Abstract: A processing apparatus includes: a seal chamber that communicates with interior and exterior of a main chamber; an evacuation unit that evacuates a gas from the main and/or the seal chamber; and a control unit that controls a first differential pressure between a pressure in the seal chamber and a first reference pressure by the evacuation unit; wherein: the evacuation unit has a first evacuation system that evacuates the gas from the seal chamber; the control unit has a first and second mode as operating modes for controlling the first differential pressure, the first evacuation system operating with a feedback control based on the first differential pressure in the first mode and with a control different from the feedback control in the second mode; and the control unit shifts the operating mode from the first to the second mode in accordance with increase in the gas in the main chamber.

Abstract: A powder discharge passage (51) formed in a cover member (50) that covers a part of a powder feeding disk (45), and a first gas feeding passage (52) are formed so as to face each other across a gap (GP) between the cover member (50) and the powder feeding disk (45), so as to extend along the bottom surface of a receiver (47) located in the gap (GP).