Patents by Inventor Jung In Kim

Jung In Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250076524
    Abstract: The present disclosure relates to a system for monitoring radiation exposure using an eyeball-attachable apparatus for measuring radiation, the system including an apparatus for measuring radiation configured to be attachable to an eyeball of a person under measurement and to measure the amount of radiation exposure while being attached to the eyeball of the person under measurement; and a monitoring apparatus configured to receive measurement information about the amount of radiation exposure from the apparatus for measuring radiation, and to display information about the amount of radiation exposure of the person under measurement, thereby enabling real-time monitoring of the exposure dose according to the radiation exposure of a person under measurement, and further the remarkable reduction of the risk of explosion compared to existing lithium-based batteries, by applying a perovskite-based battery part, as well as smooth supply of power.
    Type: Application
    Filed: November 29, 2023
    Publication date: March 6, 2025
    Applicant: PAPRICA Lab. Co., Ltd.
    Inventors: Hong Gyun WU, Jung In KIM, Sang Hoon HEO, Song Yi HEO, Chang Heon CHOI, Jin Hyuck HEO, Min Jae CHOI
  • Publication number: 20240384107
    Abstract: Disclosed is an automotive painting product including a base color layer that is located on a substrate layer and includes a thermosetting paint composition and a clear layer that is located on the base color layer and includes a UV-curable paint composition. The thermosetting paint composition includes (i) a main portion including a first acrylic resin, a second acrylic resin having lower Tg than the first acrylic resin, a first surface conditioner, a curing accelerator, and a first organic solvent, and (ii) a curing portion including a curing agent containing an isocyanate group and a second organic solvent. The UV-curable paint composition includes at least two acrylate oligomers having different numbers of functional groups, an acrylate monomer, a photoinitiator, a second surface conditioner, a UV stabilizer, and a third organic solvent.
    Type: Application
    Filed: October 30, 2023
    Publication date: November 21, 2024
    Inventors: Chan Ul Jeong, Ho Tak Jeon, Seung Goo Lee, Jung In Kim
  • Publication number: 20230351408
    Abstract: Disclosed is a personal carbon emission right certification trade system, comprising: a popular traffic-based carbon emission right calculation part 140 configured to calculate a first carbon emission right to which the first carbon emission reduction amount is applied; an environment-friendly vehicle-based carbon emission right calculation part 150 configured to calculate a second carbon emission right to which the second carbon emission reduction amount is applied; and a carbon emission right trade part 160 configured to transfer the carbon emission rights including the first carbon emission right and the second carbon emission right to a different user in response to a request for transfer of the carbon emission rights.
    Type: Application
    Filed: April 26, 2023
    Publication date: November 2, 2023
    Applicant: Favicon CO., LTD.
    Inventors: II-Hwan KIM, Ji-Yong MOON, Jung-In KIM
  • Publication number: 20220265253
    Abstract: An oral fixation apparatus according to an embodiment of the present disclosure includes a mouthpiece provided to be mounted in a mouth, and a pressing unit configured to move relative to the mouthpiece, wherein the pressing unit is configured to press a tongue in the mouth to any one side in the mouth. Through this configuration, the oral fixation apparatus may maintain the same intraoral state. The oral fixation apparatus may be stably mounted inside the mouth, such that radiation therapy may be effectively and stably performed.
    Type: Application
    Filed: June 4, 2020
    Publication date: August 25, 2022
    Inventors: Hong Gyun WU, Jong Min PARK, Jung In KIM, Chang Heon CHOI, Jae Man SON, Ji Seong KIM
  • Patent number: 11176993
    Abstract: A neuromorphic processor may include at least a first synapse element. The first synapse element may include a first bit cell and a second bit cell, the first bit cell connected to a first bitline, a first inverted bitline, a first wordline, and a first inverted wordline, and the second bit cell connected to the first bitline, the first inverted bitline, a second wordline, and a second inverted wordline. The first synapse element may be configured to receive a first input through the first wordline, the first inverted wordline, the second wordline, and the second inverted wordline, store a first synapse value in the first bit cell and the second bit cell, perform a calculation operation using the first input and the first synapse value, and output a result of the calculation through the first bitline and the first inverted bitline.
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: November 16, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-In Kim, Youngnam Hwang
  • Publication number: 20210142847
    Abstract: A neuromorphic processor may include at least a first synapse element. The first synapse element may include a first bit cell and a second bit cell, the first bit cell connected to a first bitline, a first inverted bitline, a first wordline, and a first inverted wordline, and the second bit cell connected to the first bitline, the first inverted bitline, a second wordline, and a second inverted wordline. The first synapse element may be configured to receive a first input through the first wordline, the first inverted wordline, the second wordline, and the second inverted wordline, store a first synapse value in the first bit cell and the second bit cell, perform a calculation operation using the first input and the first synapse value, and output a result of the calculation through the first bitline and the first inverted bitline.
