Patents by Inventor Junichi Iwasawa
Junichi Iwasawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230227375Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: ApplicationFiled: March 7, 2023Publication date: July 20, 2023Inventors: Junichi IWASAWA, Toshihiro AOSHIMA
-
Patent number: 11623898Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: GrantFiled: January 14, 2019Date of Patent: April 11, 2023Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Toshihiro Aoshima
-
Patent number: 11127569Abstract: A plasma-resistant member that includes a base material and a layer structural component is provided, wherein the layer structural component includes an yttria polycrystalline body, is formed at a surface of the base material, and has plasma resistance; crystallites that are included in the yttria polycrystalline body included in the layer structural component are not bonded to each other via a heterogenous phase; the yttria polycrystalline body included in the layer structural component has a crystal structure including only cubic, or a crystal structure in which cubic and monoclinic coexist; and an average value of a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component is greater than 0% and not more than 60%.Type: GrantFiled: June 22, 2018Date of Patent: September 21, 2021Assignee: Toto Ltd.Inventor: Junichi Iwasawa
-
Patent number: 10759710Abstract: Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.Type: GrantFiled: March 8, 2019Date of Patent: September 1, 2020Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Hiroaki Ashizawa, Takuma Wada, Ryoto Takizawa, Toshihiro Aoshima, Yuuki Takahashi, Atsushi Kinjo
-
Publication number: 20190276368Abstract: Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.Type: ApplicationFiled: March 8, 2019Publication date: September 12, 2019Inventors: Junichi IWASAWA, Hiroaki ASHIZAWA, Takuma WADA, Ryoto TAKIZAWA, Toshihiro AOSHIMA, Yuuki TAKAHASHI, Atsushi KINJO
-
Publication number: 20190144347Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: ApplicationFiled: January 14, 2019Publication date: May 16, 2019Inventors: Junichi IWASAWA, Toshihiro AOSHIMA
-
Patent number: 10287212Abstract: There is provided a plasma-resistant member, including: a base material; and a layer structural component formed by aerosol deposition at a surface of the base material, the layer structural component being plasma-resistant and including an yttria polycrystalline body, the yttria polycrystalline body included in the layer structural component having a crystal structure in which cubic and monoclinic coexist, a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component being not less than 0% and not more than 60%, a crystallite size of the yttria polycrystalline body included in the layer structural component being not less than 8 nm and not more than 50 nm.Type: GrantFiled: June 19, 2015Date of Patent: May 14, 2019Assignee: Toto Ltd.Inventor: Junichi Iwasawa
-
Patent number: 10221105Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: GrantFiled: December 27, 2013Date of Patent: March 5, 2019Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Toshihiro Aoshima
-
Publication number: 20180301321Abstract: A plasma-resistant member that includes a base material and a layer structural component is provided, wherein the layer structural component includes an yttria polycrystalline body, is formed at a surface of the base material, and has plasma resistance; crystallites that are included in the yttria polycrystalline body included in the layer structural component are not bonded to each other via a heterogenous phase; the yttria polycrystalline body included in the layer structural component has a crystal structure including only cubic, or a crystal structure in which cubic and monoclinic coexist; and an average value of a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component is greater than 0% and not more than 60%.Type: ApplicationFiled: June 22, 2018Publication date: October 18, 2018Inventor: Junichi IWASAWA
-
Publication number: 20170152189Abstract: There is provided a plasma-resistant member, including: a base material; and a layer structural component formed by aerosol deposition at a surface of the base material, the layer structural component being plasma-resistant and including an yttria polycrystalline body, the yttria polycrystalline body included in the layer structural component having a crystal structure in which cubic and monoclinic coexist, a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component being not less than 0% and not more than 60%, a crystallite size of the yttria polycrystalline body included in the layer structural component being not less than 8 nm and not more than 50 nm.Type: ApplicationFiled: June 19, 2015Publication date: June 1, 2017Inventor: Junichi IWASAWA
-
Publication number: 20160332921Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.Type: ApplicationFiled: December 27, 2013Publication date: November 17, 2016Applicant: TOTO LTD.Inventors: Junichi IWASAWA, Toshihiro AOSHIMA
-
Patent number: 8114473Abstract: A composite structure having excellent plasma resistance includes a base material having a surface containing a ceramic polycrystal and a structure formed on the surface of the base material containing the ceramic polycrystal, wherein the structure contains a polycrystal containing a brittle material; a grain boundary layer having a glass layer does not substantially exist on a boundary face between crystals forming the polycrystal; a part of the polycrystal forms an anchor part embedded into the base material surface; and an average roughness (Ra) of an interface between the anchor part and the base material surface is 100 nm or less.Type: GrantFiled: April 25, 2008Date of Patent: February 14, 2012Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Hironori Hatono
-
Patent number: 7897268Abstract: According to the present invention, a structure made of yttrium oxide is formed on a surface of a substrate comprises yttrium oxide polycrystals as a main component, a boundary layer made of hyaline does not substantially exist on a boundary face between crystals which form the structure, and both a cubic system and a monoclinic system exist in the crystal system of the yttrium oxide polycrystals. With this, it is possible to adjust the hardness of the structure made of yttrium oxide formed on a surface of a substrate to be larger than that of an yttrium oxide sintered body.Type: GrantFiled: October 10, 2006Date of Patent: March 1, 2011Assignee: Toto Ltd.Inventors: Junichi Iwasawa, Ryoichi Nishimizu, Hironori Hatono, Hiroaki Ashizawa
