Abstract: Provided is an internet of things based health monitoring and assessment platform including: a health context acquirer configured to acquire health contexts from sensors of one or more IoT devices; a user manager configured to store and manage information on a user; a health context manager configured to store and manage the health contexts acquired from the health context acquirer; a health context normalizer configured to convert and normalize the values of the health contexts acquired from the health context acquirer to converted values between 0 and 1, in which when the value of the health context belongs to a normal range, the converted value is 1 and the converted value has a value closer to 0 as farther away from the normal range; and a health index calculator configured to calculate health indexes expressing a body health status in one aspect, in which manage information on the health context for each health index and a weight set for each health context according to an importance in which each health

Abstract: Disclosed herein is a system and method for dynamically identifying devices in an Internet of things environment configured such that devices and an IoT application server are connected based on the Internet. The system includes devices, each having a profile distribution component for transmitting a profile thereof to an IoT application server; and the IoT application server for identifying, managing, and connecting each device, wherein the IoT application server includes a device pool manager for receiving a profile from the device, storing the profile in an active device pool, and managing the profile of the device; an active device pool for storing the profile; and an IoT service unit for receiving notification that a new device has been discovered from the device pool manager, and dynamically checking discovery of the new device by scanning the active device pool for a profile of each device at a predetermined time.

Abstract: Disclosed herein is a system for mediating heterogeneous data exchange schemes between devices in an Internet of things environment, the Internet of things environment including devices having network/Internet ability and a server connected to the devices, including an Internet of things (IoT) application unit provided in a server and connected to devices to interact with the devices so that data is exchanged with the devices or the devices are used; and one or more devices, each having an adapter configured to convert different interfaces for respective devices into a unified interface using an adapter pattern, and provide a unified generic interface, thus unifying data exchange schemes with the IoT application unit.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a nonionic surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the surfactant including one or ore of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or more of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.

Abstract: In a composition for etching silicon oxide, and a method of forming a contact hole using the composition, the composition which includes from about 0.01 to about 2 percent by weight of ammonium bifluoride, from about 2 to about 35 percent by weight of an organic acid, from about 0.05 to about 1 percent by weight of an inorganic acid, and a remainder of a low polar organic solvent. The composition may reduce damages to a metal silicide pattern that may be exposed in an etching process performed for forming the contact hole.

Abstract: In a composition for etching silicon oxide, and a method of forming a contact hole using the composition, the composition which includes from about 0.01 to about 2 percent by weight of ammonium bifluoride, from about 2 to about 35 percent by weight of an organic acid, from about 0.05 to about 1 percent by weight of an inorganic acid, and a remainder of a low polar organic solvent. The composition may reduce damages to a metal silicide pattern that may be exposed in an etching process performed for forming the contact hole.

Abstract: In a composition for etching silicon oxide, and a method of forming a contact hole using the composition, the composition which includes from about 0.01 to about 2 percent by weight of ammonium bifluoride, from about 2 to about 35 percent by weight of an organic acid, from about 0.05 to about 1 percent by weight of an inorganic acid, and a remainder of a low polar organic solvent. The composition may reduce damages to a metal silicide pattern that may be exposed in an etching process performed for forming the contact hole.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a nonionic surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or ore of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.