Abstract: The present invention relates to the use of rotavirus particles for displaying a heterologous protein, alone or in complex with another molecule. The invention further relates to methods that employ these modified rotavirus particles to rapidly determine the structure of the heterologous protein or the complex using cryo-electron microscopy (cryo-EM). The invention also relates to a method of immunizing a patient, wherein said method comprises administering to the patient the modified rotavirus particles of the invention.

Abstract: The present invention relates to the use of rotavirus particles for displaying a heterologous protein, alone or in complex with another molecule. The invention further relates to methods that employ these modified rotavirus particles to rapidly determine the structure of the heterologous protein or the complex using cryo-electron microscopy (cryo-EM). The invention also relates to a method of immunising a patient, wherein said method comprises administering to the patient the modified rotavirus particles of the invention.

Abstract: This invention discloses a method for fabricating a holographic grating with low diffractive wave aberrations on a substrate with aberrations. Forming a interference recording field from two coherent beams, where one is a parallel beam and the other is a beam whose wave-front can be controlled, recording the holographic field on the substrate with aberrations, fabricating the holographic grating with low diffractive wave aberrations, setting a deformable minor into one of the coherent recording beams, and controlling the shape of said deformable minor so as to obtain a compensated interference recording field. Expose the recoding plate under the holographic interference recording field which has been adjusted by the deformable minor to record the grating. After developing, the fabrication of holographic grating with low diffractive wave aberration is finished.

Abstract: A novel projection lithography camera is disclosed with a large field area and large numerical aperture. The camera comprises only two aspheric mirrors with a two-reflection configuration. The two mirrors are arranged on a common axis of symmetry such that efficient use of extreme ultraviolet radiation can be achieved. In one preferred embodiment, a reduced image of mask is formed by reflection of the two mirrors on a wafer with feature sizes less than 0.05 &mgr;m over a field larger than 22 mm×22 mm with the NA being larger than 0.22. The system is appropriate for EUV steppers.