Patents by Inventor Jung-Pao Chang

Jung-Pao Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10053557
    Abstract: A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for many different designs of hard disks, such as PMR (perpendicular recording)+TDMR (Two-Dimensional Magnetic Recording), SMR (Shingled Magnetic Recording), HAMR+ (HAMR (Heat Assisted Magnetic Recording)+SMR+TDMR), BPMR+ (BPMR (Bit Pattern Media Recording)+SMR+TDMR), and helium-filled hard disk.
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: August 21, 2018
    Assignee: MIN AIK TECHNOLOGY CO., LTD.
    Inventors: Chi-En Lin, Jung-Pao Chang, Hung-Yu Chi
  • Publication number: 20180079893
    Abstract: A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for many different designs of hard disks, such as PMR (perpendicular recording)+TDMR (Two-Dimensional Magnetic Recording), SMR (Shingled Magnetic Recording), HAMR+ (HAMR (Heat Assisted Magnetic Recording)+SMR+TDMR), BPMR+ (BPMR (Bit Pattern Media Recording)+SMR+TDMR), and helium-filled hard disk.
    Type: Application
    Filed: September 22, 2016
    Publication date: March 22, 2018
    Inventors: Chi-En Lin, Jung-Pao Chang, Hung-Yu Chi
  • Patent number: 8759431
    Abstract: A durable polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a lubricant, an inorganic filler, a nucleating agent including a sodium salt, a stabilizer, an anti-static agent. A ramp is made of the durable polyoxymethylene. The ramp and the durable polyoxymethylene have excellent micro-wear-resistant property.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: June 24, 2014
    Assignee: Min Aik Technology Co., Ltd.
    Inventors: Jung-Pao Chang, Chi-En Lin
  • Publication number: 20120238680
    Abstract: A durable polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a lubricant, an inorganic filler, a nucleating agent including a sodium salt, a stabilizer, an anti-static agent. A ramp is made of the durable polyoxymethylene. The ramp and the durable polyoxymethylene have excellent micro-wear-resistant property.
    Type: Application
    Filed: May 30, 2012
    Publication date: September 20, 2012
    Applicant: MIN AIK TECHNOLOGY CO., LTD.
    Inventors: Jung-Pao Chang, Chi-En Lin
  • Publication number: 20110237727
    Abstract: A durable polyoxymethylene composition and a ramp made of the durable polyoxymethylene composition are disclosed. The durable polyoxymethylene composition of the present invention has excellent micro-wear-resistant property.
    Type: Application
    Filed: June 22, 2010
    Publication date: September 29, 2011
    Inventors: Jung-Pao Chang, Chi-En Lin