Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode.

Abstract: A mass flow controller comprises: a first flow meter constructed and arranged to measured flow rate of mass through the mass flow controller; a second flow meter constructed and arranged to measure flow rate of mass through the mass flow controller; a control valve constructed and arranged so as to control the flow rate of mass through the mass flow controller in response to a control signal generated as a function of the flow rate as measured by one of the flow meters; and a system controller constructed and arranged to generate the control signal, and to provide an indication when a difference between the flow rate of mass as measured by the first flow meter and the flow rate of mass as measured by the second flow meter exceeds a threshold.

Abstract: A mass flow controller comprises: a pressure-based flow meter, a thermal-based flow meter, a control valve, and a system controller. The pressure-based flow meter and thermal-based flow meter each measure flow rate of mass through the mass flow controller. The control valve controls the flow rate in response to a control signal generated as a function of the flow rate as measured by thermal-based flow meter when the measured flow rate is relatively low, and as a function of the flow rate as measured by the pressure-based flow meter when the flow rate is relatively high. A comparison of the flow measurements of the two flow meters can be used to (a) sense pressure disturbances at low flow rates, and (b) sense when the thermal-based flow meter is out of calibration so that a zero offset signal can be applied to the thermal-based flow meter.

Abstract: A mass flow control system can be self verified for its accuracy when controlling a flow to a process. The system comprises: a control valve for controlling the flow of fluid through the system as a function of a control signal; a controller for generating the control signal as a function of measured flow of fluid through the system and a targeted flow set point; a pressure sensor for measuring the controlling fluid pressure for use in measuring and verifying the flow rate; and a source of fluid for providing a known volume of fluid for use in verifying the system accuracy anytime between steps of the flow control process.

Abstract: A mass flow controller comprises: a first flow meter constructed and arranged to measured flow rate of mass through the mass flow controller; a second flow meter constructed and arranged to measure flow rate of mass through the mass flow controller; a control valve constructed and arranged so as to control the flow rate of mass through the mass flow controller in response to a control signal generated as a function of the flow rate as measured by one of the flow meters; and a system controller constructed and arranged to generate the control signal, and to provide an indication when a difference between the flow rate of mass as measured by the first flow meter and the flow rate of mass as measured by the second flow meter exceeds a threshold.

Abstract: A four channel gas delivery system comprising: an inlet channel; four outlet channels; four flow sensors; four control valves, each valve being arranged so as to control the flow from the inlet channel through a corresponding one of the outlet channels; a flow ratio control system configured so as to control the flow from the inlet channel through the corresponding outlet channels so that the following flow ratios are controlled: (a) a first ratio of flows between the outlet channels of a first pair; (b) a second ratio of flows between the outlet channels of a second pair; and (c) a third ratio of flows between the first pair of outlet channels relative to the second pair of outlet channels; wherein the third ratio is controlled by generating at least one bias signal respectively applied to at least one pair of valves, the bias signal being a function of a predetermined set point of the third ratio and measured values of the third ratio.

Abstract: A valve system for a mass flow controller that controls a flow rate of a fluid is disclosed. The valve system includes a valve movable between an open position and a closed position to adjust the flow rate of the fluid to a desired set point, and a valve controller. The valve controller sends a valve current through the valve, so as to adjust the flow rate of the fluid until an actual measured flow rate of the fluid substantially equals the desired set point. The valve controller monitors the valve current and the flow rate when the valve is moving to the closed position, determines a value of the valve current when the fluid has near-zero flow rate, and updates the valve cracking current for a next run, by setting the updated valve cracking current to the value of the valve current at the near-zero flow rate.

Abstract: A system for delivering pulses of a desired mass of gas to a tool, comprising: a mass flow controller including flow sensor, a control valve and a dedicated controller configured and arranged to receive a recipe of a sequence of steps for opening and closing the control valve so as to deliver as sequence of gas pulses as a function of the recipe. The mass flow controller is configured and arranged so as to operate in either one of at least two modes: as a traditional mass flow controller (MFC) mode or in a pulse gas delivery (PGD) mode. Further, the dedicated controller is configured and arranged to delivery pulses of gas in accordance with anyone of three different types of pulse gas delivery processes: a time based pulse delivery process, a mole based pulse delivery process and a profile based pulse delivery process.

Abstract: A pulse gas delivery system for delivering a sequence of pulses of prescribed amounts of gases to a process tool, comprises: (a) a plurality of channels, each including (i) a gas delivery chamber; (ii) an inlet valve connected so as to control gas flowing into the corresponding gas delivery chamber; and (iii) an outlet valve connected so as to control the amount of gas flowing out of the corresponding gas delivery chamber; and (b) a dedicated multiple channel controller configured so as to control the inlet and outlet valves of each of the channels so that pulses of gases in prescribed amounts can be provided to the process tool in a predetermined sequence in accordance with a pulse gas delivery process.

Abstract: A system for and method of delivering pulses of a desired mass of gas to a tool is described.

Abstract: A mass flow controller having a feedback controller gain, comprises: a sensor configured so as to sense the flow of fluid through controller; a valve arranged so as to adjust the flow of fluid through the controller; and a processor configured so as to control the valve as a function of the flow of fluid sensed by the sensor. The sensor and valve are arranged within a feedback system, and the processor updates the feedback controller gain in real time based on the ratio of at least one calibration gas parameter to at least one operating gas parameter, such that the closed loop transfer function of the feedback system remains substantially constant regardless of operating conditions so as to have a consistent control performance at different operation conditions from the calibration condition.

