Abstract: Provided is a substrate cleaning apparatus of cleaning a substrate. The substrate cleaning apparatus includes a cleaning chamber, a first cleaning nozzle, a cover member, an air flow generation unit, and an exhaust unit. The main cleaning chamber has a cleaning space in which the substrate is cleaned and includes a sidewall in which a first vent hole is defined. The first cleaning nozzle is disposed in the main cleaning chamber to spray a first cleaning solution. The cover member covers the main cleaning chamber and has one side in which a second vent hole is defined. The air flow generation unit supplies air into the cleaning space through the first vent hole. The exhaust unit is coupled to the one side of the cover member to suck and exhaust the air supplied into the cleaning space through the second vent hole.