Abstract: A remote control with a waterproof function includes a case including an upper case having button holes and a lower case assembled to the upper case at a lower portion of the upper case, a printed circuit board PCB embedded between the both cases, and a rubber keypad embedded in the case so as to be positioned between the upper case and the PCB and having buttons passing through the button holes. Barriers protruding upward or downward along the edges of the rubber keypad are provided, and when the both cases are coupled with the rubber keypad interposed therebetween, the side portions of the lower case and the lower ends of the barriers are in close contact with each other and the inner surface of the upper case and the upper ends of the barriers are in close contact with each other, thereby providing waterproof function.

Abstract: A remote control with a waterproof function includes a case including an upper case having button holes and a lower case assembled to the upper case at a lower portion of the upper case, a printed circuit board PCB embedded between the both cases, and a rubber keypad embedded in the case so as to be positioned between the upper case and the PCB and having buttons passing through the button holes. Barriers protruding upward or downward along the edges of the rubber keypad are provided, and when the both cases are coupled with the rubber keypad interposed therebetween, the side portions of the lower case and the lower ends of the barriers are in close contact with each other and the inner surface of the upper case and the upper ends of the barriers are in close contact with each other, thereby providing waterproof function.

Abstract: A remote control with a waterproof function, according to an embodiment of the present invention, includes a case including an upper case having a plurality of button holes and a lower case assembled to the upper case at a lower portion of the upper case, a printed circuit board PCB embedded between the upper case and the lower case, and a rubber keypad, which is embedded between the upper case and the lower case so as to mounted to surround the side portions of the PCB and has a plurality of buttons that pass through the plurality of button holes and barrier parts that come into close contact with the inner surface of the upper case and the inner surface of the lower case, where the upper case and the lower case come into contact with each other.

Abstract: There is provided a method of optimizing recipe of in-situ cleaning process for process chamber after a specific process on semiconductor wafers by using Residual Gas Analyzer Quadrupole Mass Spectrometer (RGA-QMS) According to the present invention, a Chemical Vapor Deposition (CVD) apparatus for manufacturing semiconductor devices comprises: a process chamber; process gas supply line for supplying process gas into the process chamber; a waste-gas exhaust line for removing the waste-gas from the process chamber after process; a supply line for supplying a ClF3 gas into the process chamber; a sampling manifold for sampling the gas inside process chamber by using pressure difference; and RGA-QMS for analyzing the sampling gas, and the optimization of the end points according to gas flow, pressure, and temperature of the cleaning process for the process chamber is achieved through the analysis by above RGA-QMS.

Abstract: There is provided a method of optimizing recipe of in-situ cleaning process for process chamber after a specific process on semiconductor wafers by using Residual Gas Analyzer Quadrupole Mass Spectrometer (RGA-QMS). According to the present invention, a Chemical Vapor Deposition (CVD) apparatus for manufacturing semiconductor devices comprises: a process chamber; process gas supply line for supplying process gas into the process chamber; a waste-gas exhaust line for removing the waste-gas from the process chamber after process; a supply line for supplying a ClF3 gas into the process chamber; a sampling manifold for sampling the gas inside process chamber by using pressure difference; and RGA-QMS for analyzing the sampling gas, and the optimization of the end points according to gas flow, pressure, and temperature of the cleaning process for the process chamber is achieved through the analysis by above RGA-QMS.

Abstract: There is provided a method of optimizing recipe of in-situ cleaning process for process chamber after a specific process on semiconductor wafers by using Residual Gas Analyzer Quadrupole Mass Spectrometer (RGA-QMS). According to the present invention, a Chemical Vapor Deposition (CVD) apparatus for manufacturing semiconductor devices comprises: a process chamber; process gas supply line for supplying process gas into the process chamber; a waste-gas exhaust line for removing the waste-gas from the process chamber after process; a supply line for supplying a CIF3 gas into the process chamber; a sampling manifold for sampling the gas inside process chamber by using pressure difference; and RGA-QMS for analyzing the sampling gas, and the optimization of the end points according to gas flow, pressure, and temperature of the cleaning process for the process chamber is achieved through the analysis by above RGA-QMS.

Abstract: There is provided a method of optimizing recipe of in-situ cleaning process for process chamber after a specific process on semiconductor wafers by using Residual Gas Analyzer Quadrupole Mass Spectrometer (RGA-QMS). According to the present invention, a Chemical Vapor Deposition (CVD) apparatus for manufacturing semiconductor devices comprises: a process chamber; process gas supply line for supplying process gas into the process chamber; a waste-gas exhaust line for removing the waste-gas from the process chamber after process; a supply line for supplying a CiF3 gas into the process chamber; a sampling manifold for sampling the gas inside process chamber by using pressure difference; and RGA-QMS for analyzing the sampling gas, and the optimization of the end points according to gas flow, pressure, and temperature of the cleaning process for the process chamber is achieved through the analysis by above RGA-QMS.