Abstract: A wafer transferring robot in semiconductor device fabricating equipment and a method of detecting wafer warpage by using the wafer transferring robot are provided. In the realizing the wafer transferring robot to transfer a wafer, vacuum lines are formed to adsorb a plurality of regions of the wafer. Whether the wafer is warped or not and the extent of warpage are determined in real time, depending on whether the wafer is adsorbed by the vacuum lines. When no warpage occurs on the wafer or when the extent of warpage is slight, the wafer is allowed to be normally processed. When the extent of warpage is too serious to perform a normal process on the wafer, the wafer is previously processed as an error, thereby preventing the waste of time, cost and manpower caused by performing an unnecessary process.