Abstract: A method of and a multiple zone pressure controller system for controlling the pressure of a gas or vapor flowing to at least two zones of a process tool such as a vacuum deposition chamber. The system comprises: at least two channels configured and arranged so as to provide the flow of the gas or vapor to corresponding zones of the process tool, each channel including a pressure controller configured and arranged to control the pressure of gas or vapor in each channel, a leakby orifice or nozzle configured to provide a leak rate of gas or vapor from the channel; and a controller configured and arrange to determine the true flow information to each zone of the process tool so that the true leak rate in the chamber can be determined.

Abstract: A system performs mass flow delivery of a fluid, and also performs mass flow verification of the fluid. The system includes an inlet valve that controls flow of the fluid into a chamber, an outlet valve that controls flow of the fluid out of the chamber, a pressure transducer that measures the pressure of the fluid within the chamber, a temperature sensor that measures the temperature of the fluid within the chamber, and a controller. The controller is configured to control opening and closing of the inlet and outlet valves, using the measurements of the pressure and the temperature change within the chamber, so as to verify, when in a first mode, a measurement of the flow rate of the fluid by a device, and so as to deliver, when in a second mode, a desired amount of the fluid from the chamber into a processing facility.

Abstract: This disclosure relates to mass flow verification systems for and methods of measuring and verifying the mass flow through a mass flow measurement device such as a mass flow controller. A mass flow verification system comprises a preset volume, a temperature sensor, and a pressure sensor. The measured verified flow determined by the mass flow verification system can be adjusted to compensate for errors resulting from a dead volume within the mass flow measurement device.

Abstract: A high accuracy mass flow verifier (HAMFV) which provides high measurement accuracy over a wide flow verification range with low inlet pressures is disclosed for verifying flow measurement by a fluid delivery device. The HAMFV includes a chamber defining a plurality N of inlets with upstream valves, an outlet with a downstream valve, a pressure sensor and a temperature sensor configured to measure the pressure and the temperature of the fluid within the chamber, respectively. A plurality N of critical flow nozzles is located adjacent to the corresponding upstream valve. The HAMFV further includes a controller configured to activate one of the plurality N of critical flow nozzles based on the desired flow verification range and the fluid type by opening the corresponding upstream valve and closing all other upstream valves. At least two of the plurality N of critical flow nozzles have different cross-sectional areas.

Abstract: A system performs mass flow delivery of a fluid, and also performs mass flow verification of the fluid. The system includes an inlet valve that controls flow of the fluid into a chamber, an outlet valve that controls flow of the fluid out of the chamber, a pressure transducer that measures the pressure of the fluid within the chamber, a temperature sensor that measures the temperature of the fluid within the chamber, and a controller. The controller is configured to control opening and closing of the inlet and outlet valves, using the measurements of the pressure and the temperature change within the chamber, so as to verify, when in a first mode, a measurement of the flow rate of the fluid by a device, and so as to deliver, when in a second mode, a desired amount of the fluid from the chamber into a processing facility.

Abstract: An integrated pressure and flow ratio control system includes N mass flow controllers MFCi (i=1, . . . , N) that each control the flow rate of a fluid Fi (i=1, . . . , N) flowing into a processing chamber. These N mass flow controllers are linked together by a digital communication network. One of the mass flow controllers is a master MFC, and the remaining N?1 MFCs are slave MFCs. The master MFC receives a pressure set point and a plurality N of flow ratio set points from a host controller, and communicates these set points to all the slave MFCs. In this way, the pressure in the chamber is maintained at the pressure set point and the flow ratios Qi/QT are maintained at the flow ratio set points, where Qi is flow rate of the i-th fluid Fi, and QT=Q1+Q2+ . . . QN is the sum of all N flow rates.

Abstract: The multiple antisymmetric optimal (MAO) control algorithm is disclosed for a gas delivery system including a flow ratio controller for dividing a single mass flow into multiple flow lines. In the MAO control algorithm, each flow line is provided with a flow sensor and a valve actively controlled by a SISO feedback controller combined with a linear saturator to achieve the targeted flow ratio set point. For optimal control performance, these SISO controller and linear saturators are substantial identical. It is proved that each valve control command is multiple antisymmetric to the summation of all other valve control commands. Therefore, the MAO control algorithm guarantees that there exists at least one valve at the allowable maximum open position at any moment, which achieves the optimal solution in terms of the maximum total valve conductance for a given set of flow ratio set points.

Abstract: A valve system for a mass flow controller that controls a flow rate of a fluid is disclosed. The valve system includes a valve movable between an open position and a closed position to adjust the flow rate of the fluid to a desired set point, and a valve controller. The valve controller sends a valve current through the valve, so as to adjust the flow rate of the fluid until an actual measured flow rate of the fluid substantially equals the desired set point. The valve controller monitors the valve current and the flow rate when the valve is moving to the closed position, determines a value of the valve current when the fluid has near-zero flow rate, and updates the valve cracking current for a next run, by setting the updated valve cracking current to the value of the valve current at the near-zero flow rate.

Abstract: The antisymmetric optimal control algorithm is disclosed for a gas delivery system including a flow ratio controller for dividing a single mass flow into at least two flow lines. Each flow line includes a flow meter and a valve. Both valves of the flow ratio controller are controlled through a ratio feedback loop by the antisymmetric optimal controller which includes a single input single output SISO controller, an inverter and two linear saturators. The output of the SISO controller is split and modified before being applied to the two valves. The two valve control commands are virtually antisymmetric to the maximum allowable valve conductance position.