Abstract: Provided is a bioresorbable stent including a stent substrate including a bioresorbable polymer and a contrast medium containing an iodine component, coated on the stent substrate. Since the stent according to the present invention is absorbed in and removed from the human body after a predetermined time, it has excellent biodegradability since it has improved radiopacity by iodine contrast medium coating, it has a high radiography contrast and is very efficient even when a procedure is performed with real time radiography, and since it has low foreshortening and high flexibility, radial force, and re-coil, it may be useful for insertion into a blood vessel having a small diameter, an acute occlusive lesion, an imminent occlusive lesion, and the like.

Abstract: A display device according to an embodiment includes a light-emitting device disposed on a substrate and including an emission layer, and a light control layer disposed on the light-emitting device. The light control layer includes a plurality of light blocking patterns extending in a first direction and spaced in a second direction intersecting the first direction, and a transmission layer disposed among the plurality of light blocking patterns and including a transparent organic layer and a transparent inorganic layer that are alternately stacked on each other.

Abstract: A display device includes a light emitting element disposed on a substrate to include an emission layer; and a light controller disposed over the light emitting element, the light controller includes light blocking patterns to extend in a first direction and spaced apart in a second direction intersecting the first direction; and a transmission portion disposed between the light blocking patterns to extend in the first direction, and the transmission portion includes a first transparent organic layer; a transparent inorganic layer disposed on the first transparent organic layer; and a second transparent organic layer disposed on the transparent inorganic layer.

Abstract: Methods of manufacturing a semiconductor chip are provided. The methods may include providing a semiconductor substrate including integrated circuit regions and a cut region. The cut region may be between the integrated circuit regions. The methods may also include forming a modified layer by emitting a laser beam into the semiconductor substrate along the cut region, polishing an inactive surface of the semiconductor substrate to propagate a crack from the modified layer, and separating the integrated circuit regions along the crack. The cut region may include a plurality of multilayer metal patterns on an active surface of the semiconductor substrate, which is opposite to the inactive surface of the semiconductor substrate. The plurality of multilayer metal patterns may form a pyramid structure when viewed in cross section.

Abstract: A light emitting element includes: a light emitting stack pattern including a first semiconductor layer, an active layer, and a second semiconductor layer that are sequentially stacked along one direction; and an insulating film surrounding an outer surface of at least one of the first semiconductor layer, the active layer, and the second semiconductor layer. The insulating film including a zinc oxide (ZnO) thin film layer.

Abstract: A display device includes a light-emitting device disposed on a substrate and including an emission layer, and a light controller disposed on the light-emitting device. The light controller includes a plurality of main light blocking patterns extending in a first direction and spaced apart from each other in a second direction intersecting the first direction, and a plurality of sub-light blocking patterns disposed between adjacent ones of the plurality of main light blocking patterns, extending in the first direction, and spaced apart from each other in the second direction. Each of the plurality of main light blocking patterns has a first thickness in a thickness direction of the substrate, and each of the plurality of sub-light blocking patterns has a second thickness that is less than the first thickness in the thickness direction of the substrate.

Abstract: A display device includes: a substrate; a plurality of transistors disposed on the substrate; an insulating layer disposed on the plurality of transistors; a data line and a driving voltage line disposed on the insulating layer; a pixel electrode disposed on the data line or the driving voltage line; a pixel defining layer disposed on the pixel electrode and including a pixel opening that overlaps the pixel electrode; a light emitting element layer disposed in the pixel opening; and a common electrode disposed on the light emitting element layer, wherein the pixel opening includes a first sub-pixel opening and a second sub-pixel opening and a first blocking portion that is disposed between the first sub-pixel opening and the second sub-pixel opening.

Abstract: The present disclosure relates to a display device and a manufacturing method thereof, and a display device according to one or more embodiments includes a substrate, a transistor above the substrate, a first pixel electrode connected to the transistor, a scattering layer above the first pixel electrode, and defining repeating protrusions and depressions, a second pixel electrode above the scattering layer, and connected with the first pixel electrode, an emission layer above the second pixel electrode, and a common electrode above the emission layer.

