Patents by Inventor Jungwoo OH

Jungwoo OH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136703
    Abstract: An antenna module, according to various embodiments, may comprise: a first layer including a first etching region, a first via pad disposed to be spaced apart from an edge of the first etching region, and a first via hole disposed on one surface of the first via pad; and a second layer stacked on one surface of the first layer, and including a second etching region, a plurality of second via pads disposed to be spaced apart from an edge of the second etching region, a plurality of second via holes disposed on one surface of the plurality of second via pads, and a plurality of second dividing lines electrically connecting the plurality of second via pads.
    Type: Application
    Filed: April 27, 2022
    Publication date: April 25, 2024
    Inventors: Dongjin JUNG, Chanju PARK, Jungi JEONG, Taeksun KWON, Jungwoo SEO, Junhwa OH
  • Patent number: 11955632
    Abstract: The application relates to a positive active material precursor including a transition metal composite oxide precursor. The transition metal composite oxide precursor exhibits a peak full width at half maximum of a (200) plane (2?=about 42° to about 44°) in X-ray diffraction analysis in a range of about 0.3° to about 0.5°. The application also relates to a positive active material using the precursor, a method of preparing the same, and a positive electrode and a rechargeable lithium battery including the same.
    Type: Grant
    Filed: November 6, 2020
    Date of Patent: April 9, 2024
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Jinhwa Kim, Minhan Kim, Donggyu Chang, Jihyun Seog, Yuntaek Oh, Jungwoo Son
  • Patent number: 11955057
    Abstract: A display apparatus includes display panel including a pixel array in which pixels, each of which including a plurality of inorganic light emitting elements, are disposed in a plurality of row lines, and sub pixel circuits corresponding to inorganic light emitting elements of the pixel array, a driving unit configured to set an image data voltage sequentially to the sub pixel circuits based on a first driving voltage, and drive the sub pixel circuits so that a driving current corresponding to the set image data voltage is provided sequentially to the inorganic light emitting elements of the pixel array based on a second driving voltage; a sensing unit configured to sense a current flowing through a driving transistor included in each of the sub pixel circuits based on a specific voltage which is applied to the sub pixel circuits, and output sensing data corresponding to the sensed current; and a correction unit configured to correct an image data voltage to be applied to each of the sub pixel circuits based o
    Type: Grant
    Filed: December 15, 2021
    Date of Patent: April 9, 2024
    Assignees: SAMSUNG ELECTRONICS CO., LTD., RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Jinho Kim, Yong-Sang Kim, Donggun Oh, Eun Kyo Jung, Jungwoo Lee
  • Publication number: 20210036170
    Abstract: The present disclosure provides a photodiode which maintains a photodiode characteristic even after the metal-assisted chemical etching and uses a metal-semiconductor structure having low reflectance and high conductance, a manufacturing method thereof, and a solar cell using the same. The photodiode of the present disclosure includes a semiconductor substrate with a low reflective and high conductive surface which has a selectively etched electrode formation area and a high conductive electrode formed by placing a metal catalyst used for a metal-assisted chemical etching process for forming an antireflection semiconductor substrate in an etching area of the antireflection semiconductor substrate.
    Type: Application
    Filed: July 31, 2020
    Publication date: February 4, 2021
    Inventors: Jungwoo OH, Kyunghwan KIM, Bugeun KI, Keorock CHOI
  • Patent number: 9911615
    Abstract: The inventive concepts relate to an apparatus and a method for etching a substrate, a stamp for etching a substrate, and a method for manufacturing the stamp. The method for etching a substrate includes bringing a substrate into contact with a stamp including a pattern on which a metal catalyst is formed, and etching the substrate by a chemical reaction between the metal catalyst and an etching solution.
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: March 6, 2018
    Assignee: Industry-Academic Cooperation Foundation, Yonsei University
    Inventors: Jungwoo Oh, Bugeun Ki, Yunwon Song, Keorock Choi, Kyung Ho Kim
  • Patent number: 9437441
    Abstract: A method of etching a substrate using a metal-assisted chemical etching process is provided. The method may include forming a metal catalytic layer to a predetermined thickness on a substrate and reacting the metal catalytic layer with the etching solution to form a porous surface in the metal catalytic layer and etch the substrate. When the metal catalytic layer is reacted with an etching solution, a porous surface may be formed on the metal catalytic layer.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: September 6, 2016
    Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
    Inventors: Jungwoo Oh, Yunwon Song, Bugeun Ki, Keorock Choi
  • Publication number: 20160133478
    Abstract: A method of etching a substrate using a metal-assisted chemical etching process is provided. The method may include forming a metal catalytic layer to a predetermined thickness on a substrate and reacting the metal catalytic layer with the etching solution to form a porous surface in the metal catalytic layer and etch the substrate. When the metal catalytic layer is reacted with an etching solution, a porous surface may be formed on the metal catalytic layer.
    Type: Application
    Filed: August 25, 2015
    Publication date: May 12, 2016
    Inventors: Jungwoo OH, Yunwon SONG, Bugeun KI, Keorock CHOI
  • Publication number: 20160020112
    Abstract: The inventive concepts relate to an apparatus and a method for etching a substrate, a stamp for etching a substrate, and a method for manufacturing the stamp. The method for etching a substrate includes bringing a substrate into contact with a stamp including a pattern on which a metal catalyst is formed, and etching the substrate by a chemical reaction between the metal catalyst and an etching solution.
    Type: Application
    Filed: July 15, 2015
    Publication date: January 21, 2016
    Inventors: Jungwoo OH, Bugeun KI, Yunwon SONG, Keorock CHOI, Kyung Ho KIM