Patents by Inventor Junhee YOUN

Junhee YOUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus, process fluid treating apparatus, and ozone decomposition method
    Patent number: 12198943
    Abstract: Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.
    Type: Grant
    Filed: December 23, 2020
    Date of Patent: January 14, 2025
    Assignee: SEMES CO. LTD.
    Inventors: Junhee Youn, Seung Hwan Cho
  • SUBSTRATE PROCESSING APPARATUS, PROCESS FLUID TREATING APPARATUS, AND OZONE DECOMPOSITION METHOD
    Publication number: 20210114902
    Abstract: Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.
    Type: Application
    Filed: December 23, 2020
    Publication date: April 22, 2021
    Inventors: Junhee Youn, Seung Hwan Cho
  • Dissolved ozone removal unit, apparatus for treating substrate, method of removing dissolved ozone, and method of cleaning substrate
    Patent number: 10453672
    Abstract: Disclosed are a dissolved ozone removal unit that removes dissolved ozone from liquid, an apparatus for treating a substrate, a method of removing dissolved ozone, and a method of cleaning a substrate. The method of removing dissolved ozone in liquid includes supplying micro bubbles to the liquid, and allowing dissolved ozone to exit from the liquid by energy or radical ions that are generated while the micro bubbles are dissolved in the liquid.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: October 22, 2019
    Assignee: SEMES CO., LTD.
    Inventors: Byungsun Bang, Junhee Youn, Kilsung Kwon
  • SUBSTRATE PROCESSING APPARATUS, PROCESS FLUID TREATING APPARATUS, AND OZONE DECOMPOSITION METHOD
    Publication number: 20180111860
    Abstract: Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.
    Type: Application
    Filed: October 24, 2017
    Publication date: April 26, 2018
    Inventors: Junhee Youn, Seung Hwan Cho
  • DISSOLVED OZONE REMOVAL UNIT, APPARATUS FOR TREATING SUBSTRATE, METHOD OF REMOVING DISSOLVED OZONE, AND METHOD OF CLEANING SUBSTRATE
    Publication number: 20170117137
    Abstract: Disclosed are a dissolved ozone removal unit that removes dissolved ozone from liquid, an apparatus for treating a substrate, a method of removing dissolved ozone, and a method of cleaning a substrate. The method of removing dissolved ozone in liquid includes supplying micro bubbles to the liquid, and allowing dissolved ozone to exit from the liquid by energy or radical ions that are generated while the micro bubbles are dissolved in the liquid.
    Type: Application
    Filed: October 19, 2016
    Publication date: April 27, 2017
    Inventors: Byungsun BANG, Junhee YOUN, Kilsung KWON