Abstract: A semiconductor chip for a bonding semiconductor device includes a substrate, a wiring portion on the substrate, and a bonding portion on the wiring portion. The bonding portion includes an insulation layer, a bonding structure, and an extension pattern. The bonding structure includes a pad structure passing through the insulation layer and a dummy structure passing through a partial portion of the insulation layer. The extension pattern is at a lower portion of the dummy structure that is adjacent to the wiring portion and includes an extension portion extending in one direction in a plan view.

Abstract: Disclosed are three-dimensional semiconductor memory devices, electronic systems including the same, and methods of fabricating the same. The three-dimensional semiconductor memory device includes a substrate including a cell array region and an extension region, a peripheral circuit structure including peripheral transistors on the substrate, a stack structure including interlayer dielectric layers and gate electrodes that are alternately stacked on the peripheral circuit structure, contacts that penetrate the stack structure on the extension region and are electrically connected with the peripheral transistors and include a protruding part contacting a sidewall of one of the gate electrodes and a vertical part penetrating the stack structure, and dielectric patterns between the vertical part and respective sidewalls of the gate electrodes. Top and bottom surfaces of each of the dielectric patterns are respectively in contact with adjacent ones of the interlayer dielectric layers.

Abstract: Provided are three-dimensional semiconductor memory devices and electronic systems including the same. The device includes a substrate, stack structures each including interlayer dielectric layers and gate electrodes, which are alternately and repeatedly stacked on the substrate, vertical channel structures which penetrate the stack structures, and a separation structure, which extends in a first direction across between the stack structures. The separation structure includes first parts each having a pillar shape, which extend in a third direction perpendicular to a top surface of the substrate, and second parts, which extend between the interlayer dielectric layers from sidewalls of the first parts and which connect the first parts to each other in the first direction. The separation structure is spaced apart from the vertical channel structures in a second direction which intersects the first direction.

Abstract: Disclosed are three-dimensional semiconductor memory devices, electronic systems including the same, and methods of fabricating the same. The three-dimensional semiconductor memory device includes a substrate including a cell array region and an extension region, a peripheral circuit structure including peripheral transistors on the substrate, a stack structure including interlayer dielectric layers and gate electrodes that are alternately stacked on the peripheral circuit structure, contacts that penetrate the stack structure on the extension region and are electrically connected with the peripheral transistors and include a protruding part contacting a sidewall of one of the gate electrodes and a vertical part penetrating the stack structure, and dielectric patterns between the vertical part and respective sidewalls of the gate electrodes. Top and bottom surfaces of each of the dielectric patterns are respectively in contact with adjacent ones of the interlayer dielectric layers.

Abstract: A memory device includes: a first memory bank and a second memory bank; a control logic configured to receive a command and control an internal operation of the memory device; and an error correction code (ECC) circuit configured to retain in a latch circuit first read data read from the first memory bank in response to a first masked write (MWR) command for the first memory bank based on a latch control signal from the control logic, generate a first parity from data in which the first read data retained in the latch circuit is merged with first write data corresponding to the first MWR command in response to a first write control signal received from the control logic, and control an ECC operation to retain in the latch circuit second read data read from the second memory bank based on the latch control signal.

Abstract: Provided is a printed circuit board including: a first flexible insulating layer; a first rigid insulating layer stacked on a first portion of the first flexible insulating layer; and an electronic element embedded in the first flexible insulating layer in stacked formation with the rigid insulating layer.

Abstract: A semiconductor memory device includes a memory cell array and an address decoder. The memory cell array includes a plurality of memory blocks, each of the plurality of memory blocks includes a plurality of dynamic memory cells coupled to word-lines and bit-lines, each of the plurality of memory blocks are divided into a plurality of row blocks by row block identity bits of a row address, and each of the of row blocks includes a plurality of sub-array blocks arranged in a first direction. The address decoder changes a physical row address of a memory cell that stores or outputs data based on a column address received with a write command or a read command.

Abstract: A variable resistance memory device includes a metal interconnection layer on a substrate, an interlayer insulating layer on the metal interconnection layer and defining a contact hole for exposing a portion of the metal interconnection layer, a barrier metal layer including a plurality of sub-barrier metal layers inside the contact hole, a plug metal layer on the barrier metal layer and burying the contact hole, and a variable resistance structure on the barrier metal layer and the plug metal layer.

Abstract: In a method of manufacturing a variable resistance memory device, an MTJ structure layer is formed on a substrate. The MTJ structure layer is etched in an etching chamber to form an MTJ structure. The substrate having the MTJ structure thereon is transferred to a deposition chamber through a transfer chamber. A protection layer covering a sidewall of the MTJ structure is formed in the deposition chamber. The etching chamber, the transfer chamber, and the deposition chamber are kept in a high vacuum state equal to or more than about 10?8 Torr.

