Patents by Inventor Junhan ZHANG

Junhan ZHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12723976
    Abstract: An absorption spectrum-based chemical vapor deposition (CVD) online in-situ characterization system includes an absorption spectrum detection device, a spectrum movement and optical path calibration device, and a tubular CVD device. By improving the existing tubular CVD device and incorporating the environmental compensation method, the present disclosure achieves accurate detection of the CVD process under high temperature and low pressure conditions, and realizes real-time detection, so the law of changes in the sample or reaction system over time can be determined. Combined with changes in system temperature and pressure, the law of changes in the sample or reaction system with environmental changes can be further acquired, thereby determining the optimal deposition conditions.
    Type: Grant
    Filed: August 8, 2025
    Date of Patent: September 1, 2026
    Assignee: Zhejiang University
    Inventors: Rong Xiang, Yicheng Ma, Lingfeng Wang, Yige Zheng, Junhan Zhang, Huixu Dong
  • Publication number: 20250362225
    Abstract: An absorption spectrum-based chemical vapor deposition (CVD) online in-situ characterization system includes an absorption spectrum detection device, a spectrum movement and optical path calibration device, and a tubular CVD device. By improving the existing tubular CVD device and incorporating the environmental compensation method, the present disclosure achieves accurate detection of the CVD process under high temperature and low pressure conditions, and realizes real-time detection, so the law of changes in the sample or reaction system over time can be determined. Combined with changes in system temperature and pressure, the law of changes in the sample or reaction system with environmental changes can be further acquired, thereby determining the optimal deposition conditions.
    Type: Application
    Filed: August 8, 2025
    Publication date: November 27, 2025
    Inventors: Rong XIANG, Yicheng MA, Lingfeng WANG, Yige ZHENG, Junhan ZHANG, Huixu DONG