Patents by Inventor Junichi Tatemichi

Junichi Tatemichi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mass analyzing electromagnet and ion beam irradiation apparatus
    Patent number: 9728390
    Abstract: A mass analyzing electromagnet is provided. The mass analyzing electromagnet includes an analysis tube having an internal zone formed as a passage for the ion beam; and a shield member mounted to an inner wall surface of the analyzing tube, a portion of the shield member intersecting with a direction perpendicular to a traveling direction of an ion beam and a mass-based separation direction of the ion beam so as to block a portion of the ion beam.
    Type: Grant
    Filed: October 6, 2015
    Date of Patent: August 8, 2017
    Assignee: Nissin Ion Equipment Co., Ltd.
    Inventors: Junichi Tatemichi, Shojiro Dohi, Ippei Nishimura
  • MASS ANALYZING ELECTROMAGNET AND ION BEAM IRRADIATION APPARATUS
    Publication number: 20160126082
    Abstract: A mass analyzing electromagnet is provided. The mass analyzing electromagnet includes an analysis tube having an internal zone formed as a passage for the ion beam; and a shield member mounted to an inner wall surface of the analyzing tube, a portion of the shield member intersecting with a direction perpendicular to a traveling direction of an ion beam and a mass-based separation direction of the ion beam so as to block a portion of the ion beam.
    Type: Application
    Filed: October 6, 2015
    Publication date: May 5, 2016
    Applicant: NISSIN ION EQUIPMENT CO., LTD.
    Inventors: Junichi TATEMICHI, Shojiro DOHI, Ippei NISHIMURA
  • Ion implanter
    Patent number: 8143595
    Abstract: An ion implanter includes an implantation chamber into which an ion beam is introduced, a holder for holding substrates on two columns of a first column and a second column in an X-direction, and a holder driving unit having a function of setting the holder in a horizontal state and then positioning the holder in a substrate exchange position and a function of setting the holder in a standing state and then driving reciprocally and linearly the holder along the X-direction in an irradiation area of the ion beam. Also, the ion implanter includes two load lock mechanisms, and two substrate carrying units equipped with arms, which carry the substrates between the load lock mechanisms and a substrate exchange position respectively, every two arms.
    Type: Grant
    Filed: August 25, 2009
    Date of Patent: March 27, 2012
    Assignee: Nissin Ion Equipment Co., Ltd.
    Inventors: Junichi Tatemichi, Masatoshi Onoda, Kohichi Orihira
  • ION IMPLANTER
    Publication number: 20100314552
    Abstract: An ion implanter includes an implantation chamber into which an ion beam is introduced, a holder for holding substrates on two columns of a first column and a second column in an X-direction, and a holder driving unit having a function of setting the holder in a horizontal state and then positioning the holder in a substrate exchange position and a function of setting the holder in a standing state and then driving reciprocally and linearly the holder along the X-direction in an irradiation area of the ion beam. Also, the ion implanter includes two load lock mechanisms, and two substrate carrying units equipped with arms, which carry the substrates between the load lock mechanisms and a substrate exchange position respectively, every two arms.
    Type: Application
    Filed: August 25, 2009
    Publication date: December 16, 2010
    Applicant: NISSIN ION EQUIPMENT CO., LTD.
    Inventors: Junichi Tatemichi, Masatoshi Onoda, Kohichi Orihira