Abstract: Provided is a printed circuit board including: a first flexible insulating layer; a first rigid insulating layer stacked on a first portion of the first flexible insulating layer; and an electronic element embedded in the first flexible insulating layer in stacked formation with the rigid insulating layer.

Abstract: A semiconductor memory device includes a memory cell array and an address decoder. The memory cell array includes a plurality of memory blocks, each of the plurality of memory blocks includes a plurality of dynamic memory cells coupled to word-lines and bit-lines, each of the plurality of memory blocks are divided into a plurality of row blocks by row block identity bits of a row address, and each of the of row blocks includes a plurality of sub-array blocks arranged in a first direction. The address decoder changes a physical row address of a memory cell that stores or outputs data based on a column address received with a write command or a read command.

Abstract: A memory device includes: a first memory bank and a second memory bank; a control logic configured to receive a command and control an internal operation of the memory device; and an error correction code (ECC) circuit configured to retain in a latch circuit first read data read from the first memory bank in response to a first masked write (MWR) command for the first memory bank based on a latch control signal from the control logic, generate a first parity from data in which the first read data retained in the latch circuit is merged with first write data corresponding to the first MWR command in response to a first write control signal received from the control logic, and control an ECC operation to retain in the latch circuit second read data read from the second memory bank based on the latch control signal.

Abstract: In a method of manufacturing a variable resistance memory device, an MTJ structure layer is formed on a substrate. The MTJ structure layer is etched in an etching chamber to form an MTJ structure. The substrate having the MTJ structure thereon is transferred to a deposition chamber through a transfer chamber. A protection layer covering a sidewall of the MTJ structure is formed in the deposition chamber. The etching chamber, the transfer chamber, and the deposition chamber are kept in a high vacuum state equal to or more than about 10?8 Torr.

Abstract: A variable resistance memory device includes a metal interconnection layer on a substrate, an interlayer insulating layer on the metal interconnection layer and defining a contact hole for exposing a portion of the metal interconnection layer, a barrier metal layer including a plurality of sub-barrier metal layers inside the contact hole, a plug metal layer on the barrier metal layer and burying the contact hole, and a variable resistance structure on the barrier metal layer and the plug metal layer.

Abstract: A method of manufacturing a magnetoresistive random access memory device, the method including forming a memory structure on a substrate, the memory structure including a lower electrode, a magnetic tunnel junction structure, and an upper electrode sequentially stacked; forming a first capping layer to cover a surface of the memory structure by a deposition process using a plasma under first conditions; and forming a second capping layer on the first capping layer by a deposition process using a plasma under second conditions different from the first conditions.

Abstract: An MRAM device includes a lower electrode, a blocking pattern on the lower electrode and including a binary metal boride in an amorphous state, a seed pattern on the blocking pattern and including a metal, an MTJ structure on the seed pattern, and an upper electrode on the MTJ structure.

Abstract: A method of manufacturing a magnetoresistive random access memory device, the method including forming a memory structure on a substrate, the memory structure including a lower electrode, a magnetic tunnel junction structure, and an upper electrode sequentially stacked; forming a first capping layer to cover a surface of the memory structure by a deposition process using a plasma under first conditions; and forming a second capping layer on the first capping layer by a deposition process using a plasma under second conditions different from the first conditions.

Abstract: A method of manufacturing a magnetoresistive random access memory device, the method including forming a memory structure on a substrate, the memory structure including a lower electrode, a magnetic tunnel junction structure, and an upper electrode sequentially stacked; forming a first capping layer to cover a surface of the memory structure by a deposition process using a plasma under first conditions; and forming a second capping layer on the first capping layer by a deposition process using a plasma under second conditions different from the first conditions.

Abstract: An organic light-emitting device including: a first electrode; a second electrode; and an organic layer between the first electrode and the second electrode, the organic layer including an emission layer, wherein the organic layer includes a first compound represented by Formula 1 and a second compound represented by Formula 2: When the first compound represented by Formula 1 is included in the emission layer and the second compound represented by Formula 2 is included in the first layer, an organic light-emitting device according to an embodiment of the present disclosure may have high efficiency and a long lifespan.

Abstract: An organic light-emitting device includes a first electrode, a second electrode disposed opposite to the first electrode, and an organic layer disposed between the first electrode and the second electrode and including an emission layer. The emission layer includes at least one first light-emitting material represented by Formula 1 and at least one second light-emitting material represented by Formula 2: and X1 to X12, Ar1, M, X21 to X24, A, B, R1 to R12, R21, R22, a1, a2, n, L, M in Formulae 1 and 2 are defined as in the specification.