Abstract: A deposition apparatus includes: a support module having a plurality of support parts coupled to a target substrate; a base substrate coupled to the support module; a connection member for connecting the plurality of support parts to the base substrate; and a mask assembly configured to mask a deposition material provided to the target substrate. The support module further includes position control parts, which control the plurality of support parts to be movable along a direction axis perpendicular to a major surface of each of the support parts, respectively.

Abstract: A mask assembly includes a mask, a frame having an external portion surrounding an opening, a mask fixing portion including a long-side stick and a short-side stick for fixing the mask, and a height correcting member connecting the mask fixing portion and the external portion of the frame.

Abstract: A substrate loading device includes an electrostatic chuck that chucks a substrate, a mask frame disposed under the electrostatic chuck, and including an edge having a flat top surface, and a plurality of holders disposed between the electrostatic chuck and the mask frame. Each of the plurality of holders includes a first connection part connected to a side of the electrostatic chuck, a second connection part connected to the first connection part and extending in a direction intersecting an extension direction of the first connection part, and a third connection part connected to the second connection part, extending in a direction intersecting an extension direction of the second connection part, and rotationally moving between a first position overlapping the substrate in a thickness direction of the substrate and a second position spaced apart from the substrate.

Abstract: A stage unit includes a stage that provides a seating surface and has an opening formed through the seating surface, a first support unit disposed below the opening and coupled to the stage, a second support unit disposed below the opening and coupled to the stage, where the second support unit is spaced apart from the first support unit on a plane, and a flatness measurement unit supported by the first support unit. Each of the first support unit and the second support unit provides a support surface that crosses the seating surface, and the support surface of the first support unit and the support surface of the second support unit are movable in a direction toward and away from the opening.

Abstract: A deposition apparatus includes: a chamber; a deposition source disposed in the chamber to include nozzles arranged in a first direction; and a deposition angle limiter disposed on the deposition source in the chamber. The deposition angle limiter includes: a low-incident angle limiting plate disposed between adjacent first and second nozzles among the nozzles and spaced apart from the first nozzle by a first height in a height direction intersecting the first direction; and a high-incident angle limiting plate surrounding at least a portion of the first nozzle and spaced apart from the first nozzle by a second height in the height direction. The first nozzle extends in the height direction.

Abstract: A deposition apparatus includes a mask, a mask frame, a stage disposed on a rear surface of the mask frame, and first to third external force applying parts disposed on the stage. Each of the first portion and the second portion includes a support and a driving part which moves the support. The first to third external force applying parts applies external force to the mask frame to control a shape of the mask frame.

Abstract: A deposition apparatus according to an embodiment includes a deposition source, and a deposition portion that faces the deposition source. The deposition portion is disposed at an angle of about 4 degrees to about 14 degrees with respect to an imaginary vertical line that is perpendicular to ground. The deposition portion includes a frame including an opening, and an outer portion disposed around the opening, a substrate disposed on a first side of the frame, and a plurality of back stages disposed on a second side opposite to the first side of the frame. The frame moves by movement of the plurality of back stages.

Abstract: Disclosed is a deposition mask stage comprising a stage frame, chucks combined with the stage frame, and support blocks on a back side of the stage frame. The chucks are spaced apart from each other in a first direction and a second direction that are defined in an extending direction of the stage frame. The first and second directions intersect each other. The support blocks are spaced apart from each other in the first direction and the second direction on the back side of the stage frame.

Abstract: A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction and that includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion.

Abstract: A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction and that includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion.

Abstract: A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction and that includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion.

Abstract: A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction and that includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion.

Abstract: A mask assembly includes a mask frame including an edge portion including opposing upper and lower portions along a first direction, and a support which between the upper portion and the lower portion of the edge portion along the first direction; and a mask attachable to the mask frame. The mask includes a pattern area corresponding to the support and including a first welded area at which the mask is attachable to the support, an alignment adjustment pattern adjacent to the first welded area along the first direction, and a second thickness of the mask at the alignment adjustment pattern which is less than a first thickness of the mask at the first welded area, and a first deposition area including upper deposition openings of the mask and between the upper portion and the support of the mask frame.

Abstract: An apparatus for manufacturing a display apparatus includes a substrate. A mask assembly includes an opening, a mask frame surrounding the opening, and at least one mask coupled to the mask frame. An electrostatic chuck is configured to attach the substrate to the at least one mask. A first driver is configured to drive the electrostatic chuck. At least a partial portion of the mask frame does not overlap the electrostatic chuck in a thickness direction of the substrate.

Abstract: A display device including a display area and a non-display area surrounding the display area, the display area including a first display area and a second display area. The display device also includes a substrate; and a plurality of pixels arranged in the substrate and including first pixels and second pixels, the first pixels included in the first display area, and the second pixels included in the second display area, wherein the first pixels include a repeating arrangement structure of first pixel units including a plurality of pixels having different colors, and the second pixels each include a repeating arrangement structure of second pixel units including a greater number of pixels than the number of pixels included in each of the first pixel units.

Abstract: An electrostatic chuck unit includes a first wiring portion configured to generate a relatively weak electrostatic force and a second wiring portion configured to generate a relatively strong electrostatic force.

Abstract: A deposition mask assembly including: a frame, a pair of auxiliary masks and a deposition divided mask. The frame includes an opening area through which deposition material passes, and first, second, third and fourth side portions which collectively define the opening area. The pair of auxiliary masks are on the frame, fixed to the first and third side portions which face each other in a first direction with respect to the opening area thereof, and disposed respectively adjacent to the second and fourth side portions which face each other in a second direction crossing the first direction. The divided mask is spaced apart from each of the pair of auxiliary masks and fixed to the first and third side portions. In the second direction, a width of the pair of auxiliary masks is less than a width of the divided mask.

Abstract: A mask frame assembly includes a frame, and a mask tensioned on the frame in a first direction, the mask having a deposition pattern portion having a plurality of pattern holes therethrough, a deposition material being deposited on a substrate through the pattern holes, and a dummy portion extending from the deposition pattern portion in the first direction, the dummy portion having an increased thickness in a second direction as a distance from the deposition pattern portion in the first direction increases, the second direction being oriented along a normal to the mask.

Abstract: A mask frame assembly including a frame including a first opening, a first mask including second openings that each has an area smaller than the first opening and a first surface having portions of the first surface connected to the frame. The mask frame assembly includes second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular. The second masks include pattern parts having a shape corresponding to the second openings. The pattern parts each include pattern holes configured to allow a deposition material to pass through. The second masks include a rib part disposed between the pattern parts. The rib part includes dummy holes each having an area greater than each of the pattern holes. The first mask is configured to block the deposition material passing through the dummy holes.

Abstract: A mask assembly for thin film deposition including a mask frame defining and surrounding an opening, and a mask coupled to the mask frame and having a plurality of deposition pattern units formed in a longitudinal direction of the mask and spaced apart from each other. The respective deposition pattern units include a deposition area, and each deposition area is divided into a plurality of pattern portions.