Patents by Inventor Junill RYU

Junill RYU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • IMMERSION LITHOGRAPHIC SYSTEM
    Publication number: 20240152058
    Abstract: An immersion lithographic system may include a wafer stage configured to support a wafer, a projection optical system on the wafer stage and configured to irradiate light toward the wafer, a liquid supply unit configured to supply a liquid between the wafer stage and the projection optical system to form an immersion lens through which the light is transmitted, and a vapor supply unit configured to supply vapors to the immersion lens. The immersion lens and the vapor supply unit may be aligned in a vertical direction.
    Type: Application
    Filed: June 20, 2023
    Publication date: May 9, 2024
    Applicants: Samsung Electronics Co., Ltd., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Wonki LEE, Hyoungsoo KIM, Junill RYU, Namil KOO, Jongmin YOON, Suhwan PARK, Sangyeon OH, Gilgu LEE