a plasma.
    Type: Application
    Filed: August 24, 2006
    Publication date: January 3, 2008
    Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: Jung Hyung Kim, Ju Young Yun, Dae Jin Seong
  • Patent number: 7061184
    Abstract: The present invention discloses a device for measuring and monitoring electron density of plasma. The device includes a chamber filled with plasma having varying electron density; a frequency probe having transmission/receiving antennas and a pair of waveguides, one end of which is mounted in the chamber, for radiating and receiving electromagnetic waves; an electromagnetic wave generator electrically connected to one of the waveguides of the frequency probe for generating electromagnetic waves; and a frequency analyzer for scanning the frequency of received electromagnetic waves and analyzing the scanned frequency with respect to the amplitude of the received electromagnetic waves. Coupled to the rear end of the frequency probe is preferably a transfer unit having a hydraulic cylinder structure such that the frequency probe is moved in the chamber to detect the spatial distribution of electron density.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: June 13, 2006
    Assignee: Korea Research Institute of Standards of Science
    Inventors: Jung Hyung Kim, Yong Hyeon Shin, Kwang Hwa Chung, Sang Cheol Choi
  • Patent number: 7019099
    Abstract: Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are methods for forming insulating film between interconnect layers in semiconductor devices by using the siloxane-based resins thus prepared as low dielectric insulating materials.
    Type: Grant
    Filed: July 18, 2003
    Date of Patent: March 28, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Sang Kook Mah, Eun Ju Nah, Il Sun Hwang, Hyun Dam Jeong, Jung Hyung Kim
  • Patent number: 6904711
    Abstract: Disclosed is a laminating frame employing a partial hologram, in which a photograph or picture is placed. The laminating frame includes a first laminating film of a desired dimension; a backing sheet adhered to the first laminating film and having a dimension slightly less than that of the laminating film; a partial hologram film disposed on the backing sheet and having a rim adhered to the first laminating film and a transparent window of a dimension slightly less than that of the backing sheet, wherein the transparent window is patterned with a plurality of dotted-hologram pixels and the rim is patterned on the upper and lower surfaces of the rim with a plurality of deeply colored hologram pixels; and a second laminating film adhered to the partial hologram film.
    Type: Grant
    Filed: January 21, 2003
    Date of Patent: June 14, 2005
    Assignee: Kugil Special-Papers Co., Ltd.
    Inventor: Jung Hyung Kim
  • Publication number: 20040024164
    Abstract: Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are methods for forming insulating film between interconnect layers in semiconductor devices by using the siloxane-based resins thus prepared as low dielectric insulating materials.
    Type: Application
    Filed: July 18, 2003
    Publication date: February 5, 2004
    Applicant: Samsung Electronic Co., Ltd.
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Sang Kook Mah, Eun Ju Nah, Il Sun Hwang, Hyun Dam Jeong, Jung Hyung Kim
  • Patent number: 6687626
    Abstract: A flux distribution measuring apparatus measures distribution of flow rates of a flowable medium. The measuring apparatus includes thin metal wire(s) for scanning a flowable medium and lead wires connected to the thin metal wire(s), wherein a voltage difference is detected between adjacent lead wires while the measuring apparatus scans the flowable medium in the direction perpendicular to a flow path of the flowable medium. The voltage differences are generated due to temperature changes in the thin metal wire(s) while scanning the flowable medium having different flow rates. The measuring apparatus visualizes the distribution of flow rates of a flowable medium using a computer which receives and processes the voltage differences detected.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: February 3, 2004
    Assignee: Korea Research Institute of Standars and Science
    Inventors: Dae Jin Seong, Yong Hyeon Shin, Jung Hyung Kim, Jong Yeon Lim, Kwang Hwa Jung
  • Patent number: 6623711
    Abstract: Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are methods for forming insulating film between interconnect layers in semiconductor devices by using the siloxane-based resins thus prepared as low dielectric insulating materials.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: September 23, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Sang Kook Mah, Eun Ju Nah, Il Sun Hwang, Hyun Dam Jeong, Jung Hyung Kim
  • Publication number: 20030136040
    Abstract: Disclosed is a laminating frame employing a partial hologram, in which a photograph or picture is placed. The laminating frame includes a first laminating film of a desired dimension; a backing sheet adhered to the first laminating film and having a dimension slightly less than that of the laminating film; a partial hologram film disposed on the backing sheet and having a rim adhered to the first laminating film and a transparent window of a dimension slightly less than that of the backing sheet, wherein the transparent window is patterned with a plurality of dotted-hologram pixels and the rim is patterned on the upper and lower surfaces of the rim with a plurality of deeply colored hologram pixels; and a second laminating film adhered to the partial hologram film.
    Type: Application
    Filed: January 21, 2003
    Publication date: July 24, 2003
    Applicant: Kugil Special-Papers Co., Ltd.
    Inventor: Jung Hyung Kim
  • Publication number: 20030065123
    Abstract: Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are methods for forming insulating film between interconnect layers in semiconductor devices by using the siloxane-based resins thus prepared as low dielectric insulating materials.
    Type: Application
    Filed: March 27, 2002
    Publication date: April 3, 2003
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Sang Kook Mah, Eun Ju Nah, Il Sun Hwang, Hyun Dam Jeong, Jung Hyung Kim
  • Publication number: 20020134170
    Abstract: A flux distribution measuring apparatus measures distribution of flow rates of a flowable medium. The measuring apparatus includes thin metal wire(s) for scanning a flowable medium and lead wires connected to the thin metal wire(s), wherein a voltage difference is detected between adjacent lead wires while the measuring apparatus scans the flowable medium in the direction perpendicular to a flow path of the flowable medium. The voltage differences are generated due to temperature changes in the thin metal wire(s) while scanning the flowable medium having different flow rates. The measuring apparatus visualizes the distribution of flow rates of a flowable medium using a computer which receives and processes the voltage differences detected.
    Type: Application
    Filed: February 19, 2002
    Publication date: September 26, 2002
    Inventors: Dae Jin Seong, Yong Hyeon Shin, Jung Hyung Kim, Jong Yeon Lim, Kwang Hwa Jung
  • Patent number: 6432834
    Abstract: An etching method in which the etch selectivity of a metal silicide film with respect to a polysilicon film can be increased when a polycide film is etched by plasma enhanced etching, is provided. This method is accomplished by repeating (a) plasma etching the metal silicide film with a plasma source power applied to an etch chamber, using etch gas ions accelerated by applying a bias power to a substrate, and (b) chemically adsorbing the etch gas ions on the metal silicide film and oxidizing the polysilicon film exposed using the etch gas ions, by continuously applying the plasma source power to the etch chamber and preventing application of the bias power applied to the substrate or applying a level of bias power at which the etch gas ions are not accelerated.
    Type: Grant
    Filed: June 16, 2000
    Date of Patent: August 13, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jung-hyung Kim