Patents by Inventor Junichiro Ando

Junichiro Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210198524
    Abstract: Embodiments provide a polishing composition for a magnetic disk substrate, the polishing composition containing colloidal silica, at least one of a phosphorus-containing inorganic acid and a phosphorous-containing organic acid, and water. According to at least one embodiment, the colloidal silica in the polishing composition has an average particle diameter (D50) in the range of 5 to 50 nm observed by a transmission electron microscope. In measuring a volume-based particle size distribution of the colloidal silica by dynamic light scattering, when the particle size distribution is measured by adjusting a concentration of colloidal silica particles to be 0.25 mass %, the colloidal silica contains 10 vol % or less of colloidal silica particles larger than 50 nm. The polishing composition has 1 to 50 mass % of the colloidal silica, and the pH (25° C.) in the range of 0.1 to 4.0. The colloidal silica is stabilized by sodium or ammonium.
    Type: Application
    Filed: March 9, 2021
    Publication date: July 1, 2021
    Applicant: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventor: Junichiro ANDO
  • Patent number: 10233358
    Abstract: Embodiments relate to a polishing composition for a magnetic disk substrate, where the polishing composition contains colloidal silica, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound has a weight average molecular weight of 20,000 to 10,000,000 and a concentration of 0.0001 to 2.0% by mass.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: March 19, 2019
    Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventor: Junichiro Ando
  • Patent number: 10233357
    Abstract: Embodiments provide a polishing composition for a magnetic disc substrate including colloidal silica, a phosphorus-containing compound, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound is a copolymer having a structural unit derived from an unsaturated aliphatic carboxylic acid and a structural unit derived from an unsaturated amide.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: March 19, 2019
    Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventor: Junichiro Ando
  • Publication number: 20180371293
    Abstract: Embodiments of the subject application provide a polishing composition for a magnetic disk substrate, whereby the polishing composition contains colloidal silica, at least one of a phosphorus-containing inorganic acid and an organic acid, and water. According to at least one embodiment, the colloidal silica in the polishing composition has an average particle diameter (D50) in the range of 5 to 50 nm observed by a transmission electron microscope. In measuring a volume-based particle size distribution of the colloidal silica by dynamic light scattering, when the particle size distribution is measured by adjusting a concentration of colloidal silica particles to be 0.25 mass %, the colloidal silica contains 10 vol % or less of colloidal silica particles larger than 50 nm. According to at least one embodiment, the polishing composition has 1 to 50 mass % of the colloidal silica, and the polishing composition has the pH (25° C.) in the range of 0.1 to 4.0.
    Type: Application
    Filed: June 19, 2018
    Publication date: December 27, 2018
    Applicant: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventor: Junichiro ANDO
  • Publication number: 20180057712
    Abstract: Embodiments relate to a polishing composition for a magnetic disk substrate, where the polishing composition contains colloidal silica, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound has a weight average molecular weight of 20,000 to 10,000,000 and a concentration of 0.0001 to 2.0% by mass.
    Type: Application
    Filed: August 23, 2017
    Publication date: March 1, 2018
    Applicant: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventor: Junichiro Ando
  • Publication number: 20170321086
    Abstract: Embodiments provide a polishing composition for a magnetic disc substrate including colloidal silica, a phosphorus-containing compound, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound is a copolymer having a structural unit derived from an unsaturated aliphatic carboxylic acid and a structural unit derived from an unsaturated amide.
    Type: Application
    Filed: May 9, 2017
    Publication date: November 9, 2017
    Applicant: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventor: Junichiro ANDO
  • Patent number: 9417008
    Abstract: A production method for natural gas according to the invention includes a step of adiabatically compressing a raw natural gas containing helium gas, a step of separating the helium gas from the raw natural gas by passing the adiabatically-compressed raw natural gas through a separation membrane unit, a step of conveying the raw natural gas from which the helium gas has been separated to a terminal through a pipe line, and a step of pressing the helium gas separated from the raw natural gas into an underground storage formation.
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: August 16, 2016
    Assignee: Japan Petroleum Exploration Co., Ltd.
    Inventors: Tomonori Ikeno, Kazumoto Chiba, Toshiya Wakatsuki, Yusuke Takeuchi, Kazutoshi Chaki, Junichiro Ando
  • Publication number: 20150121952
    Abstract: A production method for natural gas according to the invention includes a step of adiabatically compressing a raw natural gas containing helium gas, a step of separating the helium gas from the raw natural gas by passing the adiabatically-compressed raw natural gas through a separation membrane unit, a step of conveying the raw natural gas from which the helium gas has been separated to a terminal through a pipe line, and a step of pressing the helium gas separated from the raw natural gas into an underground storage formation.
    Type: Application
    Filed: May 16, 2013
    Publication date: May 7, 2015
    Inventors: Tomonori Ikeno, Kazumoto Chiba, Toshiya Wakatsuki, Yusuke Takeuchi, Kazutoshi Chaki, Junichiro Ando
  • Publication number: 20050028449
    Abstract: A polishing composition of abrasive grains, a phosphorus-containing inorganic acid or salt thereof and another inorganic acid or salt thereof contained in an aqueous medium is used for the polishing of magnetic disk substrates or the like.
    Type: Application
    Filed: September 3, 2002
    Publication date: February 10, 2005
    Inventors: Norihiko Miyata, Gong-Hong Hong, Junichiro Ando