Patents by Inventor Junichi KANEHARA
Junichi KANEHARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11912956Abstract: One aspect of the disclosure relates to a sliding member. The sliding member includes: a first sliding portion having a first lubricant placed between first parts of a first friction sliding mechanism; and a second sliding portion having a second lubricant placed between second parts of a second friction sliding mechanism. The first sliding portion has a lubricant feed port from which the first lubricant is fed, and the second sliding portion has no lubricant feed port from which the second lubricant is fed. The first lubricant contains base oil and an additive. The second lubricant contains base oil and an additive containing conductive carbon. The second lubricant contains a relatively larger amount of conductive carbon than the first lubricant.Type: GrantFiled: July 15, 2021Date of Patent: February 27, 2024Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, KYODO YUSHI CO., LTD.Inventors: Junichi Sudo, Youji Kanehara, Koushi Yamada, Kenichiro Sakurai, Ko Tanimura, Tomonobu Komoriya
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Patent number: 11874103Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.Type: GrantFiled: August 26, 2021Date of Patent: January 16, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Franciscus Godefridus Casper Bijnen, Junichi Kanehara, Stefan Carolus Jacobus Antonius Keij, Thomas Augustus Mattaar, Petrus Franciscus Van Gils
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Publication number: 20210381826Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.Type: ApplicationFiled: August 26, 2021Publication date: December 9, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Godefridus Casper BIJNEN, Junichi KANEHARA, Stefan Carolus Jacobus Antonius KEIJ, Thomas Augustus MATTAAR, Petrus Franciscus VAN GILS
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Publication number: 20210356876Abstract: An exposure apparatus arranged to project a radiation beam onto a target portion of a substrate, the exposure apparatus having: a first substrate holder configured to hold the substrate; a second substrate holder configured to hold the substrate; a sensor holder configured to hold a sensor and/or detector; a first measurement device having a first alignment system having an alignment sensor configured to measure positions of a substrate alignment mark on the substrate; a second measurement device having a second alignment system having a further alignment sensor configured to measure positions of the substrate alignment mark on the substrate; a first scale arranged on a lower surface of the first substrate holder; and a first encoder head arranged to cooperate with the first scale, the first encoder head located beneath the first alignment system and held by a stationary support.Type: ApplicationFiled: July 28, 2021Publication date: November 18, 2021Applicant: ASML NETHERLANDS B.V.Inventor: Junichi KANEHARA
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Patent number: 11105619Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.Type: GrantFiled: July 13, 2018Date of Patent: August 31, 2021Assignee: ASML Netherlands B.V.Inventors: Franciscus Godefridus Casper Bijnen, Junichi Kanehara, Stefan Carolus Jacobus Antonius Keij, Thomas Augustus Mattaar, Petrus Franciscus Van Gils
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Patent number: 11092903Abstract: An exposure apparatus arranged to project a radiation beam onto a target portion of a substrate, the exposure apparatus having: a first substrate holder configured to hold the substrate; a second substrate holder configured to hold the substrate; a sensor holder configured to hold a sensor and/or detector; a first measurement device having a first alignment system having an alignment sensor configured to measure positions of a substrate alignment mark on the substrate; a second measurement device having a second alignment system having a further alignment sensor configured to measure positions of the substrate alignment mark on the substrate; a first scale arranged on a lower surface of the first substrate holder; and a first encoder head arranged to cooperate with the first scale, the first encoder head located beneath the first alignment system and held by a stationary support.Type: GrantFiled: January 30, 2018Date of Patent: August 17, 2021Assignee: ASML Netherlands B.V.Inventor: Junichi Kanehara
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Publication number: 20200132447Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.Type: ApplicationFiled: July 13, 2018Publication date: April 30, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Godefridus Casper BIJNEN, Junichi KANEHARA, Stefan Carolus Jacobus Antonius KEIJ, Thomas Augustus MATTAAR, Petrus Franciscus VAN GILS
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Publication number: 20190377270Abstract: An exposure apparatus arranged to project a radiation beam onto a target portion of a substrate, the exposure apparatus having: a first substrate holder configured to hold the substrate; a second substrate holder configured to hold the substrate; a sensor holder configured to hold a sensor and/or detector; a first measurement device having a first alignment system having an alignment sensor configured to measure positions of a substrate alignment mark on the substrate; a second measurement device having a second alignment system having a further alignment sensor configured to measure positions of the substrate alignment mark on the substrate; a first scale arranged on a lower surface of the first substrate holder; and a first encoder head arranged to cooperate with the first scale, the first encoder head located beneath the first alignment system and held by a stationary support.Type: ApplicationFiled: January 30, 2018Publication date: December 12, 2019Applicant: ASML NETHERLANDS B.V.Inventor: Junichi KANEHARA
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Publication number: 20180329292Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.Type: ApplicationFiled: September 30, 2016Publication date: November 15, 2018Applicant: ASML Netherlands B.V.Inventors: Junichi KANEHARA, Hans BUTLER, Paul Cornè Henri DE WIT, Engelbertus Antonius Fransiscus VAN DER PASCH