Abstract: Disclosed is a charge transfer complex capable of obtaining a curable resin composition having an excellent balance between curability and storage stability when used as an epoxy-resin curing agent. The charge transfer complex has an imidazole moiety as an electron donor moiety. The charge transfer complex may be an assembly wherein electrons included in a compound (a) having an imidazole moiety are accepted by a compound (b) having an electron acceptor moiety, or may be a compound having an imidazole moiety and an electron acceptor moiety in its molecule, and the electron acceptor moiety accepts electrons included in the imidazole moiety.

Abstract: A member for a solid-state image pickup device having a bonding plane with no gaps and a method for manufacturing the same are provided. The manufacturing method includes the steps of providing a first substrate provided with a photoelectric converter on its primary face and a first wiring structure, providing a second substrate provided with a part of a peripheral circuit on its primary face and a second wiring structure, and performing bonding so that the first substrate, the first wiring structure, the second wiring structure, and the second substrate are disposed in this order. In addition, at least one of an upper face of the first wiring structure and an upper face of the second wiring structure has a concave portion, and a conductive material forms a bottom face of the concave portion.

Abstract: A controller includes an operating member operable by user's depression, and a touch detection device constructed to detect a depressing touch on the operating member. The touch detection device includes a movable contact pattern provided on the lower surface of the operating member, and a fixed contact pattern disposed underneath the operating member. One of the fixed and movable contact patterns is a coil-shaped contact pattern while the other of the fixed and movable contact patterns is a uniform surface pattern, at least one of the fixed and movable contact patterns has flexibility, and at least one of the fixed and movable contact patterns has a surface slanted from the center of the coil toward the outer peripheral edge of the coil. The coil-shaped contact pattern comprises first and second contact elements constituting a dual coil pattern.

Abstract: One electrode and another electrode adjoining an upper end region of the one electrode in an operating direction of a fader sensor are divided by a boundary line extending zigzag in a generally M shape transversely relative to the operating direction, so that upper and lower apex portions of the one electrode and the other electrode bite into each other. Similarly, the one electrode and another electrode adjoining a lower end region of the one electrode each other are divided by a boundary line extending zigzag in a generally M shape transversely relative to the operating direction. As a finger touches the fader sensor, the finger simultaneously touches the three electrodes, and corresponding output signals are output therefrom. A weighted average of the output signals is calculated so that position information of the finger having touched the sensor can be acquired with a high resolution.

Abstract: A controller includes an operating member operable by user's depression, and a touch detection device constructed to detect a depressing touch on the operating member. The touch detection device includes a movable contact pattern provided on the lower surface of the operating member, and a fixed contact pattern disposed underneath the operating member. One of the fixed and movable contact patterns is a coil-shaped contact pattern while the other of the fixed and movable contact patterns is a uniform surface pattern, at least one of the fixed and movable contact patterns has flexibility, and at least one of the fixed and movable contact patterns has a surface slanted from the center of the coil toward the outer peripheral edge of the coil. The coil-shaped contact pattern comprises first and second contact elements constituting a dual coil pattern.

Abstract: In an interference measuring device, which includes: a coherent beam generating source; a sample to be measured; a lens system for forming an image of the sample to be measured on an observing plane; an interference element for splitting a coherent beam into two systems, and forming an interference image on the observing plane or a plane equivalent thereto; an image pickup element for picking up the interference image on the observing plane; and a calculating device having functions of capturing and storing the interference image converted to electric signals by the image pickup element, and determining the phase distribution changed by the sample to be measured from the interference image by calculation, wherein a means for removing the phase change distribution due to the interference element is provided.

Abstract: In an interferometric device using a coherent beam and an image pickup camera, a protective glass for the detector surface is needed on the incident side of the pickup unit of the image pickup camera, and this gives rise to interference fringes which constitute noise. To solve this problem, a dustproof container is configured also to cover an imaging lens system arranged on the incident side of the pickup unit of the image pickup camera, and the pickup unit of the image pickup camera is arranged in this container. By assigning the function of the protective glass for the detector surface in the conventional configuration to the imaging lens system, the protective glass is made unnecessary.

