Patents by Inventor JunHua Yan

JunHua Yan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240131477
    Abstract: Hydroxide-exchange membranes (HEMs) and hydroxide-exchange ionomers (HEIs) are provided which include polymers with oxidation resistant groups. The attachment of the oxidation resistant groups to the polymer backbone allows fine-tuning of the mechanical properties of the membrane and incorporation of alkaline stable cations, such as imidazoliums, phosphoniums and ammoniums, and provides enhanced stability to the polymer. HEMs/HEIs formed from these polymers exhibit superior chemical stability, anion conductivity, decreased water uptake, good solubility in selected solvents, and improved mechanical properties in an ambient dry state as compared to conventional HEM/HEIs. The HEMs exhibit enhanced stability in a highly oxidative environment.
    Type: Application
    Filed: February 4, 2022
    Publication date: April 25, 2024
    Inventors: Yushan Yan, Keda Hu, Lan Wang, Brian Setzler, Wenjuan Shi, Junhua Wang
  • Patent number: 11944599
    Abstract: A method of extracting myricetin from Xanthoceras sorbifolia Bunge is provided. The method includes: step 1, baking obtaining Xanthoceras sorbifolia Bunge crude powder; step 2, mixing the crude powder with a counter-current extraction solution to perform a counter-current extraction to obtain a filtrate and a filter residue; step 3, mixing the filter residue with a solvent to obtain a first mixture, and heating the first mixture to reflux for extraction to obtain an extraction liquid; step 4, mixing the extraction liquid and the filtrate, and concentrating under reduced pressure to obtain a concentrated solution; and step 5, separating and eluting the concentrated solution to obtain an eluent, then drying the eluent to obtain the myricetin.
    Type: Grant
    Filed: September 29, 2023
    Date of Patent: April 2, 2024
    Assignee: HEBEI RUILONG BIOTECHNOLOGY CO., LTD
    Inventors: Weijia Li, Jingmei Zheng, Jingyi Yan, Junhua Wang
  • Publication number: 20240075008
    Abstract: The disclosure relates to the technical field of extraction of an active ingredient from traditional Chinese medicine, and provides a method of extracting myricetin from Xanthoceras sorbifolia Bunge.
    Type: Application
    Filed: September 29, 2023
    Publication date: March 7, 2024
    Applicant: HEBEI RUILONG BIOTECHNOLOGY CO., LTD
    Inventors: Weijia LI, Jingmei ZHENG, Jingyi YAN, Junhua WANG
  • Publication number: 20170279937
    Abstract: A method for the translation between IPv4 and IPv6 is disclosed, including: a BIH link tracker and quick translator are provided in a network core and when a link is established between an IPv4 client and IPv6 server, a standard translator translates and sends to the IPv6 server, a packet sent from the IPv4 client to the IPv6 server, and the BIH link tracker extracts and records information on link and translation of the IPv4 client and IPv6 server from the packet for interaction therebetween; and during a process of sending the packet after establishing the link between the IPv4 client and IPv6 server, the packet is sent to the quick translator which translates and sends the packet according to the information on the translation corresponding to the information on the link recorded by the BIH link tracker. A device for the translation between IPv4 and IPv6 is also disclosed.
    Type: Application
    Filed: November 18, 2014
    Publication date: September 28, 2017
    Inventors: Sheng Shi, Quan Sun, Junhua Yan
  • Patent number: 9570562
    Abstract: A method of planarizing a polysilicon gate are provided, comprising: growing a polysilicon gate layer on a substrate with trenches; depositing an oxide layer on the polysilicon gate layer; oxidizing the top portion of the polysilicon gate layer from the flat surface of the oxide layer, so as to form a silicon oxide interlayer in the top portion of the polysilicon gate layer; the bottom of the silicon oxide interlayer is aligned with or lower than the low-lying areas of surface of the polysilicon gate layer; removing the oxide layer and the silicon oxide interlayer, so as to obtain a flat surface of the polysilicon gate layer and avoid a series of problems resulted from the uneven surface in the subsequent processes.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: February 14, 2017
    Assignee: SHANGHAI HUALI MICROELECTRONICS CORPORATION
    Inventors: Tong Lei, Junhua Yan
  • Patent number: 8987101
    Abstract: A method of forming strained source and drain regions in a P-type FinFET structure is disclose. The method comprises depositing an isolation layer on the FinFET structure; applying a lithography and etching process to expose the isolation layer in two areas on opposite sides of the gate over the source/drain region of the FinFET, and etching through the exposed isolation layer to expose the semiconductive material of the source/drain region in the two areas; forming a recess in each of the source/drain region from the exposed semiconductive material; selectively epitaxially growing another semiconductive material in the recesses to increase the source/drain strain; and removing the rest of the isolation layer.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: March 24, 2015
    Assignee: Shanghai Huali Microelectronics Corporation
    Inventors: Yi Ding, Minghua Zhang, Jingxun Fang, Junhua Yan
  • Publication number: 20140357041
    Abstract: A method of forming strained source and drain regions in a P-type FinFET structure is disclose. The method comprises depositing an isolation layer on the FinFET structure; applying a lithography and etching process to expose the isolation layer in two areas on opposite sides of the gate over the source/drain region of the FinFET, and etching through the exposed isolation layer to expose the semiconductive material of the source/drain region in the two areas; forming a recess in each of the source/drain region from the exposed semiconductive material; selectively epitaxially growing another semiconductive material in the recesses to increase the source/drain strain; and removing the rest of the isolation layer.
    Type: Application
    Filed: September 30, 2013
    Publication date: December 4, 2014
    Applicant: Shanghai Huali Microelectronics Corporation
    Inventors: Yi Ding, Minghua Zhang, Jingxun Fang, Junhua Yan
  • Patent number: 7220365
    Abstract: Disclosed is a heat transfer medium having high heat transfer rate, being useful in even wider fields, simple in structure, easy to made, environmentally sound, and capable of rapidly conducting heat and preserving heat in a highly efficient manner. Further disclosed are a heat transfer surface and a heat transfer element utilizing the heat transfer medium. Further disclosed are applications of the heat transfer element.
    Type: Grant
    Filed: August 13, 2001
    Date of Patent: May 22, 2007
    Assignee: New Qu Energy Ltd.
    Inventors: YuZhi Qu, ZhiPeng Qu, Jason Chao, YuFu Li, Peng Chen, JunHua Yan, Hong Yuan Yang, Qi Feng Wei
  • Publication number: 20030066638
    Abstract: Disclosed is a heat transfer medium having high heat transfer rate, being useful in even wider fields, simple in structure, easy to made, environmentally sound, and capable of rapidly conducting heat and preserving heat in a highly efficient manner. Further disclosed are a heat transfer surface and a heat transfer element utilizing the heat transfer medium. Further disclosed are applications of the heat transfer element.
    Type: Application
    Filed: August 13, 2001
    Publication date: April 10, 2003
    Inventors: YuZhi Qu, ZhiPeng Qu, Jason Chao, YuFu Li, Peng Chen, JunHua Yan, Hong Yuan Yang, Qi Feng Wei