Patents by Inventor Jung-Su Lim

Jung-Su Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11974901
    Abstract: Disclosed is a small animal intraventricular injection compensator for injecting a drug into a desired location through a syringe, the compensator including: a guide part provided with a guide hole into which a needle of a syringe is inserted; a body comprising an upper cavity provided inside thereof and a cradle provided to seat the guide part on an upper side thereof; and a fixation part integrally provided with the body or separately provided, and comprising a lower cavity provided to allow a head accommodation space, which a head of a small animal may enter into or exit from, to be provided inside thereof by corresponding to the upper cavity.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: May 7, 2024
    Assignees: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Sung Gurl Park, Kang Hyun Han, Chang Mook Lim, So Ra Park, Hong Su Lee, Jae Bong Lee, Jung Ho Noh, Sang Seop Han
  • Publication number: 20040097534
    Abstract: Disclosed is a composition for protecting nerve cells, promoting nerve cell growth and regenerating nerve cells comprising berberine, derivatives thereof or pharmaceutically acceptable salts thereof. The composition has protective effects against apoptosis of neuronal stem cells and differentiated neuronal stem cells, an effect of inducing the regeneration of nerve cells, a regenerative effect on neurites, a neuroregenerative effect on central nerves and peripheral nerves, a reformation effect on neuromuscular junctions, and a protective effect against apoptosis of nerve cells and a neuroregenerative effect in animals suffering from dementia and brain ischemia. Therefore, the composition can be used as a therapeutic agent for the prevention and treatment of neurodegenerative diseases, ischemic nervous diseases or nerve injuries, and for the improvement of learning capability.
    Type: Application
    Filed: March 14, 2003
    Publication date: May 20, 2004
    Applicant: EUGENBIO INC.
    Inventors: Byung-Kil Choi, Yun-Hee Kim, Soo-Kyung Kim, Jung-Su Lim, Hyo-Sup Kim, Dae-Sung Park, Chi-Young Chang
  • Publication number: 20030224074
    Abstract: Disclosed is a composition for protecting nerve cells, promoting nerve cell growth and regenerating nerve cells comprising a Scutellaria Radix extract. The composition has excellent protective effects against apoptosis of neuronal stem cells and differentiated nerve cells, a positive effect of inducing the regeneration of nerve cells, a regenerative effect on neurites, a neuroregenerative effect on brain nerves and peripheral nerves, a reformation effect on neuromuscular junctions, and a protective effect agaisnt apoptosis of nerve cells and a neuroregenerative effect in animals suffering from dementia and brain ischemia. Therefore, the composition can be used as a therapeutic agent for the prevention and treatment of nerodegenerative diseases, ischemic nervous diseases or nerve injuries, and for the improvement of learning capability.
    Type: Application
    Filed: March 14, 2003
    Publication date: December 4, 2003
    Applicant: EUGENBIO INC.
    Inventors: Byung-Kil Choe, Yun-Hee Kim, Soo-Kyung Kim, Jung-Su Lim, Hyo-Sup Kim, Dae-Sung Park, Chi-Young Chang
  • Patent number: 6454563
    Abstract: A wafer treatment apparatus includes a wafer heating device having a wafer-load region at an upper portion, a shower head opposing the wafer-load region for ejecting/directing a source gas toward the wafer surface, and a reflecting apparatus positioned between the shower head and the heating device for reflecting thermal energy radiated from the heating device back toward the wafer-load region. The reflecting apparatus includes a reflector positioned above and opposing the wafer-load region, and a supporter for supporting the reflector. The reflector may have a flattened reflecting surface facing toward the wafer-load region, or may be a semi-spherical type reflector having a concave mirror facing toward the wafer-load region. The reflector can be controlled to move vertically relative to the wafer.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: September 24, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Su Lim, Kang-Wook Moon, Yong-Woon Son, Heung-Ahn Kwon
  • Publication number: 20020022210
    Abstract: A wafer treatment apparatus includes a wafer heating device having a wafer-load region at an upper portion, a shower head opposing the wafer-load region for ejecting/directing a source gas toward the wafer surface, and a reflecting apparatus positioned between the shower head and the heating device for reflecting thermal energy radiated from the heating device back toward the wafer-load region. The reflecting apparatus includes a reflector positioned above and opposing the wafer-load region, and a supporter for supporting the reflector. The reflector may have a flattened reflecting surface facing toward the wafer-load region, or may be a semi-spherical type reflector having a concave mirror facing toward the wafer-load region. The reflector can be controlled to move vertically relative to the wafer.
    Type: Application
    Filed: May 3, 2001
    Publication date: February 21, 2002
    Inventors: Jung-Su Lim, Kang-Wook Moon, Yong-Woon Son, Heung-Ahn Kwon
  • Patent number: 6015758
    Abstract: A method for stripping a film from a wafer substrate includes the steps of inserting a boat holding the wafer into a processing chamber of a CVD apparatus, and injecting gas into the chamber, to thereby strip the wafer of its film. A typical film requiring stripping is a polysilicon film grown on an underlying oxide layer of the substrate. In this case, CIF.sub.3 is used to strip the polysilicon film without damaging the oxide layer. Accordingly, this method is applicable to the quality testing of semiconductor wafer films using a test wafer. In such quality testing a film is formed on a test wafer substrate at the same time the semiconductor wafer film is formed. The film of the test wafer is tested to evaluate the quality of the formation of the semiconductor wafer film. The test wafer can then be stripped within the chemical vapor deposition apparatus and thus can be reused soon thereafter.
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: January 18, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joong-il An, Kyung-su Kim, Jung-su Lim, Jung-ki Kim