Patents by Inventor Junichiro Horiuchi

Junichiro Horiuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ultraviolet sterilizer and air conditioning apparatus using the same
    Patent number: 10760799
    Abstract: An air-conditioning apparatus that conditions introduced air includes an ultraviolet sterilizer that emits ultraviolet ray to the air. The ultraviolet sterilizer includes a sterilizing light screen forming unit that forms a screen-shaped sterilizing light screen based on the emitted ultraviolet ray.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: September 1, 2020
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Akane Nomura, Akira Morikawa, Isamu Hirashiki, Junichiro Horiuchi
  • ULTRAVIOLET STERILIZER AND AIR CONDITIONING APPARATUS USING THE SAME
    Publication number: 20180356109
    Abstract: An air-conditioning apparatus that conditions introduced air includes an ultraviolet sterilizer that emits ultraviolet ray to the air. The ultraviolet sterilizer includes a sterilizing light screen forming unit that forms a screen-shaped sterilizing light screen based on the emitted ultraviolet ray.
    Type: Application
    Filed: July 8, 2016
    Publication date: December 13, 2018
    Applicant: Mitsubishi Electric Corporation
    Inventors: Akane NOMURA, Akira MORIKAWA, Isamu HIRASHIKI, Junichiro HORIUCHI
  • Process for producing a dielectric insulator separated substrate
    Patent number: 4310965
    Abstract: An improved dielectric insulator separated substrate for semiconductor integrated circuits is obtained by forming a lamination of at least three thin-polycrystalline layers and dielectric films interposed therebetween on a thick polycrystalline layer of the substrate. A thickness x(.mu.m) of each of the thin-polycrystalline layers is represented by the formula:x.ltoreq.y/40where y is an ultimate thickness of the substrate. By employing the lamination, it is possible to avoid curveness deformation of the substrate due to oxygen diffusion into an exposed polycrystalline layer during doping of an impurity into island regions independently supported by said thick polycrystalline layer.
    Type: Grant
    Filed: April 10, 1980
    Date of Patent: January 19, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Junichiro Horiuchi, Hideyuki Yagi