Abstract: To prevent the displacement from an optical axis of a charged particle beam from being made independent of the direction (parallel to or perpendicular to the optical axis) of a magnetic field applied to a specimen, a system including an electron microscope and using a charged particle beam optical system is provided with a source of a charged particle beam, a condenser optical system, a specimen to be observed, a system for applying a magnetic field to the specimen, an imaging optical system and an image observation/recording apparatus, is provided with first and second charged particle beam deflection systems in order along a direction in which the charged particle beam travels between the condenser optical system and the specimen, is provided with third and fourth charged particle beam deflection systems in order between the specimen and the imaging lens system, and the quantity and the direction of the deflection of the charged particle beam by each deflection system and the intensity and the bearing of a

Abstract: To prevent the displacement from an optical axis of a charged particle beam from being made independent of the direction (parallel to or perpendicular to the optical axis) of a magnetic field applied to a specimen, a system including an electron microscope and using a charged particle beam optical system is provided with a source of a charged particle beam, a condenser optical system, a specimen to be observed, a system for applying a magnetic field to the specimen, an imaging optical system and an image observation/recording apparatus, is provided with first and second charged particle beam deflection systems in order along a direction in which the charged particle beam travels between the condenser optical system and the specimen, is provided with third and fourth charged particle beam deflection systems in order between the specimen and the imaging lens system, and the quantity and the direction of the deflection of the charged particle beam by each deflection system and the intensity and the bearing of a

Abstract: In an interference measuring device, which includes: a coherent beam generating source; a sample to be measured; a lens system for forming an image of the sample to be measured on an observing plane; an interference element for splitting a coherent beam into two systems, and forming an interference image on the observing plane or a plane equivalent thereto; an image pickup element for picking up the interference image on the observing plane; and a calculating device having functions of capturing and storing the interference image converted to electric signals by the image pickup element, and determining the phase distribution changed by the sample to be measured from the interference image by calculation, wherein a means for removing the phase change distribution due to the interference element is provided.

Abstract: An electron-microscope image viewing apparatus capable of measuring of a moving speed or a vibration frequency of an atomic structure, a magnetic structure, an electric structure or the like of a specimen even when the structure changes at a high rate.

Abstract: An interference device and method for observing phase information, using electron or other waves with the amplitude difficult to split by a half mirror.

Abstract: In an electron holography apparatus having an electron source, a specimen holder, an electron lens system, and an electron biprism, the electron biprism is so constructed as to be rotatable about the electron optics axis. The rotation angle about the electron optics axis is commanded by the operator of the electron holography apparatus. A central wire of the electron biprism is allowed to be translated in a direction orthogonal to the electron optics axis, thus permitting the application of the fringe scanning method. The center of an aperture is selectively allowed to be aligned with that of the electron biprism to ensure that the measurement apparatus can be used selectively as either the electron holography apparatus or an electron microscope.

Abstract: A charged particle beam generating apparatus of multi-stage acceleration type includes a charged particle beam source and a multi-stage acceleration tube having a plurality of acceleration electrodes arranged in cascade over a plurality of stages within the tube. A plurality of outer shield electrodes are disposed in concentrical relation on the radially outer side of the multi-stage acceleration tube over the plural stages to be applied with the same potentials as those of the associated acceleration electrodes respectively. Finally, a plurality of dividing resistors are disposed outside of the multi-stage acceleration tube or between the outer shield electrodes and the multi-stage acceleration tube so as to apply predetermined potentials to the acceleration electrodes, respectively.

