Abstract: To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance. An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO2, from 10.0 to 12.0% of Al2O3, from 6.0 to 9.0% of B2O3, from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)?0.40, and B2O3/(SiO2+Al2O3+B2O3)?0.12; wherein Young's modulus ?75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10?7/° C. to 40×10?7/° C.; the strain point ?640° C.; the temperature T2 (the viscosity ? satisfies log ?=2)?1,620° C.; the temperature T4 (the viscosity ? satisfies log ?=4)?1,245° C.; the devitrification temperature ?T4; and weight loss per unit area is at most 0.

Abstract: To provide a glass plate which has a low B2O3 content and which can be used as a glass plate for e.g. an LCD panel. A glass plate which comprises, as a glass matrix composition as represented by mass % based on oxide, from 53 to 74 mass % of SiO2, from 15 to 23 mass % of Al2O3, from 0 to 3 mass % of B2O3, from 2 to 17 mass % of MgO, from 0 to 12 mass % of CaO, from 0 to 6 mass % of SrO, from 6 to 28 mass % of MgO+CaO+SrO, from 0 to 9 mass % of Na2O, from 0 to 6 mass % of K2O and from 0.8 to 11 mass % of Na2O+K2O, contains from 100 to 500 ppm of SO3, has an average coefficient of thermal expansion from 50 to 350° C. of at most 60×10?7/° C., and has a strain point of at least 600° C.

Abstract: To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material. An alkali free glass with a matrix composition comprising SiO2, Al2O3, B2O3, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 102 dPa·s, is at most 1,600° C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.

Abstract: To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance. An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO2, from 10.0 to 12.0% of Al2O3, from 6.0 to 9.0% of B2O3, from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)?0.40, and B2O3/(SiO2+Al2O3+B2O3)?0.12; wherein Young's modulus ?75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10?7/° C. to 40×10?7/° C.; the strain point ?640° C.; the temperature T2 (the viscosity ? satisfies log ?=2)?1,620° C.; the temperature T4 (the viscosity ? satisfies log ?=4)?1,245° C.; the devitrification temperature ?T4; and weight loss per unit area is at most 0.

Abstract: To provide a liquid crystal display panel which can be produced at low cost by using inexpensive alkali glass for at least an opposing glass substrate, which is free from troubles in a liquid crystal display due to panel warpage attributable to the thermal treatment since such treatment is not required in the production process, and further which is free from panel warpage which tends to bring a trouble in a liquid crystal display derived from the difference in the thermal expansion coefficient by change in ambient temperature at the time of use. A liquid crystal display panel comprising an array glass substrate and an opposing glass substrate facing it, in which a liquid crystal is filled between such substrates, and an ultraviolet curable resin is sealed at a peripheral area, wherein the above opposing glass substrate is an alkali glass substrate, and the difference in thermal expansion coefficient between the above array glass substrate and the above opposing glass substrate is at most 35×10?7/° C.

Abstract: To provide a process for producing and alkali free glass for effectively suppressing bubbles, and an alkali free glass produced by the process, which is suitable as a glass substrate for flat panel displays and has few bubbles. A process for producing an alkali free glass containing substantially no alkali metal oxide, which comprises melting a glass starting material having a matrix composition of the following composition, and subjecting the molten glass to a treatment process of removing bubbles under reduced pressure, stirring or transferring under a condition where the molten glass is in contact with a platinum member, wherein the starting material is prepared so as to contain SnO2 in an amount of from 0.01 to 2.0% per 100% of the total amount of the above matrix composition; the starting material is melted under heating at from 1,500 to 1,650° C.

Abstract: To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material. An alkali free glass with a matrix composition comprising SiO2, Al2O3, B2O3, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 102 dPa·s, is at most 1,600° C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.

Abstract: To provide an alkali-free glass excellent in the properties for glass substrates to be used for display, excellent in the resistance to reduction, and suitable for forming by a float process. An alkali-free glass consisting essentially of, as represented by mol %: SiO2 at least 60% and less than 66%, Al2O3 0 to 12%, B2O3 5 to 10%, MgO 0 to 18%, CaO 0 to 18%, SrO 0 to 18%, BaO 0 to 6%,? CaO + SrO 10 to 25%,? MgO + CaO + SrO + BaO 15.5 to 30%?? and containing substantially no alkali metal oxide.

Abstract: To present an alkali free glass capable of reducing compaction caused by heat treatment, without significantly increasing the strain point. An alkali free glass characterized in that the ratio (?an-st/?50-350) of the equilibrium density curve gradient ?an-st (ppm/° C.) in a temperature range of from about the annealing point (Tan) to about the strain point (Tst) to the average linear expansion coefficient ?50-350 (×10?6/° C.) in a range of from 50 to 350° C., is at least 0 and less than 3.64.

Abstract: An alkali-free glass consisting essentially of: SiO2 64 to 76 mol %,  Al2O3 5 to 14 mol %, B2O3 5 to 16 mol %, MgO 1 to 16.5 mol %, CaO 0 to 14 mol %, SrO 0 to 6 mol %, and BaO 0 to 2 mol %.

Abstract: Abrasion resistant glass, which consists essentially of the following components:______________________________________ SiO.sub.2 75.5 to 85.5 (wt %), RO 1 to 8 (wt %), R'.sub.2 O 10 to 23.5 (wt %), RO + R'.sub.2 O 11 to 24.5 (wt %), Al.sub.2 O.sub.3 0 to 5 (wt %), ______________________________________ RO/R'.sub.2 O (weight ratio) at most 0.5,provided that R is at least one member selected from Mg and Ca, and R' is at least one member selected from Li, Na and K, and of which the density measured at room temperature is at most 2.41 g/cc.

Abstract: Abrasion resistant glass, which consists essentially of the following components:______________________________________ SiO.sub.2 74 to 85.5 (wt %), B.sub.2 O.sub.3 0.5 to 5 (wt %), SiO.sub.2 + B.sub.2 O.sub.3 76 to 88 (wt %), RO 1 to 9 (wt %), R'.sub.2 O 10 to 23 (wt %), RO + R'.sub.2 O 11 to 24 (wt %), Al.sub.2 O.sub.3 0 to 5 (wt %), RO/R'.sub.2 O (weight ratio) at most 0.6, ______________________________________provided that R is at least one member selected from Mg and Ca, and R' is at least one member selected from Li, Na and K, and of which the density measured at room temperature is at most 2.43 g/cc.