    Type: Application
    Filed: May 18, 2020
    Publication date: May 13, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jung-In Kim, Youngnam Hwang
  • Patent number: 10864383
    Abstract: The present disclosure relates to a respiratory gating system for inducing respiration of a patient during radiation therapy. A respiratory gating system according to one embodiment of the present disclosure comprises: an image management unit for acquiring an MRI image of a patient and processing the acquired image; and a projection unit for displaying the MRI image acquired and processed by the image management unit to the patient in real time, wherein the projection unit may be configured to project an image of a treatment area of the patient in real time using, as a screen, a bore of a radiotherapy equipment which is formed to surround the patient in order to acquire the MRI image.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: December 15, 2020
    Assignees: SEOUL NATIONAL UNIVERSITY HOSPITAL, PAPRICA Lab. Co., Ltd.
    Inventors: Hong Gyun Wu, Jong Min Park, Chang Heon Choi, Jung In Kim
  • Patent number: 10401505
    Abstract: The present disclosure relates to a contact lens type dosimeter for measuring a dose distribution of a crystalline lens during radiation therapy, and a method of manufacturing the same. The ocular dosimeter has a contact lens shape and is configured to be worn on an eyeball, which comprises a basic material containing hydrophilic polyurethane, and a radiochromic dye. When the ocular dosimeter is worn on the eyeball, the dosimeter is configured to measure a radiation dose irradiated to a crystalline lens through a variation in color of the ocular dosimeter.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: September 3, 2019
    Assignee: SEOUL NATIONAL UNIVERSITY HOSPITAL
    Inventors: Jung In Kim, Jong Min Park, Won Mo Sung, Hong Gyun Wu
  • Publication number: 20190086556
    Abstract: The present disclosure relates to a contact lens type dosimeter for measuring a dose distribution of a crystalline lens during radiation therapy, and a method of manufacturing the same. The ocular dosimeter has a contact lens shape and is configured to be worn on an eyeball, which comprises a basic material containing hydrophilic polyurethane, and a radiochromic dye. When the ocular dosimeter is worn on the eyeball, the dosimeter is configured to measure a radiation dose irradiated to a crystalline lens through a variation in color of the ocular dosimeter.
    Type: Application
    Filed: October 17, 2018
    Publication date: March 21, 2019
    Applicant: SEOUL NATIONAL UNIVERSITY HOSPITAL
    Inventors: Jung In KIM, Jong Min PARK, Won Mo SUNG, Hong Gyun WU
  • Publication number: 20190060668
    Abstract: The present disclosure relates to a respiratory gating system for inducing respiration of a patient during radiation therapy. A respiratory gating system according to one embodiment of the present disclosure comprises: an image management unit for acquiring an MRI image of a patient and processing the acquired image; and a projection unit for displaying the MRI image acquired and processed by the image management unit to the patient in real time, wherein the projection unit may be configured to project an image of a treatment area of the patient in real time using, as a screen, a bore of a radiotherapy equipment which is formed to surround the patient in order to acquire the MRI image.
    Type: Application
    Filed: October 29, 2018
    Publication date: February 28, 2019
    Applicants: SEOUL NATIONAL UNIVERSITY HOSPITAL, HANBEAM TECHNOLOGY INC.
    Inventors: Hong Gyun WU, Jong Min PARK, Chang Heon CHOI, Jung In KIM
  • Patent number: 9767808
    Abstract: A method and apparatus for suppressing vocoder noise are provided. In the method, first information and second information are received from a channel decoder, the first information indicating whether a decoded data frame has an error and the second information being a channel quality metric, error concealment voice decoding is performed on the decoded data frame if the first information indicates that no channel decoding error has been generated and the second information is smaller than a predetermined first threshold, and normal voice decoding is performed on the decoded data frame if the first information indicates that no channel decoding error has been generated and the second information is equal to or larger than the first threshold.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: September 19, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-Won Shin, Joon-Sang Ryu, Jung-In Kim
  • Patent number: 9654077
    Abstract: A method and an apparatus for reducing noise due to a path change of an audio signal output from a device are provided. The method includes determining an input period for canceling the noise by using a time point, at which the path change is sensed, as a reference, when sensing the path change of the audio signal; low-pass filtering the audio signal in the determined input period; and interpolating a first partial signal, which is the low-pass filtered audio signal in a first predetermined period that starts from a start time point of the determined input period, and a second partial signal, which is the low-pass filtered audio signal in a second predetermined period that ends at an end time point of the determined input period, within the determined input period.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: May 16, 2017
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Jung-In Kim, Yong-Won Shin, Tae-Kyun Jung
  • Publication number: 20160099698
    Abstract: A method and an apparatus for reducing noise due to a path change of an audio signal output from a device are provided. The method includes determining an input period for canceling the noise by using a time point, at which the path change is sensed, as a reference, when sensing the path change of the audio signal; low-pass filtering the audio signal in the determined input period; and interpolating a first partial signal, which is the low-pass filtered audio signal in a first predetermined period that starts from a start time point of the determined input period, and a second partial signal, which is the low-pass filtered audio signal in a second predetermined period that ends at an end time point of the determined input period, within the determined input period.