Abstract: A present disclosure relates to a display device and a manufacturing method, and the display device according to an embodiment includes: a substrate; a transistor positioned on the substrate; a first pixel electrode connected to the transistor; a scattering layer positioned on the first pixel electrode; a second pixel electrode positioned on the scattering layer and covering a side surface of the first pixel electrode; an emission layer positioned on the second pixel electrode; and a common electrode positioned on the emission layer.

Abstract: A display device includes: a substrate; a plurality of transistors disposed on the substrate; an insulating layer disposed on the plurality of transistors; a data line and a driving voltage line disposed on the insulating layer; a pixel electrode disposed on the data line or the driving voltage line; a pixel defining layer disposed on the pixel electrode and including a pixel opening that overlaps the pixel electrode; a light emitting element layer disposed in the pixel opening; and a common electrode disposed on the light emitting element layer, wherein the pixel opening includes a first sub-pixel opening and a second sub-pixel opening and a first blocking portion that is disposed between the first sub-pixel opening and the second sub-pixel opening.

Abstract: A method for manufacturing a display apparatus according to an embodiment includes: preparing a carrier substrate and forming a sacrificial layer on a top surface of the carrier substrate, where the sacrificial layer includes a cover area and an exposure area located on at least one side of the cover area; forming a first flexible material having a bottom surface in contact with the sacrificial layer on a top surface of the cover area of the sacrificial layer to expose the exposure area of the sacrificial layer; and removing the exposure area of the sacrificial layer.

Abstract: A display device includes: a substrate; a plurality of transistors disposed on the substrate; an insulating layer disposed on the plurality of transistors; a data line and a driving voltage line disposed on the insulating layer; a pixel electrode disposed on the data line or the driving voltage line; a pixel defining layer disposed on the pixel electrode and including a pixel opening that overlaps the pixel electrode; a light emitting element layer disposed in the pixel opening; and a common electrode disposed on the light emitting element layer, wherein the pixel opening includes a first sub-pixel opening and a second sub-pixel opening and a first blocking portion that is disposed between the first sub-pixel opening and the second sub-pixel opening.

Abstract: A laser apparatus and a method for manufacturing a display device are provided. A laser apparatus includes: a stage; a laser providing unit above the stage and configured to provide a laser beam; a scanner configured to adjust an optical path of the laser beam such that the laser beam is irradiated to an irradiation line formed above the stage; and a control unit to control an operation of the scanner, and the scanner includes a shutter located on an optical path of the laser beam emitted from the laser providing unit and configured to perform an opening/closing operation.

Abstract: An apparatus and a method for manufacturing a display device are provided. An apparatus for manufacturing a display device includes a first unit configured to remove impurities of a support substrate, a second unit configured to form a sacrificial layer on the support substrate, a third unit configured to form a flexible substrate on the sacrificial layer, and a fourth unit configured to form a display unit on the flexible substrate. The second unit includes a moving unit movable in a first direction to receive the support substrate, a first supply nozzle configured to spray a solution onto the support substrate to coat a graphene oxide layer, and a second supply nozzle configured to dry the graphene oxide layer coated on the support substrate while removing a portion of the graphene oxide layer, to form the sacrificial layer.

Abstract: A coating composition includes a graphene oxide and a solvent. At least one of a carboxyl group and an epoxide group of the graphene oxide is functionalized by an amine. The amine has an activation energy to an epoxide group of the graphene oxide of about ?3 kcal/mol to about 8 kcal/mol. A method of forming a stacked structure using the coating composition is provided. A method of manufacturing a display device using the coating composition is provided.

Abstract: A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.

Abstract: An apparatus and a method for manufacturing a display device are provided. An apparatus for manufacturing a display device includes a first unit configured to remove impurities of a support substrate, a second unit configured to form a sacrificial layer on the support substrate, a third unit configured to form a flexible substrate on the sacrificial layer, and a fourth unit configured to form a display unit on the flexible substrate. The second unit includes a moving unit movable in a first direction to receive the support substrate, a first supply nozzle configured to spray a solution onto the support substrate to coat a graphene oxide layer, and a second supply nozzle configured to dry the graphene oxide layer coated on the support substrate while removing a portion of the graphene oxide layer, to form the sacrificial layer.

Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.