Patents by Inventor JungKwun Kim

JungKwun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220347450
    Abstract: Lithography fabrication methods for producing polymeric microneedles, microprobes, and other micron-sized structures with sharp tips. The fabrication process utilizes a single-step bottom-up exposure of photosensitive resin through a photomask micro-pattern, with a corresponding change/increase in refractive index of the resin creating a meta-state waveguide within the resin which focuses down additional transmitted energy and forms a converging shape (first harmonic microcone). Energy is diffracted through the tip of the first harmonic microcone as a second harmonic beam to form a second converging shape (second harmonic shape) adjacent the first microcone, followed by additional tertiary harmonic microcones, which can be built upon these structures with application of additional energy.
    Type: Application
    Filed: July 11, 2022
    Publication date: November 3, 2022
    Inventors: Jungkwun KIM, Keun Ho LEE, Jung Dong KIM, Dohyeon JEONG
  • Patent number: 10503080
    Abstract: Provided is a 3D micro lithography-printing system using tilting and rotational UV-LEDs, in which a lithography module provided with LED lens for irradiating ultraviolet light for lithography is provided rotatable or revolvable in a left and right horizontal direction, and a substrate stage with a lithography object mounted thereto is provided movable forward and backward, changeable in forward and backward angles, and horizontally rotatable left and right, and thus, by changing the irradiation direction of ultraviolet light in a three-dimensional manner, a high-aspect ratio pillar and a 3D structure can be formed. In addition, various types of 3D structure can also be formed through a multi-layer lithography to a lithography object, and micro-forming within a range of approximately 5 ?m is also possible.
    Type: Grant
    Filed: May 14, 2019
    Date of Patent: December 10, 2019
    Assignees: SAMIL TECH CO., LTD., KANSAS STATE UNIVERSITY RESEARCH FOUNDATION
    Inventors: Jong Eun Kim, Jungkwun Kim
  • Publication number: 20100195082
    Abstract: A system according to an embodiment of the present invention comprises a movable stage having a top surface. A photosensitive material may be deposited on the top surface and a mask may be placed on the photosensitive material. A vessel, having a top portion, one or more flexible sides, and a transparent base, is configured to be placed adjacent to the mask. The base is configured to be movable relative to the top portion of the vessel. In this way, the movable stage, photosensitive material, and mask may move in conjunction with the base of the vessel.
    Type: Application
    Filed: January 27, 2010
    Publication date: August 5, 2010
    Inventors: Yong-Kyu Yoon, JungKwun Kim, Mark G. Allen