Abstract: In a field emission electron gun system with a multi-stage acceleration tube comprising a field emission electron source, a field emission electrode for extracting the electrons, a magnetic lens having a magnetic gap between the field emission electron source and the field emission electrode or a magnetic lens having a magnetic pole which also serves as the field emission electrode, and at least two-stages of acceleration electrodes for accelerating the electrons, a magnetization current I for the magnetic lens is changed interlocking with a field emission voltage V.sub.1 applied between the field emission electron source and the field emission electrode so that IN/.sqroot.V.sub.1 (N: the number of windings of the magnetic lens) takes a predetermined value and a first acceleration voltage V.sub.2 applied between the field emission electron source and the first-stage acceleration electrode is changed interlocking with the field emission voltage V.sub.1 so that V.sub.2 /V.sub.1 takes a predetermined value.

Abstract: An electron holography apparatus includes an electron microscope which is provided with an electron source, a beam splitter for dividing an electron beam emitted from the electron source into first and second electron beams, and a phase controller for controllably changing a phase difference between the first and second electron beams, and further includes an image detector for detecting an electron interference fringe pattern which varies in accordance with the phase difference between the first and second electron beams, as a picture image, and an image data processor for determining the phase distribution of one of the first and second electron beams from detected image data.

Abstract: A method of forming a nitride or carbonitride layer on the surface of an iron or iron alloy article, which comprises the steps of: (a) disposing in a fluidized bed furnace a treating agent comprising a refractory powder, a metal powder of at least one selected from the group consisting of chromium, vanadium, titanium and a metal containing at least one of the chromium, vanadium and titanium, and a halide powder; (b) introducing a nitrogen-containing gas into the fluidizied bed furnace; (c) heating the fluidized bed furnace; and (d) disposing the article in the fluidized bed furnace during or after the steps (a) to (c). In this method, the article is preferably treated at a temperature not higher than 650.degree. C. The step (c) may precede the step (b). The halide powder may be supplied to the fluidized bed furnace from outside in the form of green compact or a gas.

Abstract: A method of forming a surface layer of carbide, nitride, carbonitride, or solid-solution on the surface of a material to be treated, which comprises disposing in a fluidized bed furnace a treating agent comprising a powder of a refractory material, and a powder of a metal for forming a carbide, nitride, carbonitride or solid-solution or a powder of an alloy thereof, introducing a fluidizing gas into the fluidized bed furnace to fluidize the treating agent and form a fluidized layer, disposing the material to be treated in the fluidized layer, and introducing a predetermined amount of halide into the fluidized layer, and an apparatus for forming the surface layer on the material to be treated, comprising a furnace body for forming the surface layer in the fluidized layer of the treating agent, a heating furnace for heating the fluidized layer, a halide supply pipe in communication with the outside of the furnace body, and a halide gas jetting pipe disposed within the furnace body, which is connected to the hal

Abstract: A method and apparatus for forming a layer of a carbide or nitride of, for example, titanium or vanadium on the surface of material to be treated in a fluidized bed furnace. A refractory powder for forming a fluidized bed, a vessel or vessels filed with powder of a treating agent, and the material to be treated are placed in the furnace. The treating agent includes powder of at least one carbide or nitride forming metal or alloy and powder of at least one compound selected from the group consisting of chlorides, fluorides, bromides, iodides and boro-fluorides of alkali and alkaline earth metals and/or at least one of an ammonium halide and a metal halide. A fluidizing gas is introduced into the furnace under heat to form a fluidized bed in which the surface of the material to be treated is treated. The vessel or vessels are placed in the furnace in a spaced-apart relation from the material to be treated, so that no powder of the treating agent may adhere to the surface of the material to be treated.

Abstract: A layer of a nitride or carbonitride containing at least one of chromium, Group Va elements, titanium and zirconium is formed on the surface of an iron alloy material which has been nitrided. The layer is formed by heating the iron alloy material at a temperature not exceeding 700.degree. C. with a material containing at least one of chromium, Group Va elements, titanium and zirconium and a treating agent. It is a dense layer bonded tightly to the iron alloy material. As a low temperature not exceeding 700.degree. C. is employed, no large amount of heat energy is required, nor is any thermal strain produced in the iron alloy material.