Patents by Inventor Jungil Ahn

Jungil Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas supply unit and substrate processing system
    Patent number: 10844491
    Abstract: A substrate processing system may include a process chamber in which a process on a substrate is performed, a supporting unit in the process chamber to support the substrate, a gas supply unit including a gas supply part with gas supply holes, with the gas supply holes being configured to supply a process gas onto the substrate, and an exhaust unit configured to exhaust the process gas from the process chamber. The gas supply part may include a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit. The gas diffusion region may be free of the gas supply holes.
    Type: Grant
    Filed: October 10, 2016
    Date of Patent: November 24, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sukjin Chung, JongCheol Lee, MinHwa Jung, Jaechul Shin, In-Sun Yi, Geunkyu Choi, Jungil Ahn, Seung Han Lee, Jin Pil Heo
  • GAS SUPPLY UNIT AND SUBSTRATE PROCESSING SYSTEM
    Publication number: 20170121820
    Abstract: A substrate processing system may include a process chamber in which a process on a substrate is performed, a supporting unit in the process chamber to support the substrate, a gas supply unit including a gas supply part with gas supply holes, with the gas supply holes being configured to supply a process gas onto the substrate, and an exhaust unit configured to exhaust the process gas from the process chamber. The gas supply part may include a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit. The gas diffusion region may be free of the gas supply holes.
    Type: Application
    Filed: October 10, 2016
    Publication date: May 4, 2017
    Inventors: Sukjin Chung, JongCheol Lee, MinHwa Jung, Jaechul Shin, In-Sun Yi, Geunkyu Choi, Jungil Ahn, Seung Han Lee, Jin Pil Heo
  • Apparatus and method of forming semiconductor devices
    Patent number: 8377206
    Abstract: An apparatus to form semiconductor devices includes an inner tube and an outer tube disposed to surround the inner tube. A plate is disposed at first open end of the inner tube to reduce variation between pressures at a first portion and a second portion inside the inner tube. The sum of areas of through-holes disposed on the plate is 10 to 60 percent of the entire area of the plate. The through-holes may include a first through-hole that is disposed at a central portion of the plate, and second through-holes disposed at an edge portion of the plate. The second through-holes are annularly arranged to surround the first through-hole.
    Type: Grant
    Filed: August 24, 2009
    Date of Patent: February 19, 2013
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Youngsoo Park, Jungil Ahn, Myeongjin Kim, Sangyeob Cha, WanGoo Hwang, Youngsam An
  • APPARATUS AND METHOD OF FORMING SEMICONDUCTOR DEVICES
    Publication number: 20100064970
    Abstract: An apparatus to form semiconductor devices includes an inner tube and an outer tube disposed to surround the inner tube. A plate is disposed at first open end of the inner tube to reduce variation between pressures at a first portion and a second portion inside the inner tube. The sum of areas of through-holes disposed on the plate is 10 to 60 percent of the entire area of the plate. The through-holes may include a first through-hole that is disposed at a central portion of the plate, and second through-holes disposed at an edge portion of the plate. The second through-holes are annularly arranged to surround the first through-hole.
    Type: Application
    Filed: August 24, 2009
    Publication date: March 18, 2010
    Applicant: Samsung Electronics Co., Ltd
    Inventors: Youngsoo PARK, Jungil Ahn, Myeongjin Kim, Sangyeob Cha, WanGoo Hwang, Youngsam An