Abstract: An adjustment control device for precise measurement that controls an inspection equipment for inspecting an inspected object to perform precise measurement includes a lowering control unit that lowers the inspection equipment with respect to the inspected object, a rotation control unit that is coupled to the lowering control unit and that controls the lowering control unit to rotate the inspection equipment at a predetermined angle in left and right directions when viewed from a frontal point of view, and a forward and backward control unit that is disposed above the rotation control unit and that transmit a moving force to the rotation control unit to move the inspection equipment forward or forward on the inspected object.

Abstract: The present invention relates to a roll-type hook tape for providing a disposable diaper hook member, which is more stably fastened to a loop member which is a counterpart of the hook member, and greatly contributes to manufacturing and commercialization in the form of a roll.

Abstract: A semiconductor wafer sample pre-processing system improves productivity and process reliability by automating all process from cutting a into a plurality of wafer samples through polishing of the wafer samples.

Abstract: An integrated actuator test system for performing the first test and the second test and a method for operating the system. The test system includes a control unit controlling an operation of the test system; a support socket supporting the actuator; an alignment stage supporting the support socket and determining a direction of the support socket; and a transporting unit transporting the alignment stage to perform the second test after performing the first test.

Abstract: A camera module inspection system and a method for operating the inspection system. More specifically, the inspection system can quickly check and correct the alignment of the camera module.

Abstract: A camera module inspection system and a method for operating the inspection system. More specifically, the inspection system can quickly check and correct the alignment of the camera module.

Abstract: An adjustment control device for precise measurement that controls an inspection equipment for inspecting an inspected object to perform precise measurement includes a lowering control unit that lowers the inspection equipment with respect to the inspected object, a rotation control unit that is coupled to the lowering control unit and that controls the lowering control unit to rotate the inspection equipment at a predetermined angle in left and right directions when viewed from a frontal point of view, and a forward and backward control unit that is disposed above the rotation control unit and that transmit a moving force to the rotation control unit to move the inspection equipment forward or forward on the inspected object.

Abstract: The present invention provides a spectrum sensing apparatus including a receiver which receives an analog signal in a frequency band of interest; an ADC(Analog Digital Caonverter) which samples the analog signal to output a digital signal; a correlator which performs the auto-correlation of the digital signal to output a correlation function; and a controller which generates an image pattern corresponding to the correlation function and identifies whether to occupy the frequency band of interest according to the image pattern.

Abstract: The present invention relates to a roll-type hook tape for providing a disposable diaper hook member, which is more stably fastened to a loop member which is a counterpart of the hook member, and greatly contributes to manufacturing and commercialization in the form of a roll.

Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

Abstract: Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate.

Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.

Abstract: A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.

Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

Abstract: Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.