-
Publication number: 20090233126Abstract: According to the present invention, a structure made of yttrium oxide is formed on a surface of a substrate comprises yttrium oxide polycrystals as a main component, a boundary layer made of hyaline does not substantially exist on a boundary face between crystals which form the structure, and both a cubic system and a monoclinic system exist in the crystal system of the yttrium oxide polycrystals. With this, it is possible to adjust the hardness of the structure made of yttrium oxide formed on a surface of a substrate to be larger than that of an yttrium oxide sintered body.Type: ApplicationFiled: October 10, 2006Publication date: September 17, 2009Inventors: Junichi Iwasawa, Ryoichi Nishimizu, Hironori Hatono, Hiroaki Ashizawa
-
Method for Producing Film Using Aerosol, Particles Mixture Therefor, and Film and Composite Material
Publication number: 20080274347Abstract: There is disclosed a method for producing a film with use of aerosol which is capable of forming a film of satisfactory quality at a high film formation rate. In the method, first, a carrier gas is mixed into a particle mixture which comprises raw fine particles comprising a brittle material as a main component and having a 50% average particle diameter of 0.010 ?m to 1.0 ?m on a volume basis, and auxiliary particles comprising a brittle material of the same type as or a different type from the brittle material of the raw fine particles as a main component and having a 50% average particle diameter of 3.0 ?m to 100 ?m on a volume basis, to form an aerosol. The aerosol is ejected onto the surface of a substrate to make the particle mixture come into collision with the substrate, so that the collision crushes or deforms the raw fine particles to form a film on the substrate.Type: ApplicationFiled: March 18, 2005Publication date: November 6, 2008Inventors: Junichi Iwasawa, Hironori Hatono, Hiroaki Ashizawa, Tomokazu Ito, Kaori Miyahara -
Publication number: 20080274333Abstract: It is intended to provide a composite structure excellent in resistance characteristics such as plasma resistance. The composite structure includes a base material having a surface containing a ceramic polycrystal and a structure formed on the surface of the base material containing the ceramic polycrystal, wherein the structure contains a polycrystal containing a brittle material; a grain boundary layer having a glass layer does not substantially exist on a boundary face between crystals forming the polycrystal; a part of the polycrystal forms an anchor part embedded into the base material surface; and an average roughness (Ra) of an interface between the anchor part and the base material surface is 100 nm or less.Type: ApplicationFiled: April 25, 2008Publication date: November 6, 2008Applicant: Toto Ltd.Inventors: Junichi Iwasawa, Hironori Hatono
-
Publication number: 20080274348Abstract: There is disclosed a method for producing a film with use of aerosol which is capable of forming a film of satisfactory quality at an extremely high film formation rate. In the method, first, a carrier gas is mixed into fine particles comprising a brittle material as a main component and having a 50% average particle diameter of 100 nm to 300 nm on a number basis to form an aerosol. The aerosol is ejected onto the surface of a substrate to make the fine particles come into collision with the substrate, so that the collision crushes or deforms the fine particles to form a film on the substrate.Type: ApplicationFiled: March 18, 2005Publication date: November 6, 2008Inventors: Junichi Iwasawa, Hironori Hatono, Hiroaki Ashizawa
-
Publication number: 20060178010Abstract: In order to control and reduce generation of disjoined grains from a plasma-resistant member, the present invention provides a plasma-resistant member having no pores and boundary layers. In a layer structure made of yttria polycrystal and formed on a surface of a member for a semiconductor manufacturing apparatus on a side exposed to plasma, the ratio of pores to the surface of the layer structure is less than 0.1 area %. With this, corrosion from pores never progresses even in a plasma atmosphere. It is also possible to control and reduce disjoined grains due to such corrosion.Type: ApplicationFiled: March 23, 2006Publication date: August 10, 2006Applicant: TOTO LTD.Inventors: Junichi Iwasawa, Hironori Hatono, Naoya Terada, Yuji Aso, Masakatsu Kiyohara
-
Publication number: 20060159946Abstract: In order to control and reduce generation of disjoined grains from a plasma-resistant member, the present invention provides a plasma-resistant member having no pores and boundary layers. In a layer structure made of yttria polycrystal and formed on a surface of a member for a semiconductor manufacturing apparatus on a side exposed to plasma, substantially no hyaline boundary layer exists in the yttria polycrystal. With this, corrosion from a boundary layer never progresses even in a plasma atmosphere. It is also possible to control and reduce disjoined grains due to such corrosion.Type: ApplicationFiled: November 21, 2005Publication date: July 20, 2006Applicant: TOTO LTD.Inventors: Junichi Iwasawa, Hironori Hatono, Naoya Terada, Yuji Aso, Masakatsu Kiyohara
-
Patent number: 5588732Abstract: A lighting apparatus is comprised of an illumination unit arranged so as to project from a light apparatus body by a predetermined distance, a spring for spring-biasing the illumination unit in the direction in which the illumination unit is projected from the light apparatus body, a power switch for the illumination unit which is switched in accordance with a movement of the illumination unit, an engaging portion for engaging the illumination unit at the position close to the light apparatus body, and a releasing portion for releasing the engaging portion, wherein the lighting apparatus can be energized only when the illumination unit is projected from the lighting apparatus body. Also, an electrode apparatus attached to power source equipments such as a battery pack or the like is comprised of an electrode cover for shielding an electrode portion, wherein the electrode cover can be opened by a projected electrode portion of the equipments to which the power source equipment is attached.Type: GrantFiled: July 1, 1994Date of Patent: December 31, 1996Assignees: Sony Corporation, Asahi Research Corp.Inventors: Yuu Sasaki, Junichi Iwasawa, Masahiro Yamada