Patents by Inventor Junhua Hong

Junhua Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240069080
    Abstract: A method for harmonic detection includes: acquiring a ripple component of a direct-current bus voltage; acquiring a harmonic component of the direct-current bus voltage based on the ripple component; acquiring a quadrature component of the harmonic component based on the harmonic component; acquiring a characteristic parameter of the harmonic component based on the quadrature component, in which the characteristic parameter includes a phase; and acquiring and outputting a voltage amplitude of the harmonic component based on the quadrature component and the phase of the harmonic component.
    Type: Application
    Filed: November 7, 2023
    Publication date: February 29, 2024
    Inventors: Junhua CHEN, Weihong HONG, Haohao WANG, Chao ZHOU, Guobin PENG, Mingsheng ZHONG
  • Patent number: 9818574
    Abstract: A beam current transmission system and method are disclosed. The beam current transmission system comprises an extraction device, a mass analyzer, a divergent element, a collimation element and a speed change and turning element, wherein an analysis plane of the mass analyzer is perpendicular to a convergent plane of the extracted beam, and after entering an entrance, the beam is converged on a convergent point in a plane perpendicular to the analysis plane, and then is diverged from the convergent point and transmitted to the divergent element from an exit; the collimation element is used for parallelizing the beam in a transmission plane of the beam; and the speed change and turning element is used for enabling the beam to change speed so as to achieve a target energy while the beam is deflected so that the transmission direction of the beam changes by a first pre-set angle.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: November 14, 2017
    Assignee: Kingston Semiconductor Company, Limited
    Inventors: Jiong Chen, Junhua Hong, Jin Zhang, Jeff Boeker
  • Publication number: 20170011898
    Abstract: A beam current transmission system and method are disclosed. The beam current transmission system comprises an extraction device, a mass analyzer, a divergent element, a collimation element and a speed change and turning element, wherein an analysis plane of the mass analyzer is perpendicular to a convergent plane of the extracted beam, and after entering an entrance, the beam is converged on a convergent point in a plane perpendicular to the analysis plane, and then is diverged from the convergent point and transmitted to the divergent element from an exit; the collimation element is used for parallelizing the beam in a transmission plane of the beam; and the speed change and turning element is used for enabling the beam to change speed so as to achieve a target energy while the beam is deflected so that the transmission direction of the beam changes by a first pre-set angle.
    Type: Application
    Filed: May 9, 2016
    Publication date: January 12, 2017
    Inventors: Jiong Chen, Junhua Hong, Jin Zhang, Jeff Boeker
  • Patent number: 9455363
    Abstract: A method for doping a semiconductor substrate is disclosed wherein a layer of a first conductivity type is first formed followed by forming a blocking layer with an open area. An etch process is performed through the open area to remove the layer of the first conductivity type to exposed the top surface of the semiconductor substrate. Dopant ions are introduced to form a dopant region of a second conductivity type on the beneath the top surface of the semiconductor substrate wherein the dopant region of the second conductivity type is not in contact with the dopant layer of the first conductivity type that is not etched off thus forming a PN structure to form diodes for the interdigitated back contact photovoltaic cells. Since the ion doping processes are self-aligned, the mask requirements are minimized and the production cost for solar cells are reduced.
    Type: Grant
    Filed: June 17, 2013
    Date of Patent: September 27, 2016
    Assignee: Kingstone Semiconductor Company, Limited
    Inventors: Jiong Chen, Junhua Hong
  • Publication number: 20140366936
    Abstract: A method for doping a semiconductor substrate is disclosed wherein a layer of a first conductivity type is first formed followed by forming a blocking layer with an open area. An etch process is performed through the open area to remove the layer of the first conductivity type to exposed the top surface of the semiconductor substrate. Dopant ions are introduced to form a dopant region of a second conductivity type on the beneath the top surface of the semiconductor substrate wherein the dopant region of the second conductivity type is not in contact with the dopant layer of the first conductivity type that is not etched off thus forming a PN structure to form diodes for the interdigitated back contact photovoltaic cells. Since the ion doping processes are self-aligned, the mask requirements are minimized and the production cost for solar cells are reduced.
    Type: Application
    Filed: June 17, 2013
    Publication date: December 18, 2014
    Inventors: Jiong Chen, Junhua Hong
  • Patent number: 7687784
    Abstract: An implanter is equipped with an ion beam current detector, a temperature sensor, a temperature controller and a cooling system to increase the ratio of a specific ion cluster in the ion source chamber of the implanter. Therefore, the implanting efficiency for a shallow ion implantation is increased consequently.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: March 30, 2010
    Assignees: Advanced Ion Beam Technology, Inc., Advanced Ion Beam Technology, Inc.
    Inventors: Nai-Yuan Cheng, Yun-Ju Yang, Cheng-Hui Shen, Junhua Hong, Jiong Chen, Tienyu Sheng, Linuan Chen
  • Publication number: 20090194704
    Abstract: An implanter is equipped with an ion beam current detector, a temperature sensor, a temperature controller and a cooling system to increase the ratio of a specific ion cluster in the ion source chamber of the implanter. Therefore, the implanting efficiency for a shallow ion implantation is increased consequently.
    Type: Application
    Filed: May 23, 2008
    Publication date: August 6, 2009
    Inventors: Nai-Yuan CHENG, Yun-Ju Yang, Cheng-Hui Shen, Junhua Hong, Jiong Chen, Tienyu Sheng, Linuan Chen
  • Publication number: 20020149812
    Abstract: The present invention enables system verification and test of high quality optical networks with extremely low BER. The invention allows investigation of optical nonlinear penalty contributions by varying channel power while keeping constant OSNR at the receiver end. The present invention provides a method to measure system performance gains and penalties associated with different dispersion maps. The present invention gives simple automated test procedures which ensures fast test time. The present invention comprises a transmitter for transmitting an optical test signal to the optical network. The present invention includes a first attenuating module for attenuating channel power of the optical test signal. Also, the present invention includes a noise injection module for adding noise to the optical test signal.
    Type: Application
    Filed: April 17, 2001
    Publication date: October 17, 2002
    Inventors: Junhua Hong, Jianying Zhou