Patents by Inventor Junichi Kakuta

Junichi Kakuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8481934
    Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.
    Type: Grant
    Filed: May 14, 2011
    Date of Patent: July 9, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Makoto Ezumi, Satoru Iwama, Junichi Kakuta, Takahiro Sato, Akira Ikegami
  • Patent number: 8188427
    Abstract: A method and apparatus for alignment and astigmatism correction for a scanning electron microscope can prevent an alignment or correction error attributable to the conditions of a particular specimen. First, a difference is determined between optimal values acquired from an automatic axis alignment result on a standard sample, and those obtained from each of a plurality automatic axis alignment results on a observation target sample. An optimal value is then adjusted using the standard sample, by use of the difference thus obtained. Correspondingly, an optimal stigmator value (astigmatism correction signal) is acquired by using the standard sample, and storing the optimal stigmator value as a default value. The optimal stigmator value and the default value depending on the height of an observation target sample pattern are added, and an astigmatism correction is performed on the basis of the resultant stigmator value.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: May 29, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Junichi Kakuta, Kazuhiro Ueda, Tatsuya Maeda, Hiroyuki Saito, Katsuhiro Sasada
  • Publication number: 20120070089
    Abstract: Provided is a method of manufacturing a template matching template, as well as a device for manufacturing a template, by both of which high matching accuracy can be stably ensured without being affected by factors such as process variations. As an embodiment of the above, a method of manufacturing a template matching template, as well as a relevant deice, is proposed by both of which a template memorized in advance and an image acquired by a microscope are compared, thereby identifying a desired position, and by which a plurality of images at the identified location are acquired by template matching, and the aforementioned plurality of images are added and averaged, thereby manufacturing a new template.
    Type: Application
    Filed: May 21, 2010
    Publication date: March 22, 2012
    Inventors: Yukari Yamada, Kyoungmo Yang, Junichi Kakuta
  • Patent number: 8052146
    Abstract: Provided is a sheet inverting apparatus wherein members, such as a roller, are not brought into contact with the printed surface of a sheet at all, and the occurrence of dirt can be prevented by eliminating friction of ink on the surface of the sheet. A first transport apparatus and a second transport apparatus each have a plurality of transport belts which move on transport tracks along sheet transport directions and a suction box which sucks the sheet on the transport belts through suction holes formed on the transport belts. A turn guide arranged between the first transport apparatus and the second transport apparatus has a plurality of guide ribs disposed between the transport belts. Each of the guide ribs coming into slidable contact with the sheet forms a curved inverting transfer surface from an inversion starting point side to an inversion end point side.
    Type: Grant
    Filed: August 28, 2008
    Date of Patent: November 8, 2011
    Assignees: Duplo Seiko Corporation, Seiko Epson Corporation
    Inventors: Yoshihide Sugiyama, Kazuya Yamamoto, Katsunori Takahashi, Hidemasa Kanada, Junichi Kakuta
  • Publication number: 20110215243
    Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.
    Type: Application
    Filed: May 14, 2011
    Publication date: September 8, 2011
    Inventors: Makoto EZUMI, Satoru Iwama, Junichi Kakuta, Takahiro Sato, Akira Ikegami
  • Publication number: 20110147587
    Abstract: Disclosed is a diagnosis device of a recipe used for a scanning electron microscope that quickly specifies an error causing factor of the recipe due to a process fluctuation or the like. Specifically disclosed is, a diagnosis device of a recipe to operate a scanning electron microscope is provided with a program to make a display device show shift in a score indicating the degree of pattern matching consistency, wherein a condition of the pattern matching is set in the recipe; a deviation of coordinates before and after the pattern matching; changes in information or the like on fluctuation amounts of a lens before and after the execution of automatic focuses.
    Type: Application
    Filed: September 16, 2009
    Publication date: June 23, 2011
    Inventors: Kyoungmo Yang, Junichi Kakuta, Yukari Yamada (nee Nakata)
  • Patent number: 7960696
    Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: June 14, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Makoto Ezumi, Satoru Iwama, Junichi Kakuta, Takahiro Sato, Akira Ikegami
  • Publication number: 20100109235
    Abstract: Provided is a sheet inverting apparatus wherein members, such as a roller, are not brought into contact with the printed surface of a sheet at all, and the occurrence of dirt can be prevented by eliminating friction of ink on the surface of the sheet. A first transport apparatus and a second transport apparatus each have a plurality of transport belts which move on transport tracks along sheet transport directions and a suction box which sucks the sheet on the transport belts through suction holes formed on the transport belts. A turn guide arranged between the first transport apparatus and the second transport apparatus has a plurality of guide ribs disposed between the transport belts. Each of the guide ribs coming into slidable contact with the sheet forms a curved inverting transfer surface from an inversion starting point side to an inversion end point side.
    Type: Application
    Filed: August 28, 2008
    Publication date: May 6, 2010
    Inventors: Yoshihide Sugiyama, Kazuya Yamamoto, Katsunori Takahashi, Hidemasa Kanada, Junichi Kakuta
  • Publication number: 20090084954
    Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.
    Type: Application
    Filed: September 25, 2008
    Publication date: April 2, 2009
    Inventors: Makoto EZUMI, Satoru Iwama, Junichi Kakuta, Takahiro Sato, Akira Ikegami
  • Publication number: 20090032693
    Abstract: The present invention aims to provide an axis alignment method, astigmatism correction method and SEM for implementing these methods, which can prevent an alignment or correction error attributable to conditions of a specimen. A first aspect is to obtain the difference between the optimal values acquired from an automatic axis alignment result on a standard sample and from each of automatic axis alignment results on a observation target sample, and to correct an optimal value adjusted using the standard sample by use of the difference thus obtained. A second aspect is to acquire an optimal stigmator value (astigmatism correction signal) by using the standard sample, to store the optimal stigmator value as a default value, to add the optimal stigmator value and the default value depending on the height of an observation target sample pattern, and to perform an astigmatism correction on the basis of the resultant stigmator value.
    Type: Application
    Filed: July 30, 2008
    Publication date: February 5, 2009
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Junichi Kakuta, Kazuhiro Ueda, Tatsuya Maeda, Hiroyuki Saito, Katsuhiro Sasada