Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Abstract: An evaporation system for forming evaporation films on a substrate film, includes: a first drive portion which is driven to rotate to thereby feed out the substrate film; a second drive portion which is driven to rotate to thereby take up the substrate film conveyed to the second drive portion; film-forming rollers which are provided on a conveyance path of the substrate film conveyed between the first drive portion and the second drive portion and which support one surface of the substrate film onto circumferential surfaces of the film-forming rollers; evaporation portions which form the evaporation films on a surface of the substrate film opposite to the surface supported by the film-forming rollers; and a third drive portion as defined herein.

Abstract: A method for producing a double-sided evaporation film by forming metal-containing evaporation films on both surfaces of a non-magnetic plastic substrate film by an evaporation system with an evaporation drum, includes, in the following order: forming a metal-containing evaporation film on a first surface of the substrate film; forming an organic substance film on the metal-containing evaporation film; and forming a metal-containing evaporation film on a second surface of the substrate film, the second surface being opposite to the first surface.

Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Abstract: A gas barrier film includes a substrate film and a gas barrier layer formed on the substrate film. The gas barrier layer is an inorganic compound layer that is made of an inorganic compound having a grain size of 3 nm to 20 nm and has grain boundaries at intervals of 1 nm to 20 nm. A stimulable phosphor panel includes a substrate, a stimulable phosphor layer formed on the substrate and the gas barrier film with which the stimulable phosphor layer is covered and sealed. A gas barrier film producing method prepares the substrate film and performs impedance controlled reactive sputtering on the substrate film at a film deposition pressure of 0.01 Pa to 0.13 Pa to form the gas barrier layer on the substrate film to thereby produce the gas barrier film.

Abstract: The process and apparatus introduce a carrier gas into a vacuum evaporation chamber, evaporate a film forming material from a evaporation source and deposit the evaporated film forming material on a substrate in sheet form to form a stimulable phosphor layer, thereby producing a evaporated phosphor sheet having a stimulable phosphor layer formed on the substrate. The stimulable phosphor layer is formed with substantially all areas of the evaporation source except opening for evaporation being masked to block movement of heat toward the substrate. The evaporated phosphor sheet includes the substrate and a CsBr:Eu evaporated stimulable phosphor layer deposited on the substrate. A maximum intensity of instantaneous light emission from the stimulable phosphor layer at 640 nm upon excitation by uv radiation is lower than a maximum intensity of the instantaneous light emission at 440 nm.

Abstract: This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.

Abstract: The apparatus for producing sheeting includes a transport unit which transports a web of sheeting along its length direction, a pattern transfer unit which forms a pattern on a surface of the sheeting by transfer and that is provided in a pathway where the web of sheeting is transported by the transport unit, a film depositing unit which performs vacuum film deposition on the patterned surface of the web of sheeting and that is provided downstream of the pattern transfer unit in the pathway, and a pressure retaining unit which retains pressure within the film depositing unit and that is provided in a region of the film depositing unit into which the web of sheeting is transported and in a region of the film depositing unit from which the web of sheeting emerges.

Abstract: A process for producing a magnetic recording medium comprising: unrolling a flexible polymer substrate from a feed roll; forming a magnetic layer on at least one side of the flexible polymer substrate by a vacuum film forming method in a film forming chamber; and taking up the flexible polymer substrate on a take-up roll, wherein at least one of the feed roll and the take-up roll is replaced while maintaining a vacuum state for forming the magnetic layer in the film forming chamber.

Abstract: The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less.

Abstract: There is provided a stimulable phosphor sheet manufacturing apparatus which forms a stimulable phosphor layer through vacuum evaporation in a vacuum chamber. A substrate is conveyed linearly, evaporation sources are arranged in a direction perpendicular to a direction in which the substrate is conveyed, and/or the apparatus includes the evaporation sources relying on resistance heating and a gas introducing nozzle for introducing an inert gas into a vacuum chamber during film formation. A phosphor layer of highly uniform film thickness distribution can be formed.

Abstract: A method for manufacturing a magnetic recording medium, the method comprising forming a magnetic layer on at least one side of a flexible polymer support by a sputtering method, wherein the flexible polymer support contains at least one of polyethylene terephthalate, polyethylene naphthalate, polyamide and polyimide, the forming of a magnetic layer is carried out while carrying the flexible polymer support along a roll having a maximum surface roughness of from 0.01 to 0.4 ?m, and a deposition rate in the sputtering method for forming of a magnetic layer is from 0.5 to 17 nm/sec.

Abstract: A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.

Abstract: The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less.

Abstract: The process and apparatus introduce a carrier gas into a vacuum evaporation chamber, evaporate a film forming material from a evaporation source and deposit the evaporated film forming material on a substrate in sheet form to form a stimulable phosphor layer, thereby producing a evaporated phosphor sheet having a stimulable phosphor layer formed on the substrate. The stimulable phosphor layer is formed with substantially all areas of the evaporation source except opening for evaporation being masked to block movement of heat toward the substrate. The evaporated phosphor sheet includes the substrate and a CsBr:Eu evaporated stimulable phosphor layer deposited on the substrate. A maximum intensity of instantaneous light emission from the stimulable phosphor layer at 640 nm upon excitation by uv radiation is lower than a maximum intensity of the instantaneous light emission at 440 nm.

Abstract: This optical component includes a film formation substrate made of plastic, a magnesium fluoride film formed at an upper side of the film formation substrate and a first silicon oxide film formed on the magnesium fluoride film. The magnesium fluoride film may be formed on a surface of the film formation substrate. Alternatively, the optical component further may include a second silicon oxide film formed on a surface of the film formation substrate and between the film formation substrate and the magnesium fluoride film. The optical component can be realized, which is excellent in film adhesiveness, mechanical strength, drug resistance, environment resistance, and the like, as well as optical characteristics, and which is also excellent in productivity, film formation operability, cost, and the like.

Abstract: The optical component includes a substrate made of a resin material, a silicon oxide film formed on a surface of the substrate, and a multilayer light reflection preventing film formed on the silicon oxide film, and having at least one layer of a low-refractive-index material and at least one layer of a high-refractive-index material being alternately formed. The silicon oxide film is thick and/or formed by introducing oxygen during film forming by vacuum deposition so that a preset elasticity is imparted to the silicon oxide film. Other optical component includes a substrate made of a resin material and a plurality of films formed by vacuum deposition, and directions of internal stresses in each adjacent pair of the plurality of films are different from each other or a thickness of an impurity existing on a surface of the substrate is 0.2 nm or less.

Abstract: This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.

Abstract: The film forming method first forms a film having at least one layer by a film forming process on a surface of a heat-resistant member having higher heat resistance than a substrate on which the film is to be formed and the film forming process includes a step of performing at a temperature higher than a heat resistance temperature of the substrate. The method thereafter transfers the film formed on the heat-resistant member to the surface of the substrate at a temperature less than the heat resistance temperature of the substrate.