Patents by Inventor Jung Sun Ko

Jung Sun Ko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ORGANIC ELECTROLUMINESCENT ELEMENT
    Publication number: 20250024698
    Abstract: An object of the present invention is to provide a material for organic EL elements, the material being excellent in hole injecting/transporting performance, electron-blocking capability, stability in the form of a thin film, and durability. Another object of the present invention is to provide an organic EL element having high efficiency, a low driving voltage, and a long lifespan, by combining the aforementioned material with various materials for organic EL elements, the materials being excellent in hole/electron injecting/transporting performance, electron-blocking capability, stability in the form of a thin film, and durability, such that the properties of the individual materials can be effectively exhibited.
    Type: Application
    Filed: August 1, 2022
    Publication date: January 16, 2025
    Applicants: HODOGAYA CHEMICAL CO., LTD., SFC CO., LTD.
    Inventors: Junichi IZUMIDA, Sang-Won KO, Bong-Hyang LEE, Jung-Ho RYU, Jin-ho LEE, Kouki KASE, Shuichi HAYASHI, Se-Jin LEE, Tae-Jung YU, Young-Tae CHOI, Sung-Hoon JOO, Byung-Sun YANG, Ji-Hwan KIM, Bong-Ki SHIN
  • Overlay measurement apparatus
    Patent number: 11835865
    Abstract: An overlay measurement apparatus that can quickly measure an overlay error between layers with a large height difference is provided. The overlay measurement apparatus measures an error between a first overlay mark and a second overlay mark formed in a pair on different layers of a wafer. The overlay measurement apparatus includes an imaging system configured to acquire alignment images of a pair of first and second overlay marks at a plurality of focus positions, and a controller communicatively coupled to the imaging system. The overlay measurement apparatus can rapidly and accurately measure an overlay error between layers with a large height difference.
    Type: Grant
    Filed: May 10, 2023
    Date of Patent: December 5, 2023
    Assignee: AUROS TECHNOLOGY, INC.
    Inventors: Hyeon Gi Shin, Bo Kyung Ryu, Jung Sun Ko, Jin Woo Park
  • OVERLAY MEASUREMENT APPARATUS
    Publication number: 20230324811
    Abstract: An overlay measurement apparatus that can quickly measure an overlay error between layers with a large height difference is provided. The overlay measurement apparatus measures an error between a first overlay mark and a second overlay mark formed in a pair on different layers of a wafer. The overlay measurement apparatus includes an imaging system configured to acquire alignment images of a pair of first and second overlay marks at a plurality of focus positions, and a controller communicatively coupled to the imaging system. The overlay measurement apparatus can rapidly and accurately measure an overlay error between layers with a large height difference.
    Type: Application
    Filed: May 10, 2023
    Publication date: October 12, 2023
    Inventors: Hyeon Gi SHIN, Bo Kyung RYU, Jung Sun KO, Jin Woo PARK