Patents by Inventor Junhan Liu

Junhan Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12189670
    Abstract: Publication pre-screening may include the use of a trained model. A trained language model may be fine-tuned on a question-and-answer task and may be configured to receive a question that includes inclusion and exclusion criteria for a publication. The question may be formulated to include context information such as a title and abstract of the publication. An output of the model may be used to determine a selection of the publication.
    Type: Grant
    Filed: June 29, 2023
    Date of Patent: January 7, 2025
    Assignee: Cytel Inc.
    Inventors: Reza Jafar, Anna Forsythe, Kristian Thorlund, Junhan Liu
  • Publication number: 20240004910
    Abstract: Publication pre-screening may include the use of a trained model. A trained language model may be fine-tuned on a question-and-answer task and may be configured to receive a question that includes inclusion and exclusion criteria for a publication. The question may be formulated to include context information such as a title and abstract of the publication. An output of the model may be used to determine a selection of the publication.
    Type: Application
    Filed: June 29, 2023
    Publication date: January 4, 2024
    Inventors: Reza Jafar, Anna Forsythe, Kristian Thorlund, Junhan Liu
  • Publication number: 20210121435
    Abstract: Methods for treating seizures in a subject having epilepsy are provided. The method may comprise administering a pharmaceutical composition comprising CBD and THC to the subject. In some embodiments, the ratio of CBD to THC in the pharmaceutical composition is between about 14:1 and about 17:1. Related uses of the pharmaceutical composition to treat seizures in a subject having epilepsy are also provided.
    Type: Application
    Filed: January 17, 2020
    Publication date: April 29, 2021
    Inventors: Shannon O'HEARN, Alexia BLAKE, Istok NAHTIGAL, Angelo FEFEKOS, McIntyre Willets BURNHAM, Junhan Liu
  • Patent number: 10809612
    Abstract: The present invention discloses a design method of a sub resolution assist feature, which comprises the following steps of: S01: forming a sub resolution assist feature in the mask plate, the upper surface of the sub resolution assist feature is aligned with the upper surface of the mask plate; S02: forming a process pattern on one side, which contains the sub resolution assist feature, of the mask plate, the position of the process pattern is not superposed with the sub resolution assist feature in a vertical direction.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: October 20, 2020
    Assignee: SHANGHAI HUALI MICROELECTRONICS CORPORATION
    Inventors: Zhigang Chen, Junhan Liu
  • Publication number: 20200103749
    Abstract: The present invention discloses a design method of a sub resolution assist feature, which comprises the following steps of: S01: forming a sub resolution assist feature in the mask plate, the upper surface of the sub resolution assist feature is aligned with the upper surface of the mask plate; S02: forming a process pattern on one side, which contains the sub resolution assist feature, of the mask plate, the position of the process pattern is not superposed with the sub resolution assist feature in a vertical direction.
    Type: Application
    Filed: December 3, 2019
    Publication date: April 2, 2020
    Inventors: Zhigang Chen, Junhan Liu
  • Patent number: 10527930
    Abstract: The present invention discloses a design method of a sub resolution assist feature, which comprises the following steps of: S01: forming a sub resolution assist feature in the mask plate, the upper surface of the sub resolution assist feature is aligned with the upper surface of the mask plate; S02: forming a process pattern on one side, which contains the sub resolution assist feature, of the mask plate, the position of the process pattern is not superposed with the sub resolution assist feature in a vertical direction.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: January 7, 2020
    Assignee: SHANGHAI HUALI MICROELECTRONICS CORPORATION
    Inventors: Zhigang Chen, Junhan Liu
  • Publication number: 20190107773
    Abstract: The present invention discloses a design method of a sub resolution assist feature, which comprises the following steps of: S01: forming a sub resolution assist feature in the mask plate, the upper surface of the sub resolution assist feature is aligned with the upper surface of the mask plate; S02: forming a process pattern on one side, which contains the sub resolution assist feature, of the mask plate, the position of the process pattern is not superposed with the sub resolution assist feature in a vertical direction.
    Type: Application
    Filed: November 27, 2017
    Publication date: April 11, 2019
    Inventors: Zhigang Chen, Junhan Liu