Abstract: Provided are a process chamber cleaning apparatus and method in which the inside of a process chamber may be cleaned without damaging to an inner wall or a component of the process chamber. The process chamber cleaning apparatus comprising: a chamber housing; a substrate support installed inside the chamber housing, supporting a plurality of semiconductor substrates; a gas supply providing process gases; a first gas injector installed inside the chamber housing, connected to the gas supply, injecting etch gas, which is one of the process gases, into the chamber housing; and a controller controlling operations of the gas supply and the first gas injector, wherein the first gas injector injects the etch gas in a direction twisted at a predetermined angle from a central direction of the chamber housing.

Abstract: A structure for mounting a high-mounted stop lamp. An upper housing and a lower housing are not provided. A stop lamp having a reflector and a lens is placed in a space defined by a cover part of a tailgate trim which is formed to have a configuration for receiving the stop lamp therein. A pair of mounting sections protrudes from left and right portions of a rear wall of the reflector. By the medium of the pair of mounting sections, the reflector is locked by bolts to a tailgate inner panel which is positioned above the reflector and is coupled by clips to the cover part of the tailgate trim which is positioned below the reflector.