Abstract: A positive photoresist composition comprising (A) an alkali-soluble resin; (B) a quinonediazido group containing compound; and (C) at least one sulfonyl halide represented by the following general formula (I):R.sup.1 --SO.sub.2 --X (I)where R.sup.1 is an alkyl group, a substituted alkyl group, an alkenyl group, an aryl group or a substituted aryl group; X is a halogen atom, as well as a multilayer resist material using this composition. Very fine (<0.4 .mu.m) resist patterns can be formed that have high feature or edge integrity, that provide good contrast between exposed and unexposed areas after development and that assure a wider margin of exposure, better depth-of-focus characteristics and sharper cross-sectional profiles.

Abstract: A direct injection type internal combustion engine includes a centrifugal injector having its port facing a recess formed in a combustion chamber. The injector is arranged such that its axis of injection fails to intersect the central axis of the recess but extends at an inclination with respect to the same. In an embodiment typifying the invention, the following relationship is satisfied: ##EQU1## in which: D designates the maximum distance between facing sides of said recess; wherein with respect to a first transverse plane containing the location of the maximum distance D of said recess and a second plane intersecting said first transverse plane at a right angle, being parallel to the axis of sprays of the swirl injector and containing the center of the recess on the first transverse plane, .beta.