    Type: Application
    Filed: April 24, 2015
    Publication date: April 7, 2016
    Inventors: Jung-In KIM, Yong-Won SHIN, Tae-Kyun JUNG
  • Publication number: 20140229173
    Abstract: A method and apparatus for suppressing vocoder noise are provided. In the method, first information and second information are received from a channel decoder, the first information indicating whether a decoded data frame has an error and the second information being a channel quality metric, error concealment voice decoding is performed on the decoded data frame if the first information indicates that no channel decoding error has been generated and the second information is smaller than a predetermined first threshold, and normal voice decoding is performed on the decoded data frame if the first information indicates that no channel decoding error has been generated and the second information is equal to or larger than the first threshold.
    Type: Application
    Filed: July 26, 2013
    Publication date: August 14, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yong-Won SHIN, Joon-Sang RYU, Jung-In KIM
  • Patent number: 8481426
    Abstract: A method of forming a pattern structure and a method of fabricating a semiconductor device using the pattern structure, are provided the method of forming the pattern structure includes forming a mask on an underlying layer formed on a lower layer. The underlying layer is etched using the mask as an etching mask, thereby forming patterns on the lower layer. The patterns define at least one opening. A sacrificial layer is formed in the opening and the mask is removed. The sacrificial layer in the opening is partially etched when the mask is removed.
    Type: Grant
    Filed: February 17, 2011
    Date of Patent: July 9, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-In Kim, Jaehee Oh, Kiseok Suh
  • Patent number: 8275059
    Abstract: A frequency synchronization apparatus includes: a correlating unit that obtains a first correlation value by correlating a known reference guard interval of an OFDM symbol and a reference copy interval corresponding to the reference guard interval, and obtains a second correlation value by correlating the estimate guard interval and an estimate copy interval corresponding to the estimate guard interval; a determining unit that compares the first and second correlation values to determine a first case where the first correlation value is larger by a pre-set magnification than the second correlation value, a second case where the second correlation value is larger by a pre-set magnification than the first correlation value, and a third case which is not the first case nor the second case; and a frequency offset estimating unit that estimates a frequency offset by using a correlation value corresponding to any one of the first to third.
    Type: Grant
    Filed: June 3, 2009
    Date of Patent: September 25, 2012
    Assignees: Samsung Electro-Mechanics Co., Ltd., Sungyunkwan University Foundation for Corporate Collaboration
    Inventors: Bon Young Koo, Hyung Jin Choi, Se Bin Im, Jung In Kim
  • Publication number: 20120228574
    Abstract: A variable resistive memory device includes a substrate comprising a cell region and a peripheral region, a word line extending in a first direction formed on the substrate of the cell region, a switching element formed on the word line, a variable resistance layer formed on the word line, and at least one transistor comprising a gate stack, the gate stack formed on the substrate of the peripheral region, wherein the word line comprises a metal layer formed at a same level as the gate stack.
    Type: Application
    Filed: February 27, 2012
    Publication date: September 13, 2012
    Inventors: SANG-SU PARK, Jaehee Oh, Jung-In Kim
  • Publication number: 20110207285
    Abstract: A method of forming a pattern structure and a method of fabricating a semiconductor device using the pattern structure, are provided the method of forming the pattern structure includes forming a mask on an underlying layer formed on a lower layer. The underlying layer is etched using the mask as an etching mask, thereby forming patterns on the lower layer. The patterns define at least one opening. A sacrificial layer is formed in the opening and the mask is removed. The sacrificial layer in the opening is partially etched when the mask is removed.
    Type: Application
    Filed: February 17, 2011
    Publication date: August 25, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-In Kim, Jaehee Oh, Kiseok Suh
  • Publication number: 20100142632
    Abstract: A frequency synchronization apparatus includes: a correlating unit that obtains a first correlation value by correlating a known reference guard interval of an OFDM symbol and a reference copy interval corresponding to the reference guard interval, and obtains a second correlation value by correlating the estimate guard interval and an estimate copy interval corresponding to the estimate guard interval; a determining unit that compares the first and second correlation values to determine a first case where the first correlation value is larger by a pre-set magnification than the second correlation value, a second case where the second correlation value is larger by a pre-set magnification than the first correlation value, and a third case which is not the first case nor the second case; and a frequency offset estimating unit that estimates a frequency offset by using a correlation value corresponding to any one of the first to third.
    Type: Application
    Filed: June 3, 2009
    Publication date: June 10, 2010
    Applicants: Samsung Electro-Mechanics Co., Ltd., SUNGYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION
    Inventors: Bon Young Koo, Hyung Jin Choi, Se Bin Im, Jung In Kim
  • Patent number: 7541252
    Abstract: A method of fabricating a semiconductor device includes forming a conductive layer on a semiconductor substrate, forming an insulating layer on the conductive layer, forming a word line and isolation trenches by patterning the insulating layer and the conductive layer, forming an isolation layer that fills the isolation trenches, forming a cell contact hole in the insulating layer such that the cell contact hole is self-aligned with the word line and exposes the word line, and forming a cell diode in the cell contact hole.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: June 2, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Ho Eun, Jae-Hee Oh, Jae-Hyun Park, Jung-In Kim, Seung-Pil Ko, Yong-Tae Oh